Method to prevent backside TiN cross contamination for reflective product
    1.
    发明授权
    Method to prevent backside TiN cross contamination for reflective product 有权
    防止反射产品背面TiN交叉污染的方法

    公开(公告)号:US06620462B1

    公开(公告)日:2003-09-16

    申请号:US10154286

    申请日:2002-05-23

    IPC分类号: B05D136

    摘要: A new method is provided for the creation of a protective layer over a glass substrate, the glass substrate has a first and a second surface. Under a first embodiment of the invention, a second surface of the glass panel is first coated with a layer of TiN. A first layer of amorphous silicon (A—Si) is deposited over the second surface of the glass panel. A second layer of amorphous silicon (A—Si) is deposited over the layer of TiN. A layer of photoresist is next deposited over the surface of the second layer of A—Si. The first layer of A—Si is removed from the second surface of the glass panel after which the layer of photoresist is removed. Under a second embodiment of the invention, the first and the second surface of the glass panel are coated with a first and a second layer of TiN. A layer of amorphous silicon (A—Si) is deposited over the second layer of TiN. A layer of photoresist is deposited over the layer of A—Si. The first layer of TiN on the first surface of the glass panel is removed after which the layer of photoresist is removed.

    摘要翻译: 提供了一种用于在玻璃基板上形成保护层的新方法,玻璃基板具有第一和第二表面。 在本发明的第一实施例中,玻璃面板的第二表面首先涂覆有一层TiN。 第一层非晶硅(A-Si)沉积在玻璃面板的第二表面上。 第二层非晶硅(A-Si)沉积在TiN层上。 接着在第二层A-Si的表面上沉积一层光致抗蚀剂。 从玻璃面板的第二表面去除第一层A-Si层,之后除去光致抗蚀剂层。 在本发明的第二实施例中,玻璃面板的第一和第二表面涂覆有第一和第二层TiN。 在第二层TiN上沉积一层非晶硅(A-Si)。 一层光致抗蚀剂沉积在A-Si层上。 除去玻璃板的第一表面上的第一TiN层,然后除去光致抗蚀剂层。