公开(公告)号：US20150187715A1

公开(公告)日：2015-07-02

申请号：US14659154

申请日：2015-03-16

Applicant: XILINX, INC.

Inventor： Michael J. Hart ,  Jan L. de Jong ,  Paul Y. Wu

IPC: H01L23/00

CPC classification number: H01L24/13 ,  H01L23/556 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/12 ,  H01L2224/0401 ,  H01L2224/05022 ,  H01L2224/05567 ,  H01L2224/1147 ,  H01L2224/11474 ,  H01L2224/1191 ,  H01L2224/13007 ,  H01L2224/13022 ,  H01L2224/13099 ,  H01L2224/1355 ,  H01L2924/0002 ,  H01L2924/01022 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/0105 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/36 ,  H01L2224/05552

Abstract: A semiconductor device includes a first under-bump metallization (UBM) layer disposed over a bond pad, a dielectric layer above an interconnect layer having a via exposing at least a portion of the first UBM layer. A second UBM layer is disposed above the first UBM layer and forms a UBM bucket over the via. The first UBM layer and UBM bucket are configured to support a solder ball and can advantageously block all alpha particles emitted by the solder ball having a relevant angle of incidence from reaching the active semiconductor regions of the IC. Thus, soft errors, such as single event upsets in memory cells, are reduced or eliminated.

Abstract translation: 半导体器件包括布置在接合焊盘上的第一凸点下金属化（UBM）层，在互连层上方的电介质层，其具有暴露第一UBM层的至少一部分的通孔。 第二UBM层设置在第一UBM层之上并在通孔上形成UBM桶。 第一UBM层和UBM桶被配置为支撑焊球，并且可以有利地阻挡具有相关入射角的焊球发射的所有α粒子到达IC的有源半导体区域。 因此，减少或消除了诸如存储器单元中的单个事件的混乱的软错误。