公开(公告)号：US20090017730A1

公开(公告)日：2009-01-15

申请号：US11665001

申请日：2005-10-12

申请人： Takeo Kubota ,  Atsushi Shigeta ,  Gen Toyota ,  Tamami Takahashi ,  Daisaku Fukuoka ,  Kenya Ito

发明人： Takeo Kubota ,  Atsushi Shigeta ,  Gen Toyota ,  Tamami Takahashi ,  Daisaku Fukuoka ,  Kenya Ito

IPC分类号： B24B1/00 ,  B24B21/00

CPC分类号： H01L21/02021 ,  B24B9/065 ,  B24B21/002

摘要： A polishing apparatus has a polishing tape (21), a supply reel (22) for supplying the polishing tape (21) to a contact portion (30) at which the polishing tape (21) is brought into contact with a notch portion (11) of a substrate (10), and a take-up reel (23) for winding up the polishing tape (21) from the contact portion (30). The polishing apparatus also has a first guide portion (24) having as guide surface (241) for supplying the polishing tape (21) directly to the contact portion (30), and a second guide portion (25) having a guide surface for supplying the polishing tape (21) tot the take-up reel (23). The guide surface (241) of the first guide portion (24) and/or the guide surface of the second guide portion (25) has a shape corresponding to a shape of the notch portion (11) of the substrate (10).

摘要翻译： 抛光装置具有研磨带（21），用于将研磨带（21）供给到研磨带（21）与切口部（11）接触的接触部（30）的供带盘（22） ）和用于从所述接触部分（30）卷绕所述研磨带（21）的卷取卷轴（23）。 抛光装置还具有第一引导部分（24），其具有用于将研磨带（21）直接供应到接触部分（30）的引导表面（241），以及具有引导表面的第二引导部分（25） 研磨带（21）卷绕在卷取卷轴（23）上。 第一引导部（24）的引导面（241）和/或第二引导部（25）的引导面具有与基板（10）的切口部（11）的形状对应的形状。

公开(公告)号：US07476290B2

公开(公告)日：2009-01-13

申请号：US10695826

申请日：2003-10-30

申请人： Takayuki Saito ,  Tsukuru Suzuki ,  Kaoru Yamada ,  Kenya Ito ,  Masayuki Kamezawa ,  Kenji Yamaguchi

发明人： Takayuki Saito ,  Tsukuru Suzuki ,  Kaoru Yamada ,  Kenya Ito ,  Masayuki Kamezawa ,  Kenji Yamaguchi

IPC分类号： B08B7/04

CPC分类号： H01L21/6708 ,  B08B3/02 ,  Y10S134/902

摘要： The present invention provides a substrate processing apparatus and a substrate processing method suitable for use in an etching apparatus which etches a thin film formed on a peripheral portion of a substrate. The present invention also provides a substrate processing apparatus and a substrate processing method suitable for use in a cleaning apparatus which performs a cleaning process on a substrate which has been etched. The substrate processing apparatus for use in etching includes a substrate holder for holding a substrate substantially horizontally and rotating the substrate, and a processing liquid supply unit for supplying a processing liquid onto a peripheral portion of the substrate which is being rotated in such a manner that the processing liquid is stationary with respect to the substrate. The substrate processing apparatus for use in cleaning a substrate includes a substrate holder for holding a substrate substantially horizontally and rotating the substrate, and a cleaning liquid supply unit having a cleaning liquid outlet which is oriented from a center of the substrate toward a peripheral portion of the substrate with an elevation angle of not more than 45° from a surface of the substrate. The cleaning liquid supply unit supplies a cleaning liquid to the surface of the substrate at a flow velocity of not less than 0.1 m/s.

摘要翻译： 本发明提供一种适用于腐蚀形成在基板的周边部分上的薄膜的蚀刻装置中的基板处理装置和基板处理方法。 本发明还提供一种适用于在已被蚀刻的基板上进行清洗处理的清洗装置的基板处理装置和基板处理方法。 用于蚀刻的基板处理装置包括：基板保持器，用于基本上水平地保持基板并旋转基板;以及处理液体供应单元，用于将处理液体供应到正在旋转的基板的周边部分， 处理液相对于基板静止。 用于清洗基板的基板处理装置包括基板保持器，用于基本水平地保持基板并旋转基板;以及清洗液供给单元，其具有从基板的中心朝向基板的周边部分 该衬底的仰角与衬底的表面不超过45°。 清洗液供给部以不小于0.1m / s的流速向基板的表面供给清洗液。

公开(公告)号：US07373060B2

公开(公告)日：2008-05-13

申请号：US11363177

申请日：2006-02-28

申请人： Hideshi Satake ,  Nobuyuki Ootsuka ,  Yasuhiro Yamamoto ,  Kenya Ito ,  Nobumasa Ootake ,  Kazuhiro Yoshida

发明人： Hideshi Satake ,  Nobuyuki Ootsuka ,  Yasuhiro Yamamoto ,  Kenya Ito ,  Nobumasa Ootake ,  Kazuhiro Yoshida

IPC分类号： G02B6/02 ,  C08G77/04

CPC分类号： C08G77/38 ,  G02B6/02033

摘要： An optical waveguide is produced by using a polymer obtained by using a silsesquioxane derivative represented by the formula (1-0). In the formula (1-0), R0 independently represents hydrogen, alkyl having 1 to 40 carbon atoms in which optional hydrogen may be replaced by fluorine and optional —CH2— may optionally be replaced by —O—, —CH═CH—, cycloalkylene, or cycloalkenylene, aryl in which optional hydrogen may optionally be replaced by halogen, or with alkyl having 1 to 20 carbon atoms whereby optional hydrogen may be replaced by fluorine and optional —CH2— may be replaced by —O—, —CH═CH—, cycloalkylene, or phenylene, or arylalkyl in which optional hydrogen in the aryl may be replaced by halogen or alkyl having 1 to 20 carbon atoms, and hydrogen in the alkylene of the arylalkyl may be replaced by fluorine, and optional —CH2— in the alkylene of the arylalkyl may be replaced by —O—, —CH═CH—, or cycloalkylene, and Y is a group represented by the formula (a) or (b):

摘要翻译： 通过使用通过使用由式（1-0）表示的倍半硅氧烷衍生物获得的聚合物制备光波导。 在式（1-0）中，R 0独立地表示氢，具有1至40个碳原子的烷基，其中任选的氢可以被氟取代，并且任选的-CH 2 - 可以任选地被-O-，-CH-CH-，亚环烷基或环亚烯基取代，其中任选的氢可以任选被卤素取代的芳基或具有1至20个碳原子的烷基，由此任选的氢可被氟代替 和任选的-CH 2 - 可以被-O - ， - CH-，亚环烷基或亚苯基取代，或芳基烷基，其中芳基中任选的氢可被卤素或具有1 至20个碳原子，芳基烷基的亚烷基中的氢可以被氟代替，并且芳基烷基的亚烷基中任选的-CH 2 - 可以被-O - ， - CH-CH - 或亚环烷基，Y为由式（a）或（b）表示的基团：

公开(公告)号：US20060194068A1

公开(公告)日：2006-08-31

申请号：US11363203

申请日：2006-02-28

申请人： Takashi Katoh ,  Takashi Kikukawa ,  Kenya Ito ,  Kazuhiro Yoshida ,  Yasuhiro Yamamoto

发明人： Takashi Katoh ,  Takashi Kikukawa ,  Kenya Ito ,  Kazuhiro Yoshida ,  Yasuhiro Yamamoto

IPC分类号： B32B27/00 ,  C08G77/04 ,  C08L83/04

CPC分类号： C08G77/045 ,  C08G73/106 ,  C08G77/42 ,  C08G77/442 ,  C08G77/445 ,  C08G77/448 ,  C08G77/455 ,  C08G77/458 ,  Y10T428/31663

摘要： The present invention provides a polymer compound comprising a silsesquioxane skeleton represented by the formula (1) in its polymer main chain. In the formula (1), each of X and Y independently represents hydrogen or a monovalent organic group having 1 to 40 carbon atoms.

摘要翻译： 本发明提供一种高分子化合物，其包含在其聚合物主链中由式（1）表示的倍半硅氧烷骨架。 在式（1）中，X和Y各自独立地表示氢或碳原子数1〜40的1价有机基团。

公开(公告)号：US20060019417A1

公开(公告)日：2006-01-26

申请号：US11187024

申请日：2005-07-22

申请人： Atsushi Shigeta ,  Gen Toyota ,  Hiroyuki Yano ,  Kunio Oishi ,  Kenya Ito ,  Masayuki Nakanishi ,  Kenji Yamaguchi

发明人： Atsushi Shigeta ,  Gen Toyota ,  Hiroyuki Yano ,  Kunio Oishi ,  Kenya Ito ,  Masayuki Nakanishi ,  Kenji Yamaguchi

IPC分类号： H01L21/66 ,  H01L21/302

CPC分类号： B24B37/013 ,  B24B9/065

摘要： A substrate processing method is used to polish a substrate. The substrate processing method includes rotating a substrate 13 by a motor 12, polishing a first surface of a peripheral portion of the substrate 13 by pressing a polishing surface of a polishing mechanism 20 against the first surface, determining a polishing end point of the first surface by monitoring a polished state of the first surface, stopping the polishing according to the determining the polishing end point, determining a polishing time spent for the polishing, determining a polishing time for a second surface of the peripheral portion based on the polishing time of the first surface, and polishing the second surface for the determined polishing time.

摘要翻译： 基板处理方法用于抛光基板。 基板处理方法包括通过马达12旋转基板13，通过将研磨机构20的研磨面压在第一面上来研磨基板13的周边部的第一面，确定第一面的研磨终点 通过监测第一表面的抛光状态，根据确定抛光终点停止抛光，确定抛光所用的抛光时间，基于抛光时间确定周边部分的第二表面的抛光时间 第一表面，并抛光第二表面以确定抛光时间。

公开(公告)号：US06549350B2

公开(公告)日：2003-04-15

申请号：US10190551

申请日：2002-07-09

申请人： Kenya Ito

发明人： Kenya Ito

IPC分类号： G11B2736

CPC分类号： G06F12/0866 ,  G06F2212/312 ,  G11B5/012 ,  G11B19/04 ,  G11B19/06 ,  G11B19/12 ,  G11B20/00 ,  G11B20/18 ,  G11B27/36 ,  G11B33/14

摘要： A time counting device, a cache memory and a copy control circuit are added to a conventional disk drive so that recorded information is copied periodically and automatically. Alternatively, a cache memory, a copy control circuit, a reference control circuit, a first time counting device and a second time counting device are added to the conventional disk drive so that information which remains recorded for a predetermined period of time after its last recording date is automatically copied. According to another embodiment, a reference signal is recorded in advance and a reproduced output is periodically measured. If the reproduced output is lower than a reference value, recorded information is automatically copied. Other embodiments are also disclosed with the aim of ensuring that information recorded on a magnetic media can always be reproduced reliably, even in the case of high density recording.

公开(公告)号：US06437931B1

公开(公告)日：2002-08-20

申请号：US09989026

申请日：2001-11-21

申请人： Kenya Ito

发明人： Kenya Ito

IPC分类号： G11B2736

CPC分类号： G06F12/0866 ,  G06F2212/312 ,  G11B5/012 ,  G11B19/04 ,  G11B19/06 ,  G11B19/12 ,  G11B20/00 ,  G11B20/18 ,  G11B27/36 ,  G11B33/14

摘要： A time counting device, a cache memory and a copy control circuit are added to a conventional disk drive so that recorded information is copied periodically and automatically. Alternatively, a cache memory, a copy control circuit, a reference control circuit, a first time counting device and a second time counting device are added to the conventional disk drive so that information which remains recorded for a predetermined period of time after its last recording date is automatically copied. According to another embodiment, a reference signal is recorded in advance and a reproduced output is periodically measured. If the reproduced output is lower than a reference value, recorded information is automatically copied. Other embodiments are also disclosed with the aim of ensuring that information recorded on a magnetic media can always be reproduced reliably, even in the case of high density recording.

公开(公告)号：US06404571B1

公开(公告)日：2002-06-11

申请号：US09712148

申请日：2000-11-15

申请人： Kenya Ito

发明人： Kenya Ito

IPC分类号： G11B2736

CPC分类号： G06F12/0866 ,  G06F2212/312 ,  G11B5/012 ,  G11B19/04 ,  G11B19/06 ,  G11B19/12 ,  G11B20/00 ,  G11B20/18 ,  G11B27/36 ,  G11B33/14

摘要： A time counting device, a cache memory and a copy control circuit are added to a conventional disk drive so that recorded information is copied periodically and automatically. Alternatively, a cache memory, a copy control circuit, a reference control circuit, a first time counting device and a second time counting device are added to the conventional disk drive so that information which remains recorded for a predetermined period of time after its last recording date is automatically copied. According to another embodiment, a reference signal is recorded in advance and a reproduced output is periodically measured. If the reproduced output is lower than a reference value, recorded information is automatically copied. Other embodiments are also disclosed with the aim of ensuring that information recorded on a magnetic media can always be reproduced reliably, even in the case of high density recording.

摘要翻译： 将计时装置，高速缓冲存储器和复制控制电路添加到传统的磁盘驱动器中，使得记录的信息被周期性地和自动地复制。 或者，将高速缓冲存储器，复制控制电路，参考控制电路，第一计时装置和第二计时装置添加到常规磁盘驱动器，使得在其最后记录之后的预定时间段内保持记录的信息 日期被自动复制。 根据另一实施例，预先记录参考信号，并周期性地测量再现的输出。 如果再现的输出低于参考值，则记录的信息被自动复制。 还公开了其它实施例，目的是确保即使在高密度记录的情况下，也可以始终可靠地再现记录在磁性介质上的信息。

公开(公告)号：US06403203B2

公开(公告)日：2002-06-11

申请号：US09379462

申请日：1999-08-24

申请人： Masaaki Futamoto ,  Nobuyuki Inaba ,  Yoshiyuki Hirayama ,  Yukio Honda ,  Kazuetsu Yoshida ,  Kenya Ito

发明人： Masaaki Futamoto ,  Nobuyuki Inaba ,  Yoshiyuki Hirayama ,  Yukio Honda ,  Kazuetsu Yoshida ,  Kenya Ito

IPC分类号： G11B5667

CPC分类号： H04B10/504 ,  G11B5/66 ,  Y10S428/90 ,  Y10T428/12465 ,  Y10T428/12861 ,  Y10T428/12875 ,  Y10T428/24942 ,  Y10T428/2495 ,  Y10T428/24975 ,  Y10T428/26 ,  Y10T428/265

摘要： Magnetic recording medium includes at least two layers having different magnetic anisotropy constants formed on a substrate and the perpendicular magnetic anisotropy of the second magnetic film of those magnetic films, far from the substrate surface, made equal to or larger than that of the first magnetic film near to the substrate surface, thus improving the magnetic isolation of the first magnetic film near to the substrate surface.

摘要翻译： 磁记录介质包括形成于基板上的至少两层不同的磁各向异性常数，并且远离基板表面的这些磁性膜的第二磁性膜的垂直磁各向异性等于或大于第一磁性膜 靠近基板表面，从而改善靠近基板表面的第一磁性膜的磁隔离。

公开(公告)号：US06308361B1

公开(公告)日：2001-10-30

申请号：US09361244

申请日：1999-07-27

申请人： Naoki Matsuda ,  Kenya Ito ,  Mitsuhiko Shirakashi

发明人： Naoki Matsuda ,  Kenya Ito ,  Mitsuhiko Shirakashi

IPC分类号： B08B104

CPC分类号： H01L21/67051 ,  B08B1/00 ,  B08B3/024 ,  H01L21/67046

摘要： A cleaning apparatus is suitable for cleaning workpieces that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The cleaning apparatus has a holding device for holding the substrate and a cleaning unit capable of slidably contacting the surface of the substrate. The cleaning unit has a nozzle for ejecting high-pressure cleaning liquid onto the substrate, and a cleaning member surrounding the nozzle.

摘要翻译： 清洁装置适用于清洁需要高度清洁度的工件，例如半导体晶片，玻璃基板或液晶显示器。 清洁装置具有用于保持基板的保持装置和能够与基板的表面滑动接触的清洁单元。 清洁单元具有用于将高压清洗液喷射到基板上的喷嘴和围绕喷嘴的清洁部件。