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1.
公开(公告)号:US20190180972A1
公开(公告)日:2019-06-13
申请号:US16003870
申请日:2018-06-08
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hyun Ho LEE , Jong Mun PARK , Byoung Sup AHN , Jin CHOI , Shuichi TAMAMUSHI
Abstract: An aperture system of an electron beam apparatus includes a plurality of apertures each including a first area including at least one through hole allowing an electron beam to pass therethrough and a second area disposed outside the first area and including first and second alignment keys, wherein two apertures, among the plurality of apertures, include the first alignment keys arranged in mutually overlapping positions and having the same size, and an aperture, excluding the two apertures, among the plurality of apertures, includes the second alignment keys arranged to overlap the first alignment keys and having an area larger than an area of the first alignment keys.
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公开(公告)号:US20180088362A1
公开(公告)日:2018-03-29
申请号:US15716715
申请日:2017-09-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Young Soo KIM , Hyun Ho LEE , Tae Soon PARK
IPC: G02F1/061 , C07D327/04 , C07C309/66
CPC classification number: G02F1/061 , B60R1/088 , C07C309/66 , C07D327/04 , G02F1/0102 , G02F1/0121 , G02F1/1506 , G02F1/1525 , G02F1/157 , G02F1/163
Abstract: An electrochemical mirror includes a first transparent electrode; a second transparent electrode disposed to be spaced apart from the first transparent electrode; and an electrolyte layer disposed between the first transparent electrode and the second transparent electrode and including an electrolyte solution, the electrolyte solution including a compound having a sulfonate functional group or a derivative compound having the same, as an electrolyte solution additive.
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