公开(公告)号：US20030166828A1

公开(公告)日：2003-09-04

申请号：US10180624

申请日：2002-06-25

Applicant: BREWER SCIENCE, INC.

Inventor： Robert Christian Cox ,  Charles J. Neef

IPC: C08G069/00 ,  C08G069/26

CPC classification number: C09D179/08 ,  C08G73/10 ,  C08G73/1025 ,  C08G73/1039 ,  C08G73/1064 ,  G02B1/111 ,  G03F7/038 ,  G03F7/091 ,  Y10S430/106 ,  Y10S430/151

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment the polymers of the composition include recurring monomers having the formulas 1 where: (1) each R is individually selected from the group consisting of hydrogen, nullOH, aliphatics, and phenyls; and (2) L is selected from the group consisting of nullSO2null and nullCRnull2null, where each Rnull is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and nullCX3, where each X is individually selected from the group consisting of the halogens. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

Abstract translation: 提供了抗反射组合物和使用这些组合物形成电路的方法。 组合物包含溶解或分散在溶剂体系中的聚合物。 在一个优选的实施方案中，组合物的聚合物包括具有下式的重复单体：其中：（1）每个R各自选自氢，-OH，脂族基和苯基; 和（2）L选自-SO 2 - 和-CR 2 - ，其中每个R'分别选自氢，脂族基，苯基和-CX 3，其中每个X被单独选择 来自由卤素组成的组。 所得到的组合物是旋转碗相容的（即，它们在微光刻工艺的烘烤阶段之前或在室温下储存期间不交联）是湿显影的并且具有优异的光学性能。

公开(公告)号：US20030054117A1

公开(公告)日：2003-03-20

申请号：US09778980

申请日：2001-02-02

Applicant: BREWER SCIENCE, INC.

Inventor： Ram W. Sabnis ,  Douglas J. Guerrero

IPC: C23C016/00 ,  C08F002/46 ,  C08J007/18 ,  H01L021/469 ,  H01L021/4763

CPC classification number: G02B1/11 ,  G03F7/091 ,  H01L21/0276

Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The most preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprise subjecting the monomers to sufficient electric current and pressure so as to cause the monomers to sublime to form a vapor which is then changed to the plasma state by application of an electric current. The vaporized monomers are subsequently polymerized onto a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 nullm or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.

Abstract translation: 提供了一种用于将聚合物抗反射涂层施加到基底表面和所得前体结构的改进方法。 广泛地，这些方法包括在衬底表面上的等离子体增强化学气相沉积（PECVD）聚合物。 最优选的起始单体是4-氟苯乙烯，2,3,4,5,6-五氟苯乙烯和烯丙基五氟苯。 PECVD方法包括使单体经受足够的电流和压力，以使单体升华以形成蒸汽，然后通过施加电流将其转化为等离子体状态。 蒸发的单体随后在沉积室中聚合到基底表面上。 本发明的方法可用于在具有超亚微米（0.25μm或更小）特征的大表面基底上提供高保形抗反射涂层。 该方法提供比常规化学气相沉积（CVD）方法更快的沉积速率，是环境友好的并且是经济的。