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公开(公告)号：US20100139862A1
公开(公告)日：2010-06-10
申请号：US12705018
申请日：2010-02-12
IPC分类号： H01L21/308 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
摘要翻译： 公开了一种用于制造用于压印光刻的工作模板的方法，其在一个实施例中包括将工作模板基板上的可压印介质的第一目标区域与主模板接触以在介质中形成第一印记，印记 定义工作模板模式的一部分，将主模板与压印介质分离，将介质的第二目标区域与主模板接触以在介质中形成第二压印，第二压印定义工作模板的另一部分 模式，并将主模板与压印介质分离。
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公开(公告)号：US07686970B2
公开(公告)日：2010-03-30
申请号：US11025835
申请日：2004-12-30
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
摘要翻译： 公开了一种用于制造用于压印光刻的工作模板的方法，其在一个实施例中包括将工作模板基板上的可压印介质的第一目标区域与主模板接触以在介质中形成第一印记，印记 定义工作模板模式的一部分，将主模板与压印介质分离，将介质的第二目标区域与主模板接触以在介质中形成第二压印，第二压印定义工作模板的另一部分 模式，并将主模板与压印介质分离。
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公开(公告)号：US09341944B2
公开(公告)日：2016-05-17
申请号：US12705018
申请日：2010-02-12
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
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公开(公告)号：US20060144275A1
公开(公告)日：2006-07-06
申请号：US11025835
申请日：2004-12-30
IPC分类号： B41F33/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
摘要翻译： 公开了一种用于制造用于压印光刻的工作模板的方法，其在一个实施例中包括将工作模板基板上的可压印介质的第一目标区域与主模板接触以在介质中形成第一印记，印记 定义工作模板模式的一部分，将主模板与压印介质分离，将介质的第二目标区域与主模板接触以在介质中形成第二压印，第二压印定义工作模板的另一部分 模式，并将主模板与压印介质分离。
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公开(公告)号：US20060267231A1
公开(公告)日：2006-11-30
申请号：US11138898
申请日：2005-05-27
IPC分类号： B29C43/58
CPC分类号： B29C43/021 , B29C35/0888 , B29C43/003 , B29C43/52 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.
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公开(公告)号：US20060268256A1
公开(公告)日：2006-11-30
申请号：US11138899
申请日：2005-05-27
IPC分类号： G03B27/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
摘要翻译： 公开了一种光刻设备，其具有被配置为保持压印模板的模板保持器，布置成接收衬底的衬底台，布置成照射压印模板的一部分的辐射输出;以及被配置为检测从界面散射的辐射的检测器 在压印模板和设置在基板上的可压印材料之间。
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公开(公告)号：US20060144274A1
公开(公告)日：2006-07-06
申请号：US11025600
申请日：2004-12-30
IPC分类号： B41F33/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprinting method is disclosed, in which an embodiment involves subjecting an imprintable medium on a substrate to conditions such that the medium is at a first temperature so that it is in a flowable state, the imprintable medium comprising an imprint material selected from a group consisting of: a crystalline material and a polycrystalline material, pressing a template into the medium to form an imprint in the medium, cooling the medium to a second temperature such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while in the substantially non-flowable state.
摘要翻译： 公开了一种压印方法，其中一个实施例涉及使基材上的可压印介质经受使得介质处于第一温度使其处于可流动状态的状态，所述可压印介质包括压印材料，所述压印材料选自 的结晶材料和多晶材料，将模板压入介质以在介质中形成印迹，将介质冷却至第二温度，使得介质处于基本上不可流动状态，同时介质与 模板，并且在基本上不可流动的状态下将模板与介质分离。
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公开(公告)号：US20070138699A1
公开(公告)日：2007-06-21
申请号：US11312658
申请日：2005-12-21
IPC分类号： B29C43/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/11 , G03F7/201
摘要： A lithographic apparatus is disclosed that comprises a template holder configured to hold a plurality of imprint templates, and a substrate holder configured to hold a substrate, the template holder being located beneath the substrate holder.
摘要翻译： 公开了一种光刻设备，其包括被配置为保持多个印模模板的模板保持器，以及被配置为保持基板的基板保持器，所述模板保持器位于所述基板保持器下方。
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公开(公告)号：US20060180952A1
公开(公告)日：2006-08-17
申请号：US11155941
申请日：2005-02-17
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/02 , Y10S977/887
摘要： An imprinting method is disclosed that includes applying an imprinting force to a template to cause the template to contact an imprintable medium on a target region of a first surface of a substrate to form an imprint in the medium, during application of the imprinting force, applying a compensating force to a second surface of the substrate which is opposite to the first surface so as to reduce deformation of the substrate caused by the application of the imprinting force, and separating the template from the imprinted medium.
摘要翻译： 公开了一种压印方法，其包括对模板施加压印力，以使得模板在施加压印力的同时在介质的第一表面的目标区域上接触可压印的介质以形成印记， 对基板的与第一表面相对的第二表面的补偿力，以减少由施加压印力引起的基板的变形，以及将模板与压印介质分离。
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公开(公告)号：US20070237886A1
公开(公告)日：2007-10-11
申请号：US11394334
申请日：2006-03-31
申请人： Johan Dijksman , Antonius Wismans , Anke Pierik , Martin Vernhout , Sander Wuister , Yvonne Kruijt-Stegeman
发明人： Johan Dijksman , Antonius Wismans , Anke Pierik , Martin Vernhout , Sander Wuister , Yvonne Kruijt-Stegeman
CPC分类号： G03F7/0002 , B41J3/4071 , B41J3/543 , B41M3/006 , B82Y10/00 , B82Y40/00 , G03F7/16
摘要： An imprint lithography apparatus is disclosed. The apparatus has a substrate table configured to support a lithographic substrate and a plurality of nozzles arranged to eject fluid onto the lithographic substrate, the plurality of nozzles extending over a distance which is substantially equal to or greater than a width of the substrate, wherein the nozzles, the lithographic substrate, or both, are moveable relative to the other.
摘要翻译： 公开了压印光刻设备。 所述设备具有被配置为支撑平版印刷基板和布置成将流体喷射到所述平版印刷基板上的多个喷嘴的所述基板台，所述多个喷嘴在基本上等于或大于所述基板的宽度的距离上延伸，其中， 喷嘴，平版印刷基板或两者都可相对于另一个移动。
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