公开(公告)号：US20030137654A1

公开(公告)日：2003-07-24

申请号：US10353593

申请日：2003-01-29

Applicant: Nikon Corporation

Inventor： Yasushi Mizuno

IPC: G01J001/00

CPC classification number: G01M11/0264 ,  G01M11/0271 ,  G03F7/706 ,  G03F9/7026

Abstract: Before measuring a wavefront aberration of a projection optical system, an image formation position of an image of a pattern of a test reticle which is formed on a predetermined surface is detected by an AF sensor. Based on a result of this detection, the position of an incident surface of a wavefront aberration measurement unit is adjusted, and a position of an image of the pattern with respect to the incident surface is adjusted. After this adjustment, the image of the pattern formed through the projection optical system is detected by the wavefront aberration measurement unit, and a wavefront aberration detection section is used to obtain wavefront aberration information of the projection optical system based on a result of this detection.

Abstract translation: 在测量投影光学系统的波前像差之前，通过AF传感器检测形成在预定表面上的测试标线图案的图像的图像形成位置。 基于该检测的结果，调整波前像差测量单元的入射表面的位置，并且调整图案相对于入射表面的图像的位置。 在该调整之后，通过波前像差测量单元检测通过投影光学系统形成的图案的图像，并且使用波前像差检测部分来基于该检测的结果获得投影光学系统的波前像差信息。

公开(公告)号：US20030128355A1

公开(公告)日：2003-07-10

申请号：US10041052

申请日：2002-01-07

Inventor： Matthew R. Perkins ,  Tzer-Hso Lin ,  Neal K. Patwari

IPC: G01J001/00

CPC classification number: G01S3/784 ,  G01S1/70 ,  G01S5/16

Abstract: A device for detecting the direction of a light source. The device has a pin-hole lens that allows a collimated light beam to excite a light sensing surface behind the lens. The output from the light sensing surface is passed to a processor that determines the position of the surface that has been excited and the direction of the light source. When the position of one or more light sources is known, the device may further determine its own position. The devices may be used in a location system to provide known reference points to a network of other devices. The light sources may be modulated, in which the device can select or identify a particular light source based upon its modulation pattern.

Abstract translation: 一种用于检测光源方向的装置。 该器件具有一个针孔透镜，允许准直光束激发透镜后面的感光表面。 来自感光表面的输出被传递到确定被激发的表面的位置和光源的方向的处理器。 当已知一个或多个光源的位置时，该装置可以进一步确定其自身的位置。 这些设备可以用在位置系统中，以向其他设备的网络提供已知的参考点。 可以调制光源，其中设备可以基于其调制模式来选择或识别特定光源。

公开(公告)号：US20030107010A1

公开(公告)日：2003-06-12

申请号：US10015427

申请日：2001-12-12

Inventor： Alex Waluszko

IPC: G01J001/00

CPC classification number: A61L2/10 ,  A61L2/0011 ,  C02F2201/3227

Abstract: An apparatus for expeditiously irradiating an object with ultraviolet radiation at a selected UV wavelength. The apparatus includes a plurality of ultraviolet sources, each emitting radiation at a first wave length. The UV sources are mounted within a housing that also supports one or more conversion plates that can be interposed between the UV sources and the specimen and function to convert the UV to a second wavelength.

公开(公告)号：US20030098973A1

公开(公告)日：2003-05-29

申请号：US09979960

申请日：2002-02-20

Inventor： Dierk Schmidt ,  Juergen Luginsland ,  Joerg Stierle ,  Peter Wolf ,  Gunter Flinspach

IPC: G01J001/00

CPC classification number: G01S7/481 ,  G01C3/08 ,  G01C15/002 ,  G01S7/4808 ,  G01S7/4817 ,  G01S17/42

Abstract: The invention is based on a distance measuring apparatus comprising at least one transmitter unit (14, 16) located in a housing (10, 12) for emitting a photometric signal, in particular a laser beam, and at least one receiver unit (20, 22) for receiving a portion of a measuring signal reflected on a remote object, and comprising at least one central processor. It is proposed that at least one sensor is located in the housing (10, 12), via which at least one angle of radiation (24) of the photometric signal can be measured relative to at least one reference value.

Abstract translation: 本发明基于距离测量装置，其包括位于壳体（10,12）中的至少一个发射器单元（14,16），用于发射测光信号，特别是激光束，以及至少一个接收器单元（20， 22），用于接收在远程物体上反射的测量信号的一部分，并且包括至少一个中央处理器。 提出至少一个传感器位于壳体（10,12）中，通过该传感器可以相对于至少一个参考值测量光度信号的至少一个辐射角（24）。

公开(公告)号：US20030075694A1

公开(公告)日：2003-04-24

申请号：US10050827

申请日：2002-01-18

Applicant: Marktec Corporation

Inventor： Masami Motoyama

IPC: G01J001/00

CPC classification number: G02B5/208 ,  G01N21/91 ,  G02B5/283

Abstract: An ultraviolet light permeable filter for an ultraviolet detection light is equipped on a filter glass surface with a dielectric multi-film layer which allows a visible radiation of wave length from 694 nm to 780 nm to reflect on the layer. The wave length also does not penetrate through the multi-flim layer. This filter prevents a reddish halation occurrence during an inspection display of a flaw detection light, which is the main cause of overlooking a scratch or flaw pattern.

Abstract translation: 用于紫外线检测光的紫外线透过滤光器装在具有允许694nm至780nm波长的可见光辐射在层上反射的介电多层膜的过滤玻璃表面上。 波长也不穿透多层。 该过滤器可防止在检测显示屏中出现红色晕影，这是瑕疵或缺陷图案的主要原因。

公开(公告)号：US20030007143A1

公开(公告)日：2003-01-09

申请号：US09974520

申请日：2001-10-09

Applicant: LITEL INSTRUMENTS

Inventor： Bruce B. McArthur ,  Adlai H. Smith

IPC: G01J001/00

CPC classification number: G01M11/0264 ,  G01J9/00 ,  G01M11/0207 ,  G03F7/70591 ,  G03F7/706

Abstract: A process of measuring the radiant intensity profile of an effective source of a projection image system that has an effective source, an object plane, an imaging objective, an exit pupil, and an image plane. The improved process consists of selecting at least one field point and a corresponding aperture plane aperture and projecting a plurality of images of the selected field point through the corresponding selected aperture plane aperture at a plurality of various intensities of the effective source. By analyzing the recorded images of the effective source at various intensities it is possible to determine a radiant intensity profile of the image source at the selected field point.

Abstract translation: 测量具有有效源，物平面，成像物镜，出射光瞳和图像平面的投影图像系统的有效光源的辐射强度分布的过程。 改进的过程包括选择至少一个场点和对应的孔径平面孔径，并且以有效源的多个不同强度的多个强度投射所选择的场点的多个图像通过对应的所选孔径平面孔径。 通过以各种强度分析有效源的记录图像，可以在所选择的场点确定图像源的辐射强度分布。

公开(公告)号：US20020167656A1

公开(公告)日：2002-11-14

申请号：US09847466

申请日：2001-05-01

Inventor： Gerrit J. van den Engh

IPC: G01J001/00

CPC classification number: G01N15/14 ,  G01N2015/1452

Abstract: This invention provides a radiation directing device, consisting of a screen having a mirrored surface interrupted by one or more pin holes that pass through the screen, the pin holes having an elliptical shape. The invention further provides an apparatus for determining radiation beam alignment. The apparatus includes (a) a screen having a mirrored surface interrupted by one or more pin holes passing through the screen; and (b) a means for detecting radiation reflected by the mirrored surface, wherein the detecting means determines a position of a radiation beam relative to the pin hole.

Abstract translation: 本发明提供了一种辐射导向装置，其由具有被穿过屏幕的一个或多个销孔中断的镜面的屏幕组成，销孔具有椭圆形状。 本发明还提供了一种用于确定辐射束对准的装置。 该装置包括（a）具有被穿过屏幕的一个或多个销孔中断的镜面的屏幕; 和（b）用于检测被镜面反射的辐射的装置，其中检测装置确定辐射束相对于针孔的位置。

公开(公告)号：US20020162974A1

公开(公告)日：2002-11-07

申请号：US09848677

申请日：2001-05-03

Inventor： Rocco A. Orsini ,  Michael B. Petach ,  Roy D. McGregor

IPC: G01J001/00

CPC classification number: H05G2/003 ,  H05G2/006

Abstract: A nozzle (46) for a laser-plasma EUV radiation source that provides thermal isolation between the nozzle body (48) and the target material flowing therethrough. A target delivery tube (72) is provided that extends through the nozzle body (48). The delivery tube (72) has an expansion aperture (80) positioned behind an exit collimator (50) of the nozzle body (48). The delivery tube (72) is made of a low thermal conductivity material, such as stainless steel, and is in limited contact with the nozzle body (48) so that heating of the nozzle body (48) from the plasma does not heat the liquid target material being delivered through the delivery tube (72). The expansion aperture (80) has a smaller diameter than the exit collimator (50).

Abstract translation: 一种用于激光等离子体EUV辐射源的喷嘴（46），其在喷嘴体（48）和流过其中的目标材料之间提供热隔离。 提供了延伸穿过喷嘴体（48）的目标输送管（72）。 输送管（72）具有位于喷嘴体（48）的出口准直器（50）后面的膨胀孔（80）。 输送管（72）由诸如不锈钢的低热导率材料制成，并且与喷嘴体（48）有有限的接触，使得喷嘴体（48）从等离子体加热不会加热液体 目标材料通过输送管（72）输送。 膨胀孔（80）具有比出口准直器（50）更小的直径。

公开(公告)号：US20020159048A1

公开(公告)日：2002-10-31

申请号：US10080537

申请日：2002-02-25

Applicant: Nikon Corporation

Inventor： Fuyuhiko Inoue ,  Toru Fujii

IPC: G01J001/00

CPC classification number: G03F7/706 ,  G01J9/00

Abstract: First, the wave-front aberration in an optical system PL subject to measurement is measured using a measuring system 70 according to a usual method. After that, by using calculated correction information for aberration components of a second set of order terms based on a model for the measuring system 70 and aberration components of a first set of order terms measured before, the result of measuring aberration components of the second set of order terms is corrected. As a result, aberration components of the second set of order terms can be accurately obtained, so that the wave-front aberration in the optical system subject to measurement is accurately obtained.

Abstract translation: 首先，根据通常的方法，使用测量系统70测量待测量的光学系统PL中的波前像差。 之后，通过使用基于测量系统70的模型和之前测量的第一组次序项的像差分量的第二组次序项的像差分量的计算校正信息，测量第二组的像差分量的结果 订单条款得到纠正。 结果，可以精确地获得第二组次序的像差分量，从而准确地获得受测量的光学系统中的波前像差。

公开(公告)号：US20020100882A1

公开(公告)日：2002-08-01

申请号：US09442582

申请日：1999-11-18

Inventor： WILLIAM N. PARTLO ,  IGOR V. FOMENKOV ,  DANIEL L. BIRX

IPC: G01J001/00

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

Abstract: A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the active gas. A blast shield positioned just beyond the location of the high density pinch provides a physical barrier which confines the pinch limiting its axial elongation. A small port is provided in the blast shield that permits the radiation but not the plasma to pass through the shield. In a preferred embodiment a surface of the shield facing the plasma is dome-shaped.

Abstract translation: 高能光子源。 一对等离子体夹紧电极位于真空室中。 该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。 脉冲电源以足够高的电压提供电脉冲以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在活性气体的谱线处提供辐射。 位于刚刚超出高密度夹点位置的防爆罩提供了限制其限制其轴向伸长的夹紧的物理屏障。 防爆罩中设有一个允许辐射而不是等离子体通过防护罩的小型端口。 在优选实施例中，面向等离子体的屏蔽的表面是圆顶形的。