公开(公告)号：US08607401B2

公开(公告)日：2013-12-17

申请号：US12707120

申请日：2010-02-17

申请人： Hisashi Hozumi ,  Mitsuaki Shimamura ,  Yutaka Togasawa ,  Naruhiko Mukai ,  Shinji Toki ,  Yasuhiro Yuguchi ,  Koichi Soma

发明人： Hisashi Hozumi ,  Mitsuaki Shimamura ,  Yutaka Togasawa ,  Naruhiko Mukai ,  Shinji Toki ,  Yasuhiro Yuguchi ,  Koichi Soma

IPC分类号： A47L7/00 ,  B08B5/00

CPC分类号： B08B9/08 ,  B08B5/04 ,  G21C19/207

摘要： A cleaning apparatus is generally composed of a suction unit provided with a suction source, a suction nozzle equipped with a suction port adapted to suck dust or like from a surface to be cleaned, a suction hose connected at one end to the suction nozzle and connected at another end to the suction unit, a low-center-of-gravity support member provided for the suction hose so as to serve as a fulcrum when the suction hose is bent and deformed, a wire member supported at a distal end by the suction nozzle and arranged along the suction hose, and a control unit used to bend and deform the suction hose by manipulating the wire member with the low-center-of-gravity support member serving as a fulcrum. This cleaning apparatus is specifically usable for a bottom surface of a reactor pressure vessel.

摘要翻译： 清洁装置通常由设置有抽吸源的抽吸单元，具有适于从要清洁的表面吸入灰尘等的吸入口的吸嘴构成，吸入软管的一端连接到吸嘴并连接 在抽吸单元的另一端，设置有用于抽吸软管的低重心支撑构件，以便当抽吸软管弯曲和变形时用作支点;线构件，其通过抽吸支撑在远端 喷嘴并沿抽吸软管布置;以及控制单元，其用于通过以低重心支撑构件作为支点操纵线构件来弯曲和变形抽吸软管。 该清洁装置特别可用于反应堆压力容器的底面。

公开(公告)号：US08568535B2

公开(公告)日：2013-10-29

申请号：US13538796

申请日：2012-06-29

申请人： Kevin W. Hutto

发明人： Kevin W. Hutto

IPC分类号： B08B9/00 ,  B08B5/00 ,  B08B3/00

CPC分类号： B08B7/00 ,  B08B9/00 ,  H01L21/67051 ,  H01L21/6838 ,  H01L21/6875 ,  Y10S134/902

摘要： Systems and methods for exposing semiconductor workpieces to vapors for through-hole cleaning and/or other processes are disclosed. A representative method includes exposing a semiconductor workpiece to a vapor, with the semiconductor workpiece having an opening extending from a first surface of the workpiece through the workpiece to a second surface facing opposite from the first surface. The opening can include a contaminant, and the method can further include drawing the vapor and the contaminant through at least a portion of the opening and away from the second surface of the semiconductor workpiece.

摘要翻译： 公开了用于将半导体工件暴露于用于通孔清洁和/或其它工艺的蒸汽的系统和方法。 一种代表性的方法包括将半导体工件暴露于蒸汽，其中半导体工件具有从工件的第一表面穿过工件延伸到与第一表面相对的第二表面的开口。 开口可以包括污染物，并且该方法还可以包括通过开口的至少一部分并远离半导体工件的第二表面来吸引蒸汽和污染物。

公开(公告)号：US08555460B2

公开(公告)日：2013-10-15

申请号：US12654162

申请日：2009-12-11

申请人： Geon-Yong Kim ,  Eun-Ha Lee

发明人： Geon-Yong Kim ,  Eun-Ha Lee

IPC分类号： B08B5/00

CPC分类号： H01L21/67051 ,  H01L21/67057

摘要： A substrate cleaning apparatus includes: a substrate entering guide unit for entering a substrate from outside in a proper direction; a foreign material removing unit for receiving the substrate from the substrate entering guide unit and removing debris formed on the substrate; a foreign material cleaning unit for receiving the substrate from the foreign material removing unit and cleaning to remove debris remaining on the substrate; and a position controller for controlling the position of the substrate carried out of the foreign material cleaning unit, wherein the foreign material cleaning unit includes: a manifold including a plurality of deionized water holes, suction holes and air holes; and a porous cleaning plate combined to the manifold by an upper fastening screw including a through hole communicating with the plurality of deionized water holes and suction holes.

摘要翻译： 一种基板清洗装置，包括：基板进入引导单元，用于沿正确的方向从外部进入基板; 异物移除单元，用于从所述基板进入所述引导单元接收所述基板，并去除在所述基板上形成的碎屑; 异物清理单元，用于从异物去除单元接收基底并清洁以除去残留在基底上的碎屑; 以及位置控制器，用于控制由异物清洁单元执行的基板的位置，其中异物清洁单元包括：歧管，包括多个去离子水孔，吸入孔和空气孔; 以及通过上部紧固螺钉组合到所述歧管的多孔清洁板，所述上部紧固螺钉包括与所述多个去离子水孔和抽吸孔连通的通孔。

公开(公告)号：US08518278B2

公开(公告)日：2013-08-27

申请号：US13204209

申请日：2011-08-05

申请人： Kazushige Utsumi

发明人： Kazushige Utsumi

IPC分类号： B08B5/00 ,  G03F7/30

CPC分类号： F26B21/004 ,  H01L21/67034 ,  H01L21/6776 ,  H05K3/227 ,  H05K2203/081

摘要： A method of drying a substrate comprises: supplying a first air flow 4 downwardly in an inclined direction onto the substrate; supplying a second air flow 5 upwardly in an inclined direction onto the substrate, while moving relatively the substrate and the upper and lower blowing portions so that the substrate, from the end area as a front of the substrate, passes between the upper blowing portion and the lower blowing portion; and controlling the first and second air flows such that a velocity component of the second air flow in an upward direction perpendicular to the virtual plane is smaller than a velocity component of the first air flow in a downward direction perpendicular to the virtual plane.

摘要翻译： 干燥基板的方法包括：将第一空气流4沿倾斜方向向下供应到基板上; 将第二气流5沿倾斜方向向上提供到基板上，同时相对于基板和上下吹风部移动，使得从作为基板前部的端部区域的基板在上吹风部分和 下部吹风部; 以及控制所述第一和第二空气流，使得所述第二空气流沿垂直于所述虚拟平面的向上方向的速度分量小于垂直于所述虚拟平面的向下方向上的所述第一气流的速度分量。

公开(公告)号：US08506722B2

公开(公告)日：2013-08-13

申请号：US13265148

申请日：2010-04-19

申请人： Kwang-Jin Lee

发明人： Kwang-Jin Lee

IPC分类号： B08B5/00

CPC分类号： B01D65/02 ,  B01D63/02 ,  B01D2315/06 ,  B01D2321/04 ,  B01D2321/162 ,  B01D2321/168 ,  B01D2321/185

摘要： A method for cleaning a filtering membrane, contaminated by contaminants including inorganic and organic materials during a fluid-filtering process, is disclosed, the method comprises cleaning the filtering membrane by using a first cleaning solution of pH 6˜9 so as to remove the organic material from the filtering membrane; and cleaning the filtering membrane by using a second acid cleaning solution so as to remove the inorganic material from the filtering membrane, wherein the cleaning method of the present invention uses the first cleaning solution having pH 6˜9 instead of a strong-alkaline cleaning solution so as to prevent the filtering membrane from being damaged, and also uses the cleaning solution maintained at a relatively low temperature instead of hot water so as to improve economical efficiency by reduction of energy consumption.

摘要翻译： 公开了一种在流体过滤过程中清洁被污染物包括无机和有机材料的过滤膜的方法，该方法包括使用pH6〜9的第一清洗液清洗过滤膜，以除去有机物 过滤膜材料; 并利用第二种酸性清洗液清洗过滤膜，以从过滤膜中除去无机材料，其中本发明的清洗方法使用pH6〜9的第一清洗液，而不是强碱性清洗液 以防止过滤膜被损坏，并且还使用维持在较低温度而不是热水的清洗溶液，从而通过降低能量消耗来提高经济效率。

公开(公告)号：US08500914B2

公开(公告)日：2013-08-06

申请号：US12922664

申请日：2009-02-05

申请人： Claas Fritsche

发明人： Claas Fritsche

IPC分类号： B08B5/00 ,  A47L5/38

CPC分类号： B08B9/34 ,  B08B9/0813

摘要： With the device (1) according to the invention for blowing off impurities on bottle bottoms, in particular bottle inspection machines, a solution is to be created which makes it possible to achieve an optimum blow-off result at comparatively lower air volume flows. This is achieved according to the invention in that beneath the nozzle head (3) in the annular body (5) a channel (6) is provided, which is connected to a compressed air line (7), which in turn is linked to the compressed air feed line (9), wherein the channel (6) in the upper edge pointing to the nozzle head (3) forms an annular gap (14)—triggering the Venturi effect.

摘要翻译： 利用根据本发明的用于吹脱瓶底上的杂质的设备（1），特别是瓶检查机器，将产生一种解决方案，其可以在相对较低的空气体积流量下实现最佳的吹除效果。 根据本发明，这是通过在环形体（5）中的喷嘴头（3）下方设置的，通道（6）连接到压缩空气管线（7），压缩空气管路（7）又连接到 压缩空气供给管线（9），其中指向喷嘴头部（3）的上边缘中的通道（6）形成一个环形间隙（14） - 触发文丘里效应。

公开(公告)号：US20130152967A1

公开(公告)日：2013-06-20

申请号：US13553087

申请日：2012-07-19

申请人： ROGER J. BERTSCH ,  KEELEY M. KABALA ,  RAFAEL C. MELO ,  ALVARO VALLEJO NORIEGA

发明人： ROGER J. BERTSCH ,  KEELEY M. KABALA ,  RAFAEL C. MELO ,  ALVARO VALLEJO NORIEGA

IPC分类号： B08B3/10 ,  B08B5/00

CPC分类号： A47L15/0013 ,  A47L15/483 ,  A47L15/486 ,  A47L2401/19 ,  A47L2401/20 ,  A47L2501/10

摘要： A dishwasher with a closed loop condenser having a moist air conduit, a dry air conduit having a portion in overlying relationship with a portion of the moist air conduit, wherein the overlying portions of the moist air conduit and the dry air conduit form a heat exchanger, and a controllable gate for selectively introducing, exhausting, or redirecting air relative to the condenser.

摘要翻译： 一种具有闭环冷凝器的洗碗机，其具有湿空气导管，干空气管道具有与一部分潮湿空气管道相重叠的部分，其中湿空气导管和干空气导管的上部形成热交换器 ，以及用于相对于冷凝器选择性地引入，排出或重定向空气的可控制栅极。

公开(公告)号：US20130118529A1

公开(公告)日：2013-05-16

申请号：US13296346

申请日：2011-11-15

申请人： Terry D. Gromes, SR.

发明人： Terry D. Gromes, SR.

IPC分类号： B08B3/02 ,  B08B5/04 ,  B08B5/00

CPC分类号： A47L11/4044 ,  A47L11/282 ,  A47L11/4083 ,  B08B3/024 ,  B08B15/04

摘要： An apparatus and method for cleaning a surface. The apparatus includes a frame having wheels and a handle extending outwardly therefrom. A disc plate assembly is mounted on the frame for rotation about a first vertical axis and a nozzle assembly is mounted on the disc plate assembly for rotation about a second vertical axis. The disc plate assembly is rotated at a lower speed than the nozzle assembly. Separate pneumatically-operable motors drive the wheels, the disc plate assembly and nozzle assembly. A skirt extends downwardly from the frame and outwardly from nozzles on the nozzle assembly. The nozzles may be raised or lowered relative to the surface to be cleaned. Fluid is delivered from a fluid source to the nozzles and a vacuum port is provided on the frame to enable dirty fluid to be removed from a chamber bounded by the skirt.

摘要翻译： 一种用于清洁表面的设备和方法。 该装置包括具有轮的框架和从其向外延伸的手柄。 盘片组件安装在框架上用于围绕第一垂直轴线旋转，并且喷嘴组件安装在盘片组件上以围绕第二垂直轴线旋转。 盘片组件以比喷嘴组件低的速度旋转。 独立的气动马达驱动车轮，盘片组件和喷嘴组件。 裙子从框架向下延伸并从喷嘴组件上的喷嘴向外延伸。 喷嘴可以相对于要清洁的表面升高或降低。 流体从流体源传送到喷嘴，并且在框架上设置真空端口，以使脏污流体能够从由裙部限定的室中移除。

公开(公告)号：US20130087174A1

公开(公告)日：2013-04-11

申请号：US13614365

申请日：2012-09-13

申请人： Noel Sun ,  Meihua Shen ,  Nicolas Gani ,  Chung Nang Liu ,  Radhika C. Mani

发明人： Noel Sun ,  Meihua Shen ,  Nicolas Gani ,  Chung Nang Liu ,  Radhika C. Mani

IPC分类号： B08B5/00

CPC分类号： B08B5/00 ,  B08B7/0035 ,  C23C16/4405 ,  H01J37/32449 ,  H01J37/32862 ,  Y10S438/905

摘要： Embodiments of the invention include methods for in-situ chamber dry cleaning a plasma processing chamber utilized for gate structure fabrication process in semiconductor devices. In one embodiment, a method for in-situ chamber dry clean includes supplying a first cleaning gas including at least a boron containing gas into a processing chamber in absence of a substrate disposed therein, supplying a second cleaning gas including at least a halogen containing gas into the processing chamber in absence of the substrate, and supplying a third cleaning gas including at least an oxygen containing gas into the processing chamber in absence of the substrate.

摘要翻译： 本发明的实施例包括用于半导体器件中用于栅极结构制造工艺的等离子体处理室的原位室干洗的方法。 在一个实施例中，一种用于原位室干洗的方法包括在不存在设置在其中的基板的情况下将包括至少含硼气体的第一清洁气体供应到处理室中，提供至少包含含卤素气体的第二清洁气体 在没有基板的情况下进入处理室，并且在没有基板的情况下将至少包含含氧气体的第三清洁气体供应到处理室中。

公开(公告)号：US20130048606A1

公开(公告)日：2013-02-28

申请号：US13222088

申请日：2011-08-31

申请人： Zhigang Mao ,  Xiaoyi Chen ,  Keven Yu ,  Michael Grimbergen ,  Madhavi Chandrahood ,  Amitabh Sabharwal ,  Ajay Kumar

发明人： Zhigang Mao ,  Xiaoyi Chen ,  Keven Yu ,  Michael Grimbergen ,  Madhavi Chandrahood ,  Amitabh Sabharwal ,  Ajay Kumar

IPC分类号： B08B5/00 ,  B08B7/00 ,  C23F1/02

CPC分类号： C23F4/00 ,  C23G5/00 ,  G03F1/82 ,  H01J37/32816 ,  H01J37/32862

摘要： Embodiments of the invention include methods for in-situ chamber dry cleaning a plasma processing chamber utilized for photomask plasma fabrication process. In one embodiment, a method for in-situ chamber dry clean after photomask plasma etching includes performing an in-situ pre-cleaning process in a plasma processing chamber, supplying a pre-cleaning gas mixture including at least an oxygen containing gas into the plasma processing chamber while performing the in-situ pre-cleaning process, providing a substrate into the plasma processing chamber, performing an etching process on the substrate, removing the substrate from the substrate, and performing an in-situ post cleaning process by flowing a post cleaning gas mixture including at least an oxygen containing gas into the plasma processing chamber.

摘要翻译： 本发明的实施例包括用于光掩模等离子体制造工艺的等离子体处理室的原位室干洗的方法。 在一个实施例中，在光掩模等离子体蚀刻之后的原位室干洗的方法包括在等离子体处理室中进行原位预清洗工艺，将至少包含含氧气体的预清洁气体混合物供应到等离子体中 处理室，同时执行原位预清洁处理，将基板提供到等离子体处理室中，对基板执行蚀刻处理，从基板移除基板，并且通过流动柱子执行原位后清洁处理 至少包含含氧气体的清洁气体混合物进入等离子体处理室。