公开(公告)号：US20160356935A1

公开(公告)日：2016-12-08

申请号：US15243702

申请日：2016-08-22

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： SEUNG-WON PARK ,  TAEWOO KIM ,  MOONGYU LEE ,  MINHYUCK KANG

IPC: G02B5/30 ,  G02B1/12 ,  G02F1/1335

CPC classification number: G02B5/3058 ,  G02B1/12 ,  G02F1/133536 ,  G02F2001/133548

Abstract: A manufacturing method of a mother substrate assembly includes forming a metal layer on substantially an entire surface of a transparent substrate including a cell area including a non-display area and a display area, an align key area, and a substrate area surrounding the cell area and the align key area, etching the metal layer to form an align key in the align key area, etching the metal layer to form a reflection part in the non-display area, and etching the metal layer in the display area to form a metal nanowire in the display area.

公开(公告)号：US20170336547A1

公开(公告)日：2017-11-23

申请号：US15594645

申请日：2017-05-14

Applicant: Samsung Display Co., Ltd.

Inventor： SEUNG-WON PARK ,  TAEWOO KIM ,  LEI XIE ,  DAEHWAN JANG ,  DAE-YOUNG LEE ,  GUGRAE JO

IPC: G02B5/30 ,  G03F7/00 ,  G03F1/80 ,  G03F1/60 ,  H01L27/12 ,  G02F1/1335

CPC classification number: G03F7/0002 ,  G02B5/00 ,  G02B5/3058 ,  G02F1/00 ,  G02F1/133528 ,  G02F2001/133548 ,  G03F1/60 ,  G03F1/80 ,  H01L27/1218 ,  H01L27/124 ,  H01L27/1259

Abstract: An imprint lithography method includes forming a first imprint pattern on a substrate in a first area and a third area, wherein the third area is spaced apart from the first area, forming a first resist pattern on the substrate on a second area, wherein the second area is adjacent the first and third areas, forming a first pattern in the first and third areas by etching an element under the first imprint pattern using the first imprint pattern and the first resist pattern as an etch barrier, forming a second imprint pattern on the substrate in a second area, forming a second resist pattern on the substrate on the first area and the third area, and forming a second pattern in the second area by etching an element under the second imprint pattern using the second imprint pattern and the second resist pattern as an etch barrier.

公开(公告)号：US20150212239A1

公开(公告)日：2015-07-30

申请号：US14513965

申请日：2014-10-14

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： SEUNG-WON PARK ,  TAEWOO KIM ,  MOONGYU LEE ,  MINHYUCK KANG

IPC: G02B1/12 ,  G03F7/40 ,  G03F7/20 ,  G02B5/30

CPC classification number: G02B5/3058 ,  G02B1/12 ,  G02F1/133536 ,  G02F2001/133548

Abstract: A manufacturing method of a mother substrate assembly includes forming a metal layer on substantially an entire surface of a transparent substrate including a cell area including a non-display area and a display area, an align key area, and a substrate area surrounding the cell area and the align key area, etching the metal layer to form an align key in the align key area, etching the metal layer to form a reflection part in the non-display area, and etching the metal layer in the display area to form a metal nanowire in the display area.

Abstract translation: 母基板组件的制造方法包括在包括包括非显示区域和显示区域的单元区域，对准键区域和围绕单元区域的基板区域的透明基板的基本上整个表面上形成金属层 和对准键区域，蚀刻金属层以在对准键区域中形成对准键，蚀刻金属层以在非显示区域中形成反射部分，并且蚀刻显示区域中的金属层以形成金属 纳米线在显示区域。