摘要:
A seal for a continuous casting furnace having a melting chamber with a mold therein for producing a metal cast includes a passage between the melting chamber and external atmosphere. As the cast moves through the passage, the cast outer surface and the passage inner surface define therebetween a reservoir for containing liquid glass or other molten material to prevent the external atmosphere from entering the melting chamber. Particulate material fed into the reservoir is melted by heat from the cast to form the molten material. The molten material coats the cast as it moves through the passage and solidifies to form a coating to protect the hot cast from reacting with the external atmosphere. Preferably, the mold has an inner surface with a cross-sectional shape to define a cross-sectional shape of the cast outer surface whereby these cross-sectional shapes are substantially the same as a cross-sectional shape of the passage inner surface.
摘要:
The present invention provides a method, system, and computer program product for supporting a large number of intermittently used application clusters without consuming all the resources needed to run server processes for all the application clusters all the time. A method in accordance with the present invention comprises: holding an application request for a dormant application cluster in a holding zone; changing a status of the dormant application cluster to active; changing a status of an unused active application cluster to dormant; stopping server processes for the newly dormant application cluster; starting server processes for the newly active application cluster; and directing the application request held in the holding zone to the server processes for the newly active application cluster.
摘要:
A method is provided for performing photolithography on a substrate which has a first region on a lower level and a second region on an upper level, wherein a first pattern area exists within said first region, a second pattern area exists within said second region, and at least said first and second regions are coated with a photoresist, the method comprising: a) exposing the photoresist through a first mask so as to expose said first region including said first pattern area, and thus create a first pattern in said first pattern area, but not expose said second pattern area; and b) exposing the photoresist through a second mask so as to expose said second pattern area, and thus create a second pattern in said second pattern area, but not expose said first pattern area, and also to expose an area of said first region which lies adjacent said second region.
摘要:
Methods and arrangements to propagate application software to a virtual deployment target are contemplated. More specifically, a user may create multiple virtual deployment targets in a software system such as WebSphere™ and deploy applications to multiple the virtual deployment targets without having to manually fit policy-driven applications into each virtual deployment target. Embodiments are particularly advantageous when the application software is a business solution that needs to be deployed multiple times such as during the development and testing of the business solution. For example, application software of a business solution typically includes a group of applications designed to cooperatively function as a single entity. An application bundle such as an Enterprise Application Solution (EAS) file describes the application software and includes pertinent information about the application software, application configuration data, and runtime configuration data to implement the business solution. Then, the application bundle can be deployed automatically or substantially automatically.
摘要:
A molding tool (10) has a body (20) that can be inserted into a cavity (62) of a component (12) for introducing molding material (72) to form a mold of one or more internal surfaces (60) defining the cavity (62). The molding material (72) is at least partially cured with the tool (10) in place so that the mold (80) and tool (10) are removed from the cavity (62) as a single unit. The tool (10) includes a passage (34) for introducing the molding material (72) into the cavity (62). A pressure device, such as a plunger (50), may be used to force the molding material (72) through the passage (34) and into the cavity (62). The tool (10) also serves to support the mold (80) on a fixture or other structure used to analyze the mold (80) to verify characteristics of the form, such as, for example, an optical comparator.
摘要:
A distributed cache management system that minimizes invalid cache notification events is provided. A cache management system in a sending device processes outgoing cache notification events by adding information about the source server's clock. A cache management system in the receiving device then uses this information to adjust event information once the event is received.
摘要:
Controlling a cache of distributed data is provided by dynamically determining whether and/or where to cache the distributed data based on characteristics of the data, characteristics of the source of the data and characteristics of the cache so as to provide an indication of whether to cache the data. The data may be selectively cached based on the indication.
摘要:
A TANGLE-PROOF COLLAR ASSEMBLY for restraining pets and various animals. Each embodiment utilizes a channel mounted on an annular band. The channel forms an arcuate path about the periphery of the band wherein a swivel truck assembly having 360° biaxial rotation may travel within the arcuate path of the channel. An attachment for the leash is provided on the swivel truck. Each embodiment employs a locking mechanism for securing the collar in a suitable manner to maintain the arcuate path. Additional embodiments are described that provide for a rigid collar, which may be adjusted by the addition or removal of sizing elements or sections and an alternate locking assembly. An embodiment of a harness based upon the present invention is also described.
摘要:
A method of carrying out optical proximity correction in the design of a reticle for exposing a photoresist of a wafer in photolithography using a lens having a focal plane, the method including generating a dense-isolated offset focus/exposure matrix, containing dense-isolated offset values, being the difference between values of linewidth for dense and isolated lines, as a function of focal plane position, for each of a plurality of different exposures, selecting from among the contours of the dense-isolated offset focus/exposure matrix for each different exposure, the flattest contour, and carrying out optical proximity correction on the basis that the exposure will be the exposure corresponding to said flattest contour.
摘要:
An apparatus is disclosed for implementing a complex filter of the type represented by a transfer function having a complex pole. The apparatus is capable of creating real and imaginary parts, Yr and Yi, of a complex output signal in response to receiving real and imaginary parts, Xr and Xi, of a complex input signal. The apparatus comprises a plurality of variable resistors that may be tuned to adjust various operating parameters of the complex filter.