公开(公告)号：US5279918A

公开(公告)日：1994-01-18

申请号：US693648

申请日：1991-04-30

申请人： Mineo Nishi ,  Koji Nakano ,  Tadashi Kusumoto ,  Keisuke Nakano ,  Yoshihiro Takada

发明人： Mineo Nishi ,  Koji Nakano ,  Tadashi Kusumoto ,  Keisuke Nakano ,  Yoshihiro Takada

IPC分类号： G03F7/023 ,  G03F7/32

CPC分类号： G03F7/023

摘要： A photoresist composition useful for the preparation of semiconductors and to be irradiated by light with a wavelength of from 330 to 450 nm, which comprises (1) an alkali-soluble resin, (2) a quinone-diazide type photosensitive compound and (3) a solvent, wherein(a) said quinone-diazide type photosensitive compound is composed mainly of a quinone-diazide sulfonate of a novolac resin produced by polycondensation of at least one phenolic compound of the following formula (A1) or (A2) and at least one ketone or aldehyde derivative of the following formula (B),(b) the weight-average molecular weight (the analytical value calculated as polystyrene by gel permeation chromatography) of said novolac resin is from 400 to 2,000 in the case of the novolac resin derived from the phenolic compound of the formula (A1) and from 600 to 2,200 in the case of the novolac resin derived from the phenolic compound of the formula (A2), and(c) the esterification ratio of said quinone-diazide sulfonate (the number of quinone-diazide sulfonyl groups per molecule of the quinone-diazide sulfonate.times.100/the number of hydroxyl groups per molecule of the novolac resin) is from 40 to 90%: ##STR1## wherein R is an alkyl group or an aryl group, provided that a plurality of R may be the same or different, R.sup.1 is an alkyl group, provided that a plurality of R.sup.1 may be the same or different, each of R.sup.2 and R.sup.3 is a hydrogen atom, an alkyl group or an aryl group, l is an integer of from 0 to 3, m is an integer of from 0 to 2 and n is an integer of from 2 to 4, provided that the sum of m+n is from 2 to 4.

摘要翻译： 一种光致抗蚀剂组合物，其可用于制备半导体并被波长为330至450nm的光照射，其包括（1）碱溶性树脂，（2）醌二叠氮型光敏化合物和（3） 溶剂，其中（a）所述醌 - 二叠氮型光敏化合物主要由通过至少一种下式（A1）或（A2）的酚化合物缩聚制备的酚醛清漆树脂的醌 - 二叠氮化物磺酸盐和至少 一种下式（B）的酮或醛衍生物，（b）在酚醛清漆树脂的情况下，所述线型酚醛树脂的重均分子量（通过凝胶渗透色谱法计算的分析值为聚苯乙烯）为400至2,000 在衍生自式（A2）的酚类化合物的酚醛清漆树脂的情况下，衍生自式（A1）的酚类化合物和600-2200，和（c）所述醌 - 二叠氮化物（th）的酯化比例 每分子醌二叠氮化物的苯醌二叠氮基磺酰基数为100个，每分子酚醛清漆树脂的羟基数为40〜90％：（*化学结构*）（A1）（*化学式 结构*）（A2）（*化学结构*）（B）其中R是烷基或芳基，条件是多个R可以相同或不同，R1是烷基，条件是多个 R 1可以相同或不同，R 2和R 3各自为氢原子，烷基或芳基，l为0〜3的整数，m为0〜2的整数，n为整数 为2〜4，条件是m + n的和为2〜4。

公开(公告)号：US5067381A

公开(公告)日：1991-11-26

申请号：US561824

申请日：1990-08-02

申请人： Kenji Ohnishi ,  Isomi Washio ,  Koji Nakano

发明人： Kenji Ohnishi ,  Isomi Washio ,  Koji Nakano

IPC分类号： B23D55/00 ,  B23D55/08

CPC分类号： B23D55/082 ,  B23D55/005 ,  Y10T83/7264 ,  Y10T83/888 ,  Y10T83/8886

摘要： A bandsaw machine which has a sawhead assembly in which a flexible endless bandsaw blade is trained around a pair of bandsaw blade wheels to cut a workpiece, with the blade being guided by a guide arm, includes a guide member on the guide arm, for holding the bandsaw blade in a vertical orientation by pushing the bandsaw blade from both sides. A rolling member is mounted on the sawhead assembly and is free to push a side surface of the bandsaw blade with a predetermined force so as to prevent vibration of the blade.

公开(公告)号：USD281870S

公开(公告)日：1985-12-24

申请号：US359570

申请日：1982-03-18

申请人： Koji Nakano

设计人： Koji Nakano

公开(公告)号：USD254332S

公开(公告)日：1980-02-26

申请号：US895783

申请日：1978-04-12

申请人： Koji Nakano ,  Yoshikazu Maeda

设计人： Koji Nakano ,  Yoshikazu Maeda