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公开(公告)号：US11940620B2
公开(公告)日：2024-03-26
申请号：US17508224
申请日：2021-10-22
发明人： Changsoon Lim , Youngdo Kim , Daewon Kang , Chansoo Kang , Hoonseop Kim , Sangki Nam , Youngduk Suh , Donghyub Lee , Jonghun Pi
CPC分类号： G02B27/0006 , B08B7/0035 , B08B7/04 , G01N33/0027 , G03F7/70033 , G03F7/7085 , G03F7/70925 , G06T7/001
摘要： A method of cleaning a collector of an extreme ultraviolet light source system includes introducing the collector separated from the extreme ultraviolet light source system into a chamber; capturing an optical image of a reflective surface of the collector; measuring a contamination level of the reflective surface by comparing the optical image with a prestored standard image; performing a first cleaning operation if the contamination level exceeds a preset first reference value, the first cleaning operation including cleaning the reflective surface by spraying dry ice particles onto the reflective surface; and performing a second cleaning operation if the contamination level is less than or equal to the preset first reference value. The second cleaning operation includes cleaning the reflective surface by radiating atmospheric plasma onto the reflective surface and measuring a microcontamination level and a damage level of the reflective surface.
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公开(公告)号：US11676263B2
公开(公告)日：2023-06-13
申请号：US17529403
申请日：2021-11-18
发明人： Dong-Hyub Lee , Kyungsik Kang , Jeong-Gil Kim , Jinyong Kim , Hochul Kim , Yozo Matsuda , Youngduk Suh , Seungkoo Lee , Sungho Jang , Yoojin Jeong
IPC分类号： G06T7/00 , G02B5/10 , G02B5/20 , G02B5/08 , G01M11/00 , G03F7/20 , H04N23/56 , G02B27/10 , G03F7/00
CPC分类号： G06T7/0004 , G01M11/005 , G02B5/0816 , G02B5/0891 , G02B5/10 , G02B5/208 , G02B27/1013 , G03F7/70916 , H04N23/56 , G06T2207/10152
摘要： An extreme ultraviolet (EUV) collector inspection apparatus and method capable of precisely inspecting a contamination state of an EUV collector and EUV reflectance in accordance with the contamination state are provided. The EUV collector inspection apparatus includes a light source arranged in front of an EUV collector to be inspected and configured to output light in a visible light (VIS) band from UV rays, an optical device configured to output narrowband light from the light, and a camera configured to perform imaging from an UV band to a VIS band. An image by wavelength of the EUV collector is obtained by using the optical device and the camera and a contamination state of the EUV collector is inspected.
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公开(公告)号：US20240280917A1
公开(公告)日：2024-08-22
申请号：US18468505
申请日：2023-09-15
发明人： Jung Dohyun , Youngduk Suh , Sungwook Kang , Sanggon Shin , Seunghee Lee , Jinwook Jung
IPC分类号： G03F7/00
CPC分类号： G03F7/70925
摘要： An apparatus for cleaning an EUV light creation chamber may include a cleaning module, a first movement module and a second movement module. The first movement module may support the cleaning module in the EUV light creation chamber along a first direction. The second movement module may support the first movement module on a surface of the EUV light creation chamber at a position along a second direction perpendicular to the first direction.
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公开(公告)号：US20220309643A1
公开(公告)日：2022-09-29
申请号：US17529403
申请日：2021-11-18
发明人： Dong-Hyub Lee , Kyungsik Kang , Jeong-Gil Kim , Jinyong Kim , Hochul Kim , Yozo Matsuda , Youngduk Suh , Seungkoo Lee , Sungho Jang , Yoojin Jeong
摘要： An extreme ultraviolet (EUV) collector inspection apparatus and method capable of precisely inspecting a contamination state of an EUV collector and EUV reflectance in accordance with the contamination state are provided. The EUV collector inspection apparatus includes a light source arranged in front of an EUV collector to be inspected and configured to output light in a visible light (VIS) band from UV rays, an optical device configured to output narrowband light from the light, and a camera configured to perform imaging from an UV band to a VIS band. An image by wavelength of the EUV collector is obtained by using the optical device and the camera and a contamination state of the EUV collector is inspected.
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