OPTICAL MEASUREMENT APPARATUS, OPTICAL MEASUREMENT METHOD USING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

    公开(公告)号:US20240219314A1

    公开(公告)日:2024-07-04

    申请号:US18469107

    申请日:2023-09-18

    CPC classification number: G01N21/9501 H01L22/12

    Abstract: A method for manufacturing a semiconductor device includes generating light, modulating power of the light to generate power-modulated light, acquiring an image signal of a measurement target using the power-modulated light, filtering the image signal to separate a real signal and a false signal, analyzing the measurement target using the real signal, and performing a semiconductor process on the measurement target based analyzing the measurement target using the real signal, wherein filtering the image signal includes classifying a first component of the image signal that is dependent on power of the power-modulated light as the real signal, and classifying a second component of the image signal that is independent of the power of the power-modulated light as the false signal.

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