公开(公告)号：US20150059808A1

公开(公告)日：2015-03-05

申请号：US14473193

申请日：2014-08-29

Applicant: Semes Co., Ltd.

Inventor： Jintack YU ,  Jae-Myoung LEE

IPC: B08B3/02

CPC classification number: H01L21/67051

Abstract: Provided is an apparatus for processing a substrate including a spin head on which a substrate is placed, a container provided to surround the spin head, an upper nozzle member supplying a processing solution downwards, a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head.

Abstract translation: 本发明提供一种处理包括旋转头的基板的设备，其上放置有基板，设置成围绕旋转头的容器，向上提供处理溶液的上部喷嘴构件，位于距离该旋转头一定距离的底部清洁构件 旋转头的底部，其中底部清洁构件将清洁溶液喷射到旋转头的底部。

公开(公告)号：US20210074557A1

公开(公告)日：2021-03-11

申请号：US16952629

申请日：2020-11-19

Applicant: SEMES CO., LTD.

Inventor： Jintack YU ,  Jaemyoung LEE

IPC: H01L21/67 ,  H01L21/02 ,  B08B3/02

Abstract: Provided is an apparatus for processing a substrate including a spin head on which a substrate is placed, a container provided to surround the spin head, an upper nozzle member supplying a processing solution downwards, a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head.

公开(公告)号：US20170338132A1

公开(公告)日：2017-11-23

申请号：US15671848

申请日：2017-08-08

Applicant: SEMES CO., LTD.

Inventor： Jintack YU ,  Jaemyoung LEE

IPC: H01L21/67

CPC classification number: H01L21/67051

Abstract: Provided is an apparatus for processing a substrate including a spin head on which a substrate is placed, a container provided to surround the spin head, an upper nozzle member supplying a processing solution downwards, a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head.