Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device
    1.
    发明授权
    Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device 有权
    光掩模,校正误差的方法,使用光掩模制造的集成电路器件以及集成电路器件的制造方法

    公开(公告)号:US09588413B2

    公开(公告)日:2017-03-07

    申请号:US15258163

    申请日:2016-09-07

    CPC classification number: G03F1/24 G03F1/38 G03F1/72 G03F1/74

    Abstract: Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.

    Abstract translation: 提供一种光掩模和一种校正其错误的方法。 光掩模包括覆盖基板的一个侧表面的多层反射膜和覆盖基板的另一侧表面的能量接收层。 该方法包括根据检测到的光掩模误差确定光掩模的前表面上的局部校正位置,并将能量束局部地施加到与沿局部校正位置的局部校正位置对准的光掩模的背侧表面区域 光掩模 本发明可以应用于受到表面高度的改变或选择性施加的应力的光掩模以外的结构的影响。

    Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device
    3.
    发明授权
    Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device 有权
    光掩模,校正误差的方法,使用光掩模制造的集成电路器件以及集成电路器件的制造方法

    公开(公告)号:US09465286B2

    公开(公告)日:2016-10-11

    申请号:US14565087

    申请日:2014-12-09

    CPC classification number: G03F1/24 G03F1/38 G03F1/72 G03F1/74

    Abstract: Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.

    Abstract translation: 提供一种光掩模和一种校正其错误的方法。 光掩模包括覆盖基板的一个侧表面的多层反射膜和覆盖基板的另一侧表面的能量接收层。 该方法包括根据检测到的光掩模的误差来确定光掩模的前表面上的局部校正位置,并且将能量束局部地施加到与沿局部校正位置的厚度方向对齐的光掩模的背面表面区域 光掩模 本发明可以应用于受到表面高度的改变或选择性施加的应力的光掩模以外的结构的影响。

    FOCUSED ULTRASOUND THERAPY APPARATUS AND FOCAL POINT CONTROLLING METHOD THEREOF
    4.
    发明申请
    FOCUSED ULTRASOUND THERAPY APPARATUS AND FOCAL POINT CONTROLLING METHOD THEREOF 审中-公开
    聚焦超声治疗装置及其焦点控制方法

    公开(公告)号:US20140046225A1

    公开(公告)日:2014-02-13

    申请号:US13913889

    申请日:2013-06-10

    Abstract: A focal point controlling method of a focused ultrasound therapy apparatus includes receiving a plurality of focal point positions on which a focal point of an ultrasonic wave is to be formed, and receiving a sound pressure that is to be applied by the ultrasonic wave to each of the plurality of focal point positions, determining a particle velocity at each of a plurality of elements included in an ultrasound transducer, and radiating the ultrasonic wave according to the determined particle velocity. The particle velocity may be determined based on the received sound pressure that is to be applied by the ultrasonic wave to each of the plurality of focal point positions, by reflecting a sound pressure distribution of the ultrasonic wave that is generated by each of the plurality of elements.

    Abstract translation: 聚焦超声波治疗装置的焦点控制方法包括:接收要在其上形成超声波的焦点的多个焦点位置,并且将超声波施加的声压接收到 所述多个焦点位置,确定包括在超声波换能器中的多个元件中的每一个处的粒子速度,并根据确定的粒子速度辐射超声波。 可以通过反映由多个焦点位置中的每一个产生的超声波的声压分布,基于由超声波施加到多个焦点位置中的每一个的接收声压来确定粒子速度 元素。

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