Abstract:
An apparatus includes: groups of ferroelectric memory bit cells; and memory interface circuitry having processing outputs and memory access terminals. The memory access terminals are coupled to the groups of ferroelectric memory bit cells. The memory interface circuitry is configured to: provide control signals via the memory access terminals to perform read operations on the groups of ferroelectric memory bit cells; receive first signals from the groups of ferroelectric memory bit cells via the memory access terminals from the read operations; and for each group of the groups of ferroelectric memory bit cells, provide second signals representing relationships between the first signals received from the group of ferroelectric memory bit cells and a respective reference voltage of the reference voltages at the processing outputs, the reference voltages representing different temperatures.
Abstract:
In some examples, a package includes a semiconductor die having a first surface and a second surface opposing the first surface, the semiconductor die including circuitry in the first surface. The package also includes an acoustic waveguide in the semiconductor die, the acoustic waveguide including an array of capacitors and a connector coupling the circuitry to the acoustic waveguide.
Abstract:
In some examples, a package comprises a semiconductor die having a first surface and a second surface opposing the first surface, the semiconductor die including circuitry formed in the first surface. The package includes an acoustic waveguide in the semiconductor die, the acoustic waveguide including an array of capacitors. The array of capacitors includes a transducer portion and a diffraction grating portion. The transducer portion is configured to convert signals between electrical signals and acoustic waves, and the diffraction grating portion is configured to direct the acoustic waves toward and receive the acoustic waves from the second surface.
Abstract:
An integrated circuit structure with a metal-to-metal capacitor and a metallic device such as a resistor, effuse, or local interconnect where the bottom plate of the capacitor and the metallic device are formed with the same material layers. A process for forming a metallic device along with a metal-to-metal capacitor with no additional manufacturing steps.