公开(公告)号：US20160343355A1

公开(公告)日：2016-11-24

申请号：US15158804

申请日：2016-05-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yang-Hyo KIM ,  Chul-Ho KIM ,  Sun-Young KIM ,  Hak-Song KIM ,  Sang-Hoon LIM

IPC: G09G5/399 ,  G09G5/393

CPC classification number: G09G5/399 ,  G09G5/001 ,  G09G5/003 ,  G09G5/006 ,  G09G5/12 ,  G09G2310/04 ,  G09G2330/021 ,  G09G2350/00 ,  G09G2360/18

Abstract: An display driving circuit including a buffer write controller transmitting a different image frame to a first buffer or a second buffer, a buffer scan controller scanning an image frame stored in the first buffer or the second buffer on the basis of a predetermined cycle, a write signal detector controlling the buffer write controller such that a second image frame is transmitted to the second buffer after a first image frame is transmitted to the first buffer, and a scan buffer switching controller receiving an EOF (End of Frame) command indicating the completion of transmission of the first image frame to the first buffer and controlling the buffer scan controller such that the first image frame stored in the first buffer is scanned after the image frame previously stored in the second buffer is scanned.

Abstract translation: 一种显示驱动电路，包括：向第一缓冲器或第二缓冲器发送不同图像帧的缓冲写入控制器;基于预定周期扫描存储在第一缓冲器或第二缓冲器中的图像帧的缓冲器扫描控制器;写入 信号检测器控制缓冲器写入控制器，使得在将第一图像帧发送到第一缓冲器之后将第二图像帧发送到第二缓冲器，并且扫描缓冲器切换控制器接收指示完成的第二图像帧的EOF（帧结束）命令 将第一图像帧传输到第一缓冲器并控制缓冲器扫描控制器，使得在先前存储在第二缓冲器中的图像帧被扫描之后，扫描存储在第一缓冲器中的第一图像帧。

公开(公告)号：US20200234947A1

公开(公告)日：2020-07-23

申请号：US16733447

申请日：2020-01-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Chul-Ho KIM ,  Yool KANG ,  Jaesung KANG ,  Jinphil CHOI

IPC: H01L21/027 ,  H01L21/311 ,  H01L21/02

Abstract: A method of forming a mask pattern and a method of fabricating a semiconductor device, the method of forming a mask pattern including providing a substrate including a plurality of patterns thereon; forming a mask material solution layer such that the mask material solution layer covers the patterns on the substrate; and applying a liquid material to remove an upper portion of the mask material solution layer, wherein the mask material solution layer includes a fluorine additive concentrated at the upper portion of the mask material solution layer.