SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR SUBSTRATE MEASURING APPARATUS USING THE SAME

    公开(公告)号:US20220037215A1

    公开(公告)日:2022-02-03

    申请号:US17180343

    申请日:2021-02-19

    Abstract: A semiconductor substrate processing apparatus includes: a metastructure layer divided into a plurality of microstructures by grooves, a light-transmitting dielectric substrate that supports the plurality of microstructures and is configured to allow an electromagnetic wave to be transmitted therethrough, and a frame including an exhaust hole configured to receive gas introduced from the grooves such as to provide suction force to the semiconductor substrate, wherein each of the plurality of microstructures has a smaller width than a wavelength of the electromagnetic wave, and each of the grooves has a smaller width than the wavelength of the electromagnetic wave.

    STORAGE DEVICE AND OPERATING METHOD THEREOF

    公开(公告)号:US20220188021A1

    公开(公告)日:2022-06-16

    申请号:US17548889

    申请日:2021-12-13

    Inventor: Junbum PARK

    Abstract: A storage device includes a buffer memory configured to temporarily store data; a plurality of nonvolatile memory devices; a storage controller circuit configured to generate buffer memory status information by monitoring a status of the buffer memory and operating in a congestion control mode of setting a buffer memory data transmission authority of a nonvolatile memory based on the generated buffer memory status information; and a first interface circuit configured to communicate with the storage controller circuit and the plurality of nonvolatile memory devices, wherein the first interface circuit is connected to a network based on an Ethernet interface.

    PROBE FOR DETECTING NEAR FIELD AND NEAR-FIELD DETECTION SYSTEM INCLUDING THE SAME

    公开(公告)号:US20220082584A1

    公开(公告)日:2022-03-17

    申请号:US17333924

    申请日:2021-05-28

    Abstract: A near-field detection system includes include an electric field generator configured to apply an electric field to an analysis sample, a probe configured to detect a near field that has passed through the analysis sample, a current detector connected to the probe, and a laser system irradiating a laser to each of the electric field generator and the probe. The probe includes a cantilever substrate, an antenna electrode on the cantilever substrate, an electromagnetic wave blocking layer exposing a sensing region of the cantilever substrate, the electromagnetic wave blocking layer including a conductive material, and an insulating layer interposed between the cantilever substrate and the electromagnetic wave blocking layer such that the insulating layer is between the antenna electrode and the electromagnetic wave blocking layer.

    SEMICONDUCTOR SUBSTRATE MEASURING APPARATUS AND PLASMA TREATMENT APPARATUS USING THE SAME

    公开(公告)号:US20210074594A1

    公开(公告)日:2021-03-11

    申请号:US16847727

    申请日:2020-04-14

    Abstract: A semiconductor substrate measuring apparatus includes a light source to generate irradiation light having a sequence of on/off at a predetermined interval, the light source to provide the irradiation light to a chamber with an internal space for processing a semiconductor substrate using plasma, an optical device between the light source and the chamber, the optical device to split a first measurement light into a first optical path, condensed while the light source is turned on, to split a second measurement light into a second optical path, condensed while the light source is turned off, and to synchronize with the on/off sequence, and a photodetector connected to the first and second optical paths, the photodetector to subtract spectra of first and second measurement lights to detect spectrum of reflected light, and to detect plasma emission light emitted from the plasma based on the spectrum of the second measurement light.

    OPTICAL EMISSION SPECTROSCOPY CALIBRATION DEVICE AND SYSTEM INCLUDING THE SAME

    公开(公告)号:US20200319025A1

    公开(公告)日:2020-10-08

    申请号:US16751356

    申请日:2020-01-24

    Abstract: An optical emission spectroscopy (OES) calibration system includes a chamber, an adapter, an OES device, a calibration device, and a spectrometer. The chamber includes a viewport. The adapter is fastened to the viewport, and includes a first beam splitter and a second beam splitter. The OES device detects plasma light generated in the chamber and transmitted through the adapter and generates OES data based on the detected plasma light. The calibration device includes a light source, and generates correction data for compensating for deviations in the OES data. The spectrometer detects light emitted from the light source and split by the first beam splitter or the second beam splitter. Each of the OES device, the calibration device, and the spectrometer is fastened to the adapter through an optical cable, and the calibration device generates the correction data using an intensity of light detected by the spectrometer.

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