公开(公告)号：US11362038B2

公开(公告)日：2022-06-14

申请号：US17062677

申请日：2020-10-05

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yeong-Jyh Lin ,  Ching I Li ,  De-Yang Chiou ,  Sz-Fan Chen ,  Han-Jui Hu ,  Ching-Hung Wang ,  Ru-Liang Lee ,  Chung-Yi Yu

IPC: H01L23/544 ,  H01L21/027 ,  H01L21/683 ,  G03F1/42 ,  G03F1/70 ,  H01L21/66

Abstract: Various embodiments of the present disclosure are directed towards a method for forming a semiconductor structure. The method includes forming a plurality of upper alignment marks on a semiconductor wafer. A plurality of lower alignment marks is formed on a handle wafer and correspond to the upper alignment marks. The semiconductor wafer is bonded to the handle wafer such that centers of the upper alignment marks are laterally offset from centers of corresponding lower alignment marks. An overlay (OVL) shift is measured between the handle wafer and the semiconductor wafer by detecting the plurality of upper alignment marks and the plurality of lower alignment marks. A photolithography process is performed by a photolithography tool to partially form an integrated circuit (IC) structure over the semiconductor wafer. During the photolithography process the photolithography tool is compensatively aligned according to the OVL shift.

公开(公告)号：US20210375781A1

公开(公告)日：2021-12-02

申请号：US17062677

申请日：2020-10-05

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yeong-Jyh Lin ,  Ching I Li ,  De-Yang Chiou ,  Sz-Fan Chen ,  Han-Jui Hu ,  Ching-Hung Wang ,  Ru-Liang Lee ,  Chung-Yi Yu

IPC: H01L23/544 ,  H01L21/027 ,  H01L21/683 ,  H01L21/66 ,  G03F1/42 ,  G03F1/70

Abstract: Various embodiments of the present disclosure are directed towards a method for forming a semiconductor structure. The method includes forming a plurality of upper alignment marks on a semiconductor wafer. A plurality of lower alignment marks is formed on a handle wafer and correspond to the upper alignment marks. The semiconductor wafer is bonded to the handle wafer such that centers of the upper alignment marks are laterally offset from centers of corresponding lower alignment marks. An overlay (OVL) shift is measured between the handle wafer and the semiconductor wafer by detecting the plurality of upper alignment marks and the plurality of lower alignment marks. A photolithography process is performed by a photolithography tool to partially form an integrated circuit (IC) structure over the semiconductor wafer. During the photolithography process the photolithography tool is compensatively aligned according to the OVL shift.