SEMICONDUCTOR SUBSTRATE MEASURING APPARATUS AND PLASMA TREATMENT APPARATUS USING THE SAME

    公开(公告)号:US20210074594A1

    公开(公告)日:2021-03-11

    申请号:US16847727

    申请日:2020-04-14

    摘要: A semiconductor substrate measuring apparatus includes a light source to generate irradiation light having a sequence of on/off at a predetermined interval, the light source to provide the irradiation light to a chamber with an internal space for processing a semiconductor substrate using plasma, an optical device between the light source and the chamber, the optical device to split a first measurement light into a first optical path, condensed while the light source is turned on, to split a second measurement light into a second optical path, condensed while the light source is turned off, and to synchronize with the on/off sequence, and a photodetector connected to the first and second optical paths, the photodetector to subtract spectra of first and second measurement lights to detect spectrum of reflected light, and to detect plasma emission light emitted from the plasma based on the spectrum of the second measurement light.

    OPTICAL EMISSION SPECTROSCOPY CALIBRATION DEVICE AND SYSTEM INCLUDING THE SAME

    公开(公告)号:US20200319025A1

    公开(公告)日:2020-10-08

    申请号:US16751356

    申请日:2020-01-24

    IPC分类号: G01J3/02 G01J3/10 G02B27/14

    摘要: An optical emission spectroscopy (OES) calibration system includes a chamber, an adapter, an OES device, a calibration device, and a spectrometer. The chamber includes a viewport. The adapter is fastened to the viewport, and includes a first beam splitter and a second beam splitter. The OES device detects plasma light generated in the chamber and transmitted through the adapter and generates OES data based on the detected plasma light. The calibration device includes a light source, and generates correction data for compensating for deviations in the OES data. The spectrometer detects light emitted from the light source and split by the first beam splitter or the second beam splitter. Each of the OES device, the calibration device, and the spectrometer is fastened to the adapter through an optical cable, and the calibration device generates the correction data using an intensity of light detected by the spectrometer.

    PLASMA CONTROL DEVICE AND PLASMA PROCESSING SYSTEM

    公开(公告)号:US20230091161A1

    公开(公告)日:2023-03-23

    申请号:US17711181

    申请日:2022-04-01

    IPC分类号: H01J37/32 H01L21/311

    摘要: A plasma control device includes a matching circuit, a resonance circuit, and a controller. The matching circuit is connected to a first electrode of a plasma chamber including the first electrode and a second electrode, and matches impedance of a radio frequency (RF) power by an RF driving signal with an impedance of the first electrode. The RF driving signal is based on a first RF signal having a first frequency. The resonance circuit is connected between the second electrode and a ground voltage, and controls plasma distribution within the plasma chamber by providing resonance with respect to harmonics associated with the first frequency and by adjusting a ground impedance between the second electrode and the ground voltage. The controller provides the resonance circuit with a capacitance control signal associated with the resonance and switch control signals associated with the ground impedance.