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公开(公告)号:US20170191153A1
公开(公告)日:2017-07-06
申请号:US15325105
申请日:2015-07-27
Applicant: TOSOH CORPORATION
Inventor: Kenji OMI , Kenichi ITOH , Kentarou UTSUMI
CPC classification number: C23C14/086 , C04B35/44 , C04B35/453 , C04B35/462 , C04B35/64 , C04B2235/3217 , C04B2235/3222 , C04B2235/3232 , C04B2235/3234 , C04B2235/3284 , C04B2235/5409 , C04B2235/5436 , C04B2235/5445 , C04B2235/5463 , C04B2235/602 , C04B2235/656 , C04B2235/6562 , C04B2235/6565 , C04B2235/6567 , C04B2235/6585 , C04B2235/6586 , C04B2235/77 , C04B2235/80 , C23C14/08 , C23C14/081 , C23C14/083 , C23C14/34 , C23C14/3414 , H01B1/023 , H01B1/08 , H01B5/14
Abstract: The purpose of the present invention is to provide a sintered oxide to be used for a sputtering target, whereby little abnormal discharge occurs even during high-power film-deposition and no cracking occurs in the target. A sintered oxide having zinc, aluminum, titanium and oxygen, as constituent elements, characterized in that when the contents of zinc, aluminum and titanium are represented by Zn, Al, and Ti, respectively, the atomic ratios of the elements constituting the sintered oxide are Al/(Zn+Al+Ti)=0.035 to 0.050 and Ti/(Zn+Al+Ti)=0.05 to 0.20, and the average grain size of crystal grains having a Zn2TiO4 crystal phase as the matrix phase in the sintered oxide, is at most 5 μm.