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91.发明授权Apparatus and method for mass flow controller with a plurality of closed loop control code sets 有权具有多个闭环控制代码集的质量流量控制器的装置和方法公开(公告)号：US06868862B2
公开(公告)日：2005-03-22
申请号：US10178261
申请日：2002-06-24
CPC分类号： G05D7/0635 , G01F1/684 , G01F1/6965 , G01F1/86 , G01F5/00 , G01F25/0053 , Y10T137/7759 , Y10T137/7761
摘要： A mass flow controller includes an electronic controller for which a plurality of closed loop control codes sets may be uploaded. In a dual processor embodiment, one processor may upload a plurality of codes sets for another, with the selection of codes sets determined by the uploading processor either autonomously or through user interaction.
摘要翻译： 质量流量控制器包括可以上传多个闭环控制代码集的电子控制器。 在双处理器实施例中，一个处理器可以上传多个代码集合用于另一个，其中选择由上传处理器自动或通过用户交互确定的代码集。
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公开(公告)号：US06857323B1
公开(公告)日：2005-02-22
申请号：US10669065
申请日：2003-09-23
摘要： A method and system is presented for accurately measuring the two phase flow rate of a fluid mixture that includes two different phase components. Capacitance tomography measurements are made in order to determine the concentration ratio of the different phase components within the fluid. Approximate flow measurements are made by transmitting, for example, ultrasound waves through the fluid mixture, and measuring the different speeds of propagation of the ultrasound waves through the different phase components of the fluid mixture. The exact flow rate of the fluid mixture is determined using the concentration ratio obtained from the tomographic measurements, and the approximate flow measurements made, for example, by ultrasound sensing.
摘要翻译： 提出了一种用于精确测量包括两个不同相分量的流体混合物的两相流速的方法和系统。 进行电容层析成像测量以确定流体内不同相分量的浓度比。 通过传输例如通过流体混合物的超声波以及测量超声波通过流体混合物的不同相分量的不同传播速度来进行近似流量测量。 使用从断层摄影测量获得的浓度比，以及例如通过超声波感测进行的近似流量测量来确定流体混合物的确切流速。
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93.发明授权Apparatus and method for mass flow controller with network access to diagnostics 有权具有网络访问诊断功能的质量流量控制器的装置和方法公开(公告)号：US06810308B2
公开(公告)日：2004-10-26
申请号：US10178884
申请日：2002-06-24
IPC分类号： F17D300
CPC分类号： G01F5/00 , G01F1/684 , G01F1/6965 , G01F1/86 , G01F25/0053 , G05D7/0635 , Y10T137/87298
摘要： A mass flow controller includes a network interface port and interface software that provide direct access to the mass flow controller. The mass flow controller also includes diagnostic software that permits a technician to execute diagnostics through the network interface port.
摘要翻译： 质量流量控制器包括提供对质量流量控制器的直接访问的网络接口端口和接口软件。 质量流量控制器还包括允许技术人员通过网络接口端口执行诊断的诊断软件。
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94.发明授权System and method for controlling movement of a workpiece in a thermal processing system 失效用于控制热处理系统中工件运动的系统和方法公开(公告)号：US06610968B1
公开(公告)日：2003-08-26
申请号：US09670712
申请日：2000-09-27
申请人： Ali Shajii , Brian Matthews , Jeffrey P. Hebb , John Danis
发明人： Ali Shajii , Brian Matthews , Jeffrey P. Hebb , John Danis
IPC分类号： H05B102
CPC分类号： H01L21/67248 , C30B31/18 , H01L21/67109
摘要： A system and method for processing a workpiece in a thermal processing furnace by measuring the temperature of the workpiece in the thermal processing furnace, and based upon an intended temperature profile and the measured temperature of the workpiece, moving the workpiece through the furnace to heat process the workpiece generally according to the intended temperature profile.
摘要翻译： 一种用于通过在热处理炉中测量工件的温度并且基于预期温度分布和所测量的工件温度来处理热处理炉中的工件的系统和方法，将工件移动通过炉进行加热 工件一般根据预期的温度曲线。
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95.发明授权公开(公告)号：US06461036B1
公开(公告)日：2002-10-08
申请号：US09413131
申请日：1999-10-06
申请人： Ali Shajii , Jeffrey P. Hebb
发明人： Ali Shajii , Jeffrey P. Hebb
IPC分类号： G01N2500
CPC分类号： H01L22/26 , G01J5/0003 , G01J5/041 , G01J5/10 , H01L2924/0002 , H01L2924/00
摘要： A system and method for determining the stray radiation within a heating chamber of a thermal processing apparatus. The stray radiation is determined by moving a generally unheated wafer vertically through the heating chamber, and measuring with a detector the amount of radiation reflected from the wafer at each vertical wafer position. The total measured radiation is then correlated with the stray radiation component of the total radiation.
摘要翻译： 一种用于确定热处理装置的加热室内的杂散辐射的系统和方法。 通过将通常不加热的晶片垂直移动通过加热室来确定杂散辐射，并且用检测器测量在每个垂直晶片位置处从晶片反射的辐射量。 然后将总测量的辐射与总辐射的杂散辐射分量相关。
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96.发明授权System and method for the real time determination of the in situ emissivity of a workpiece during processing 失效用于实时确定加工过程中工件的原位辐射率的系统和方法公开(公告)号：US06183127B2
公开(公告)日：2001-02-06
申请号：US09280308
申请日：1999-03-29
申请人： Jeffrey P. Hebb , Ali Shajii
发明人： Jeffrey P. Hebb , Ali Shajii
IPC分类号： G01N2500
CPC分类号： H01L22/26 , G01J5/0003 , H01L2924/0002 , H01L2924/00
摘要： A system and method for determining the reflectivity of a workpiece during processing in a heating chamber of a thermal processing apparatus. The system first determines directly the reflectivity of the workpiece outside of the heating chamber of the thermal processing apparatus, and then determines the reflectivity of the workpiece during processing within the heating chamber of the thermal processing apparatus by correlating the ex situ wafer reflectivity with the intensity of the radiation reflected from the wafer within the heating chamber.
摘要翻译： 一种用于在热处理装置的加热室中确定加工过程中工件的反射率的系统和方法。 该系统首先直接确定热处理装置的加热室外的工件的反射率，然后通过将非原位晶片的反射率与强度相关联来确定在热处理装置的加热室内的加工过程中工件的反射率 在加热室内从晶片反射的辐射。
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