公开(公告)号：US20200317582A1

公开(公告)日：2020-10-08

申请号：US16830025

申请日：2020-03-25

Applicant: NIPPON TUNGSTEN CO., LTD. ,  TOKYO ELECTRON LIMITED

Inventor： Takashi IKEDA ,  Hajime ISHII ,  Kenji FUJIMOTO ,  Naoyuki SATOH ,  Nobuyuki NAGAYAMA ,  Koichi MURAKAMI ,  Takahiro MURAKAMI

IPC: C04B35/56 ,  C23F4/00 ,  H01L21/67

Abstract: A member for a plasma processing apparatus has a tungsten carbide phase, and a sub-phase including at least one selected from the group consisting of phase I to IV, and phase V, in which the phase I is a carbide phase containing, as a constituent element, at least one of the elements of Group IV, V, and VI of the periodic table excluding W, the phase II is a nitride phase containing, as a constituent element, at least one of the elements of Group IV, V, and VI of the periodic table excluding W, the phase III is a carbonitride phase containing, as a constituent element, at least one of the elements of Group IV, Group V, and Group VI of the periodic table excluding W, the phase IV is a carbon phase, the phase V is a composite carbide phase which is represented by a formula WxMyCz.

公开(公告)号：US20200317583A1

公开(公告)日：2020-10-08

申请号：US16830205

申请日：2020-03-25

Applicant: NIPPON TUNGSTEN CO., LTD. ,  TOKYO ELECTRON LIMITED

Inventor： Takashi IKEDA ,  Hajime ISHII ,  Kenji FUJIMOTO ,  Naoyuki SATOH ,  Nobuyuki NAGAYAMA ,  Koichi MURAKAMI ,  Takahiro MURAKAMI

IPC: C04B35/56 ,  C23F4/00 ,  H01L21/67

Abstract: Provided is a member for a plasma processing apparatus consisting of a tungsten carbide phase. The member includes at least one type of atom selected from the group consisting of a Fe atom, a Co atom, and a Ni atom, in which the total content of the atoms is in a range of 30 to 3300 atomic ppm.

公开(公告)号：US20150129112A1

公开(公告)日：2015-05-14

申请号：US14528001

申请日：2014-10-30

Applicant: Tokyo Electron Limited

Inventor： Michishige SAITO ,  Koichi MURAKAMI ,  Takashi YAMAMOTO

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32522 ,  H01J37/32532 ,  H01J37/32541 ,  H01J37/3255

Abstract: A shower head assembly includes an electrode plate, and a laminate base that is constituted of ceramic sheets and provided to hold the electrode plate. The laminate base includes no bonding surface between the ceramic sheets. The laminate base includes a first gas diffusion space formed in its central area and a second gas diffusion space formed in its peripheral area. A first heater electrode layer is provided above the first gas diffusion space, and a second heater electrode layer is provided above the second gas diffusion space. A first coolant passage is formed above the first gas diffusion space, and a second coolant passage is formed above the second gas diffusion space. A first gas supply passage is connected to the first gas diffusion space, and a second gas supply passage is connected to the second gas diffusion space.

Abstract translation: 淋浴头组件包括电极板和由陶瓷片构成并设置成夹持电极板的层叠基座。 层压基底不包括陶瓷片之间的粘合表面。 层叠基部包括在其中心区域形成的第一气体扩散空间和形成在其周边区域中的第二气体扩散空间。 第一加热电极层设置在第一气体扩散空间的上方，第二加热电极层设置在第二气体扩散空间的上方。 第一冷却剂通道形成在第一气体扩散空间上方，第二冷却剂通道形成在第二气体扩散空间的上方。 第一气体供给通路与第一气体扩散空间连接，第二气体供给路与第二气体扩散空间连接。