公开(公告)号：US20220093405A1

公开(公告)日：2022-03-24

申请号：US17544990

申请日：2021-12-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin SHIN ,  Woo-Mok SON ,  Nam-Hoon LEE ,  Dong-Eog KIM ,  Seung-Hun OH ,  Eun-Seok LEE ,  Young-Seok JANG

IPC: H01L21/304 ,  H01L21/02 ,  H01L21/66

Abstract: In a method of manufacture, a displacement sensor is provided over a conditioner disk. The conditioner disk is rotated to perform a conditioning process on a polishing surface of a polishing pad. A displacement of the rotating conditioner disk is detected using the displacement sensor during the conditioning process. A height of the conditioner disk is calculated from the detected displacement. An end point of the conditioning process is determined on the polishing surface based on the calculated height.

公开(公告)号：US20160144392A1

公开(公告)日：2016-05-26

申请号：US14809548

申请日：2015-07-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seung-Min RYU ,  Bo-Kyung JUNG ,  Kwang-Hyuk CHOI ,  Nam-Hoon LEE ,  Jong-Hyun LEE ,  Jin SHIN ,  Kyeong-Min YEO ,  Jong-Han OH

IPC: B05B15/04 ,  B05B12/00

CPC classification number: H01L51/0011 ,  C23C14/042 ,  C23C14/50 ,  C23C14/54

Abstract: An apparatus for organic layer deposition is provided that can improve precision of a gap between a substrate and a mask by correcting a position of a mask stage having a mask mounted thereon based on a substrate shape, and that can reduce a measurement error of a mask surface by pre-measuring a position of a mask and determining an initial position of the mask based on the measured position. The apparatus includes a shape measuring sensor, a substrate carrier, a deposition material discharge source, a mask including a plurality of pattern slits, a camera measuring an alignment error between the substrate and the mask, a distance measuring sensor measuring an alignment error between the substrate and the mask, and a mask stage controlling a position of the mask.

Abstract translation: 提供一种有机层沉积装置，其可以通过基于衬底形状校正其上安装有掩模的掩模台的位置来提高基板和掩模之间的间隙的精度，并且可以减少掩模的测量误差 通过预先测量掩模的位置并基于所测量的位置确定掩模的初始位置。 该装置包括形状测量传感器，衬底载体，沉积材料放电源，包括多个图案狭缝的掩模，测量衬底和掩模之间的对准误差的照相机，测量在衬底和掩模之间的对准误差的距离测量传感器 衬底和掩模，以及控制掩模位置的掩模台。

公开(公告)号：US20200152469A1

公开(公告)日：2020-05-14

申请号：US16426117

申请日：2019-05-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin SHIN ,  Woo-Mok SON ,  Nam-Hoon LEE ,  Dong-Eog KIM ,  Seung-Hun OH ,  Eun-Seok LEE ,  Young-Seok JANG

IPC: H01L21/304 ,  H01L21/02 ,  H01L21/66

Abstract: In a method of manufacture, a displacement sensor is provided over a conditioner disk. The conditioner disk is rotated to perform a conditioning process on a polishing surface of a polishing pad. A displacement of the rotating conditioner disk is detected using the displacement sensor during the conditioning process. A height of the conditioner disk is calculated from the detected displacement. An end point of the conditioning process is determined on the polishing surface based on the calculated height.

公开(公告)号：US20160343597A1

公开(公告)日：2016-11-24

申请号：US15094072

申请日：2016-04-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dongseok Baek ,  Jin SHIN ,  Sungman KIM

IPC: H01L21/67 ,  H01L21/68 ,  G01D5/26 ,  B24B49/12 ,  G01N21/95 ,  G01N21/94

CPC classification number: H01L21/67288 ,  B24B49/12 ,  G01N21/94 ,  G01N21/9501 ,  G01N2201/0636 ,  H01L21/67092 ,  H01L21/67253 ,  H01L21/681

Abstract: A substrate-treating apparatus according to an example embodiment of the inventive concepts includes a support unit on which a substrate is loaded, an optical measurement unit providing light to the substrate to obtain image data and checking whether the substrate is abnormal or not, based on the image data, and a control unit controlling the support unit and the optical measurement unit. The control unit processes the image data transmitted from the optical measurement unit. The control unit includes an interlock control part performing an interlock operation interrupting a process performed on the substrate if an abnormal signal is detected from the image data.

Abstract translation: 根据本发明的示例性实施例的基板处理装置包括：载体，其上装载有基板的支撑单元，基于基板的光学测量单元向基板提供光以获得图像数据并检查基板是否异常，基于 所述图像数据以及控制所述支持单元和所述光学测量单元的控制单元。 控制单元处理从光学测量单元发送的图像数据。 如果从图像数据检测到异常信号，则控制单元包括互锁控制部分，执行互锁操作中断在基板上执行的处理。