公开(公告)号：US12087550B2

公开(公告)日：2024-09-10

申请号：US17874475

申请日：2022-07-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Vladimir Vsevolodovich Protopopov ,  Vasily Grigorievich Pashkovskiy ,  Chansoo Kang ,  Youngdo Kim ,  Hoonseop Kim ,  Sangki Nam ,  Sejin Oh ,  Changsoon Lim

IPC: H01J37/32

CPC classification number: H01J37/32201 ,  H01J37/32935

Abstract: A device for measuring a density of plasma is provided. The device includes a first sensor configured to measure a microwave spectrum of an input port reflection parameter of plasma, the first sensor having a probe including a conductive material and a flat plate shape, and a second sensor configured to measure an optical signal generated from the plasma, the second sensor being configured to detect the optical signal through the probe of the first sensor.

公开(公告)号：US11940620B2

公开(公告)日：2024-03-26

申请号：US17508224

申请日：2021-10-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Changsoon Lim ,  Youngdo Kim ,  Daewon Kang ,  Chansoo Kang ,  Hoonseop Kim ,  Sangki Nam ,  Youngduk Suh ,  Donghyub Lee ,  Jonghun Pi

IPC: G02B27/00 ,  B08B7/00 ,  B08B7/04 ,  G01N33/00 ,  G03F7/00 ,  G06T7/00

CPC classification number: G02B27/0006 ,  B08B7/0035 ,  B08B7/04 ,  G01N33/0027 ,  G03F7/70033 ,  G03F7/7085 ,  G03F7/70925 ,  G06T7/001

Abstract: A method of cleaning a collector of an extreme ultraviolet light source system includes introducing the collector separated from the extreme ultraviolet light source system into a chamber; capturing an optical image of a reflective surface of the collector; measuring a contamination level of the reflective surface by comparing the optical image with a prestored standard image; performing a first cleaning operation if the contamination level exceeds a preset first reference value, the first cleaning operation including cleaning the reflective surface by spraying dry ice particles onto the reflective surface; and performing a second cleaning operation if the contamination level is less than or equal to the preset first reference value. The second cleaning operation includes cleaning the reflective surface by radiating atmospheric plasma onto the reflective surface and measuring a microcontamination level and a damage level of the reflective surface.

公开(公告)号：US20230109672A1

公开(公告)日：2023-04-13

申请号：US17850257

申请日：2022-06-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Changsoon Lim ,  Youngdo Kim ,  Daewon Kang ,  Chansoo Kang ,  Kyunghyun Kim ,  Sangki Nam ,  Kyunjin Lee ,  Sungho Jang ,  Jonghun Pi

IPC: H01J37/32

Abstract: An apparatus includes first and second VI sensors, an optical sensor, and an arcing detector. The first VI sensor is disposed in a power filter or on a power supply line connected to a heater disposed in a lower electrode of a process chamber in which a plasma process is performed. The first VI sensor senses a harmonic generated from a first power supply supplying power to the lower electrode and outputs a first signal. The optical sensor senses an intensity of light generated from the process chamber and outputs a second signal. The second VI sensor is disposed on a power supply line connected to an upper electrode and senses a harmonic generated from a second power supply supplying power to the upper electrode and outputs a third signal. The arcing detector determines whether arcing occurs based on one or more of the first, second, and third signals.