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公开(公告)号:US20250042797A1
公开(公告)日:2025-02-06
申请号:US18734543
申请日:2024-06-05
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Daeseon Park , Seoktae Kang , David Kim , Junho Kim , Inseo Yoon , Hansol Jang
IPC: C02F9/00 , C02F1/00 , C02F1/02 , C02F1/44 , C02F1/70 , C02F101/14 , C02F101/16 , C02F103/34
Abstract: An apparatus configured to treat wastewater includes a first water tank configured to store wastewater, a second water tank configured to store absorbent liquid, and a membrane assembly including a membrane including holes, the membrane assembly configured to receive the wastewater from the first water tank and the absorbent liquid from the second water tank, where the membrane assembly is further configured to allow materials to move between the wastewater and the absorbent liquid through the holes, and where, in the membrane assembly, a temperature of the absorbent liquid is different from a temperature of the wastewater.
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公开(公告)号:US20240173671A1
公开(公告)日:2024-05-30
申请号:US18374378
申请日:2023-09-28
Applicant: Samsung Electronics Co., Ltd.
Inventor: Daeok Kim , Dongyeun Koh , David Kim , Jeong-Un Jang
CPC classification number: B01D61/362 , B01D69/02 , B01D69/04 , C01F5/28 , C01F7/50 , C01F11/22 , C02F1/448 , C02F1/66 , B01D2311/04 , B01D2311/06 , B01D2313/243 , B01D2317/02 , B01D2317/04 , B01D2325/38 , C02F2101/14
Abstract: A method for treating wastewater containing fluorine is disclosed. The method for treating wastewater includes applying a vacuum to a membrane unit including a membrane having a hollow, injecting wastewater into the membrane unit so that the wastewater contacts an outer surface of the membrane, recovering hydrofluoric acid gas by evaporating hydrofluoric acid (HF) in the wastewater based on a vacuum applied to the inner surface of the membrane and moving the evaporated hydrofluoric acid (HF) to the inner surface through the membrane, injecting sweep gas into the membrane unit to discharge hydrofluoric acid gas remaining on the inner surface of the membrane, and forming a metal fluoride by reacting the recovered hydrofluoric acid gas with a metal oxide or metal hydroxide using a scrubbing process.
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公开(公告)号:US20240067551A1
公开(公告)日:2024-02-29
申请号:US18451941
申请日:2023-08-18
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: David Kim , Seoktae Kang , Seunghyun Lee , Donghoon Choi , Junho Kim , Daeseon Park
Abstract: Embodiments of the present inventive concept provides a water treating device for treating a circulating water including a storage tank configured to store the circulating water, a first filter configured to filter the circulating water discharged by the storage tank, a phosphorus removing device configured to remove phosphorus contained in the circulating water, and an ultraviolet ray irradiation device configured to irradiate an ultraviolet ray to the circulating water.
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