公开(公告)号：US20230136986A1

公开(公告)日：2023-05-04

申请号：US17973953

申请日：2022-10-26

Applicant: TOKUYAMA CORPORATION

Inventor： Naoto NOMURA ,  Kosuke NORO ,  Yoshiki SEIKE ,  Manami OSHIO ,  Yuichiro KAWABATA ,  Seiji TONO

IPC: H01L21/465

Abstract: An object of the present invention is to provide an etching liquid having a high silicon etch selectivity with respect to silicon-germanium and a high long term stability at a processing temperature, in surface processing during the production of various semiconductor devices, especially various silicon composite semiconductor devices containing silicon-germanium, and the problem is solved by a silicon etching liquid containing an alkaline compound, an aldehyde compound, and water, the aldehyde compound being a water-soluble aromatic aldehyde.