-
公开(公告)号：US07710541B2
公开(公告)日：2010-05-04
申请号：US11882292
申请日：2007-07-31
CPC分类号： G03F7/70341 , G03F7/7085
摘要： A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
摘要翻译： 公开了一种用于浸没式光刻投影装置的液体供应系统，其中在投影系统，阻挡构件和基板之间限定空间。 阻挡构件不被密封，使得在使用期间，允许浸没液体流出空间以及阻挡构件和基底之间。
-
公开(公告)号：US07692771B2
公开(公告)日：2010-04-06
申请号：US11138899
申请日：2005-05-27
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
-
公开(公告)号：US07686970B2
公开(公告)日：2010-03-30
申请号：US11025835
申请日：2004-12-30
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
摘要翻译： 公开了一种用于制造用于压印光刻的工作模板的方法，其在一个实施例中包括将工作模板基板上的可压印介质的第一目标区域与主模板接触以在介质中形成第一印记，印记 定义工作模板模式的一部分，将主模板与压印介质分离，将介质的第二目标区域与主模板接触以在介质中形成第二压印，第二压印定义工作模板的另一部分 模式，并将主模板与压印介质分离。
-
公开(公告)号：US07618250B2
公开(公告)日：2009-11-17
申请号：US11440439
申请日：2006-05-25
IPC分类号： B29C59/00
CPC分类号： B29C43/021 , B29C35/0888 , B29C43/003 , B29C43/52 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.
摘要翻译： 公开了一种压印光刻设备，其具有被配置为保持压印模板，衬底台和光学编码器的模板保持器，所述光学编码器具有辐射输出，第一衍射光栅和检测器，所述辐射输出被布置成照亮 第二衍射光栅和检测器，定位成检测由第一和第二衍射光栅衍射的辐射以提供对准信号。
-
公开(公告)号：US20080198473A1
公开(公告)日：2008-08-21
申请号：US11917171
申请日：2006-06-12
IPC分类号： G02B3/14
CPC分类号： G02B3/14
摘要： The invention relates to variable focus lenses based on magneto wetting and related devices, wherein two fluids, one of which is magnetically susceptible, are in contact over a meniscus. The shape of the meniscus is controlled by means of an applied magnetic field gradient. The contact angle between the chamber wall and the meniscus is a conserved. Implementation of special shaping to the internal or external walls of the chamber, while conserving the contact angle, results in better lens shape in the variable focus lens and lower levels of lens distortion.
摘要翻译： 本发明涉及基于磁润湿和相关装置的可变焦距透镜，其中两个流体（其中之一是磁敏感的）在弯液面上接触。 弯液面的形状通过施加的磁场梯度来控制。 室壁和弯液面之间的接触角是保守的。 在腔室的内壁或外壁实现特殊成形，同时节省接触角，导致可变焦距透镜更好的透镜形状和更低的透镜变形水平。
-
公开(公告)号：US07394521B2
公开(公告)日：2008-07-01
申请号：US10743271
申请日：2003-12-23
CPC分类号： G03F7/70341 , G03F7/7085
摘要： A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
摘要翻译： 公开了一种用于浸没式光刻投影装置的液体供应系统，其中在投影系统，阻挡构件和基板之间限定空间。 阻挡构件不被密封，使得在使用期间，允许浸没液体流出空间以及阻挡构件和基底之间。
-
公开(公告)号：US07377764B2
公开(公告)日：2008-05-27
申请号：US11150465
申请日：2005-06-13
申请人： Yvonne Wendela Kruijt-Stegeman , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Johan Frederik Dijksman , Helmar Van Santen , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Johan Frederik Dijksman , Helmar Van Santen , Sander Frederik Wuister
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.
摘要翻译： 公开了一种光刻设备，其具有构造成保持压印模板的压印模板或模板保持器，以及布置成接收衬底的衬底台，该设备还包括与衬底台和压印模板或模板保持器一起的壁 被构造成形成从周围区域基本密封的封闭空间。
-
公开(公告)号：US07372541B2
公开(公告)日：2008-05-13
申请号：US11239480
申请日：2005-09-30
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。
-
99.发明授权公开(公告)号：US07358507B2
公开(公告)日：2008-04-15
申请号：US10538115
申请日：2003-11-14
申请人： Helmar Van Santen
发明人： Helmar Van Santen
IPC分类号： G21G5/00
CPC分类号： G11B7/1374 , G03F7/70341 , G11B7/122 , G11B7/261
摘要： For irradiating a layer (3) a radiation beam (7) is directed and focused to a spot (11) on the layer (3), relative movement of the layer (3) relative to the optical element (59) is caused so that, successively, different portions of the layer (3) are irradiated and an interspace (53) between a surface of the optical element (59) nearest to the layer (3) is maintained. Furthermore, at least a portion of the interspace (53) through which the radiation irradiates the spot (11) on the layer (3) is maintained filled with a liquid (91). By directing a gas flow (71-73) to a surface zone (74) of the layer (3), liquid (91) is reliably prevented from passing that surface zone (74), without causing damage to the layer (3). The liquid (91) is drawn away from the layer (3) in the vicinity of the surface zone (74).
摘要翻译： 为了照射层（3），辐射束（7）被引导并聚焦到层（3）上的斑点（11），引起层（3）相对于光学元件（59）的相对运动，使得 照射层（3）的不同部分，并且维持最靠近层（3）的光学元件（59）的表面之间的间隙（53）。 此外，辐射照射层（3）上的斑点（11）的间隙（53）的至少一部分保持充满液体（91）。 通过将气流（71-73）引导到层（3）的表面区域（74），可靠地防止液体（91）通过该表面区域（74），而不会损坏层（3）。 液体（91）在表面区域（74）附近从层（3）被拉出。
-
公开(公告)号：US20060209414A1
公开(公告)日：2006-09-21
申请号：US10539351
申请日：2003-11-20
申请人： Helmar Van Santen , Jacobus Neijzen
发明人： Helmar Van Santen , Jacobus Neijzen
IPC分类号： G02B1/10
CPC分类号： G03F7/70341 , G11B7/122 , G11B7/1374 , G11B7/261
摘要： For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the optical element is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the optical element nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit and flowing out of an outflow opening through a total projected cross-sectional passage area in a plane parallel to the layer. The outflow opening or a plurality of the outflow openings are positioned such that, seen in a direction perpendicular to the layer, the total cross-sectional area has a centre in the portion of the interspace through which the radiation irradiates the spot.
摘要翻译： 为了照射层，辐射束被引导并聚焦到层上的斑点，引起层相对于光学元件的相对运动，使得相继地照射该层的不同部分，并且在该层的表面之间的间隙 保持最靠近层的光学元件。 此外，辐射照射到层上的斑点的间隙的至少一部分保持充满液体，液体经由供应管道供给，并通过总投影横截面通过面积流出流出开口 在与平面平行的平面上。 流出开口或多个流出开口定位成使得从垂直于该层的方向看，总横截面积在该空间部分中的中心，辐射辐射穿过该点。
-
-
-
-
-
-
-
-
-
搜索结果
103 条记录 (耗时 0.038 秒)
