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    Silicone Based Nanocomposites Including Inorganic Nanoparticles and Their Methods of Manufacture and Use
    1.
    发明申请
    Silicone Based Nanocomposites Including Inorganic Nanoparticles and Their Methods of Manufacture and Use 有权
    包含无机纳米粒子的硅基纳米复合材料及其制造和使用方法

    公开(公告)号：US20140343233A1

    公开(公告)日：2014-11-20

    申请号：US14359728

    申请日：2012-11-21

    Applicant: UNIVERSITY OF SOUTH CAROLINA ,  RENSSELAER POLYTECHNIC INSTITUTE

    Inventor： Brian C. Benicewicz ,  Peng Tao ,  Ying Li ,  Linda Schadler Feist ,  Richard W. Siegel ,  Anand Viswanath

    IPC: C08L83/04

    CPC classification number: C08L83/04 ,  C08G77/30 ,  C08K3/36 ,  C08L83/08

    Abstract: Silicone-based nanocomposites that include a plurality of multimodal nanoparticles dispersed within a silicone-based polymeric matrix are provided. Each of the multimodal nanoparticle has a first plurality of long silicone compatible polymeric chains and a second plurality of short silicone compatible polymeric chains grafted onto a surface of a nanoparticle (e.g., an inorganic nanoparticle, such as silica, alumina, titania, indium tin oxide, CdSe, etc.), with the short silicone compatible polymeric chains present on each multimodal nanoparticle at a higher grafting density than the long silicone compatible polymeric chains. Methods are also provided for forming a silicone-based nanocomposite.

    Abstract translation: 提供了包含分散在硅氧烷基聚合物基质内的多个多峰纳米颗粒的基于硅氧烷的纳米复合材料。 每个多峰纳米颗粒具有第一多个长硅氧烷相容的聚合物链和接枝到纳米颗粒表面上的第二多个短硅氧烷相容的聚合物链（例如，无机纳米颗粒，例如二氧化硅，氧化铝，二氧化钛，氧化铟锡 ，CdSe等），其中短的硅氧烷相容的聚合物链以比长硅氧烷相容的聚合物链更高的接枝密度存在于每个多峰纳米颗粒上。 还提供了形成硅氧烷基纳米复合材料的方法。

    NOVEL PHOSPHONATE AND PHOSPHONIC ACID RAFT AGENTS AND MONOMERS, ALONG WITH METHODS OF THEIR MANUFACTURE AND USE
    5.
    发明申请
    NOVEL PHOSPHONATE AND PHOSPHONIC ACID RAFT AGENTS AND MONOMERS, ALONG WITH METHODS OF THEIR MANUFACTURE AND USE 有权
    新型磷酸酯和磷酸酯化剂和单体，与其制造和使用方法

    公开(公告)号：US20160257771A1

    公开(公告)日：2016-09-08

    申请号：US15155719

    申请日：2016-05-16

    Applicant: University of South Carolina

    Inventor： Brian Benicewicz ,  Anand Viswanath ,  Alexandra Nicole Green

    IPC: C08F2/38 ,  C07F9/40 ,  C07F9/38

    CPC classification number: C08F2/38 ,  C07C329/00 ,  C07F9/3808 ,  C07F9/4006 ,  C08F2438/03

    Abstract: An intermediate compound for forming a RAFT agent is provided that can have the formula: where n is an integer from 1 to 20; m is an integer from 0 to 20; R1 is H, an alkyl group, or a cyano group; R2 is H, an alkyl group, or a cyano group; Y is OH, COOH, or NH2; and X is OH, COOH, NH2, a nitrobenzyl, benzyl, or para-methyl benzyl group. A RAFT agent is also provided that comprises a thiocarbonylthio-containing organic compound having a phosphonic end group. A method is also provided for forming a polymer chain on a surface of a nanoparticle utilizing the RAFT agent, along with nanoparticles and nanocomposites formed therefrom.

    Abstract translation: 提供一种用于形成RAFT试剂的中间体化合物，其可以具有下式：其中n为1至20的整数; m为0〜20的整数; R1是H，烷基或氰基; R2是H，烷基或氰基; Y是OH，COOH或NH 2; X是OH，COOH，NH 2，硝基苄基，苄基或对甲基苄基。 还提供了包含具有膦酸端基的含硫代羰硫基的有机化合物的RAFT试剂。 还提供了一种利用RAFT剂在纳米颗粒的表面上形成聚合物链的方法，以及由其形成的纳米颗粒和纳米复合材料。

    Initiator for surface-based polymerization and use thereof
    6.
    发明授权
    Initiator for surface-based polymerization and use thereof 有权

    公开(公告)号：US10400054B2

    公开(公告)日：2019-09-03

    申请号：US16001027

    申请日：2018-06-06

    Applicant: University of South Carolina

    Inventor： Anand Viswanath ,  Brian C. Benicewicz ,  Michael H. Bell

    IPC: C08F292/00 ,  C08F4/04

    Abstract: Disclosed are polymerization initiators as may be utilized for addition of polymers to a substrate surface. The initiators are azo-based initiators that include multi-functionality through addition of multiple anchoring agents to an inner azo group. Disclosed polymerization initiators can be utilized to form high density and high molecular weight polymers on a surface such as a particulate surface. Formed materials can be beneficial in one embodiment in fracking applications, providing composite proppant/polymer materials that can prevent leakage of polymers from a subterranean geologic formation.

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