公开(公告)号：US20240143886A1

公开(公告)日：2024-05-02

申请号：US18342011

申请日：2023-06-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kyeonghwan Kang ,  Jungmin Kim ,  Hungbae Ahn

IPC: G06F30/392 ,  G06T7/00 ,  G06T7/13 ,  G06T7/73

CPC classification number: G06F30/392 ,  G06T7/0006 ,  G06T7/001 ,  G06T7/13 ,  G06T7/73 ,  G06T2207/20081 ,  G06T2207/30148

Abstract: a method of correcting a layout for semiconductor process includes receiving a design layout including a layout pattern for the semiconductor process to form a process pattern of a semiconductor device, where the design layout comprises a pixel-based image associated with the layout pattern and edge information associated with the layout pattern; performing a first layout correction operation on the design layout using a first machine learning model that takes the pixel-based image as input; performing a second layout correction operation on the design layout using a second machine learning model different from the first machine learning model that takes the edge information as input; and obtaining a corrected design layout including a corrected layout pattern corresponding to the layout pattern based on a result of the first layout correction operation and a result of the second layout correction operation.

公开(公告)号：US11900043B2

公开(公告)日：2024-02-13

申请号：US17701520

申请日：2022-03-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sooyong Lee ,  Dongho Kim ,  Sangwook Kim ,  Jungmin Kim ,  Seunghune Yang ,  Jeeyong Lee ,  Changmook Yim ,  Yangwoo Heo

IPC: G06F30/30 ,  G03F7/00 ,  G06F30/398 ,  G06F30/392 ,  G06F30/27 ,  G06F119/18

CPC classification number: G06F30/398 ,  G03F7/705 ,  G03F7/70441 ,  G06F30/27 ,  G06F30/392 ,  G06F2119/18

Abstract: Disclosed is an operating method of an electronic device which includes receiving a design layout for manufacturing the semiconductor device, generating a first layout by performing machine learning-based process proximity correction (PPC), generating a second layout by performing optical proximity correction (OPC), and outputting the second layout for a semiconductor process. The generating of the first layout includes generating a first after cleaning inspection (ACI) layout by executing a machine learning-based process proximity correction module on the design layout, generating a second after cleaning inspection layout by adjusting the design layout based on a difference of the first after cleaning inspection layout and the design layout and executing the process proximity correction module on the adjusted layout, and outputting the adjusted layout as the first layout, when a difference between the second after cleaning inspection layout and the design layout is smaller than or equal to a threshold value.

公开(公告)号：US20160307740A1

公开(公告)日：2016-10-20

申请号：US15092965

申请日：2016-04-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jungmin Kim ,  Jin Young Bang ,  Sejin Oh ,  Taekyun Kang ,  Myoung Soo Park ,  Dougyong Sung

IPC: H01J37/32 ,  H01L21/67

CPC classification number: H01J37/32495 ,  H01J37/321 ,  H01J37/32477 ,  H01L21/6719 ,  H01L21/6831

Abstract: A substrate processing system and a method of coating a ceramic layer therewith are provided. The system may include a chamber and a ceramic layer on an inner surface of the chamber. The ceramic layer may include yttrium oxyfluoride (YxOyFz), where x=1, y=1, 2, and z=1, 2.

Abstract translation: 提供了一种衬底处理系统及其陶瓷层的涂覆方法。 该系统可以在腔室的内表面上包括腔室和陶瓷层。 陶瓷层可以包括氟化钇（YxOyFz），其中x = 1，y = 1,2和z = 1,2。

公开(公告)号：US09091716B2

公开(公告)日：2015-07-28

申请号：US13644793

申请日：2012-10-04

Applicant: Samsung Electronics Co. Ltd.

Inventor： Jungmin Kim ,  Keonyoung Seo ,  Kwangmo Yang ,  Byeonghwan Kang ,  Bonghee Park

IPC: G01R31/00 ,  H04M1/24

CPC classification number: G01R31/001 ,  G01R29/0871 ,  G01R31/002 ,  H04M1/24

Abstract: A method and an apparatus for measuring performance of an electronic device are provided. The apparatus includes an electromagnetic wave measuring device for measuring an actual level of an electromagnetic wave of an electronic device, and an analysis controller for applying a previously stored level change value to the actual level of the electromagnetic wave to compute a measured level of the electromagnetic wave. The method and the apparatus for measuring performance of an electronic device can easily measure an electromagnetic wave level of the electronic device without using a device suggested by an international standard.

Abstract translation: 提供了一种用于测量电子设备性能的方法和装置。 该装置包括用于测量电子设备的电磁波的实际电平的电磁波测量装置和用于将预先存储的电平变化值应用于电磁波的实际电平的分析控制器，以计算电磁波的测量电平 波。 用于测量电子设备性能的方法和装置可以容易地测量电子设备的电磁波水平，而不使用国际标准建议的设备。