Developer-soluble metal alkoxide coatings for microelectronic applications
    1.
    发明申请
    Developer-soluble metal alkoxide coatings for microelectronic applications 有权
    用于微电子应用的显影剂可溶性金属醇盐涂料

    公开(公告)号:US20030235786A1

    公开(公告)日:2003-12-25

    申请号:US10180625

    申请日:2002-06-25

    Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers of the composition include recurring units having the formula 1 where X is a light-attenuating moiety, M is a metal, and each R is individually selected from the group consisting of hydrogen, alkyls, aryls, alkoxys, and phenoxys. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

    Abstract translation: 提供了抗反射组合物和使用这些组合物形成电路的方法。 组合物包含溶解或分散在溶剂体系中的聚合物。 在优选的实施方案中,组合物的聚合物包括具有下式的重复单元:其中X是光衰减部分,M是金属,并且每个R各自选自氢,烷基,芳基,烷氧基和 苯氧基 所得到的组合物是旋转碗相容的(即,它们在微光刻工艺的烘烤阶段之前或在室温下储存期间不交联)是湿显影的并且具有优异的光学性能。

    Wet-developable anti-reflective compositions
    2.
    发明申请
    Wet-developable anti-reflective compositions 有权
    湿显影抗反射组合物

    公开(公告)号:US20040058275A1

    公开(公告)日:2004-03-25

    申请号:US10601897

    申请日:2003-06-23

    Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers include a light-attenuating moiety having a structure selected from the group consisting of: 1 where: each of X1 and Y is individually selected from the group consisting of electron withdrawing groups; R2 is selected from the group consisting of alkyls and aryls; and R3 is selected from the group consisting of hydrogen and alkyls. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

    Abstract translation: 提供了抗反射组合物和使用这些组合物形成电路的方法。 组合物包含溶解或分散在溶剂体系中的聚合物。 在优选的实施方案中,聚合物包括具有选自下组的结构的光衰减部分:其中:X 1和Y各自独立地选自吸电子基团; R 2选自烷基和芳基; 和R 3选自氢和烷基。 所得到的组合物是旋转碗相容的(即,它们在微光刻工艺的烘烤阶段之前或在室温下储存期间不交联)是湿显影的并且具有优异的光学性能。

    Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties
    3.
    发明申请
    Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties 有权
    底部抗反射涂层衍生自具有多个环氧部分的小核心分子

    公开(公告)号:US20040110089A1

    公开(公告)日:2004-06-10

    申请号:US10679521

    申请日:2003-10-06

    Abstract: Novel anti-reflective coatings comprising small molecules (e.g., less than about 5,000 g/mole) in lieu of high molecular weight polymers and methods of using those coatings are provided. In one embodiment, aromatic carboxylic acids are used as the chromophores, and the resulting compounds are blended with a crosslinking agent and an acid. Anti-reflective coating films prepared according to the invention exhibit improved properties compared to high molecular weight polymeric anti-reflective coating films. The small molecule anti-reflective coatings have high etch rates and good via fill properties. Photolithographic processes carried out with the inventive material result in freestanding, 110-nm profiles.

    Abstract translation: 提供了包含小分子(例如小于约5,000g / mol)代替高分子量聚合物的新型抗反射涂层以及使用这些涂层的方法。 在一个实施方案中,使用芳族羧酸作为发色团,并将所得化合物与交联剂和酸共混。 与高分子量聚合物抗反射涂膜相比,根据本发明制备的抗反射涂膜显示出改进的性能。 小分子抗反射涂层具有高蚀刻速率和良好的通孔填充性能。 使用本发明材料进行的光刻工艺产生独立的110nm轮廓。

    Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
    4.
    发明申请
    Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings 有权
    旋转碗相容的聚酰胺酸/酰亚胺作为抗反射涂层的湿显影聚合物粘合剂

    公开(公告)号:US20030166828A1

    公开(公告)日:2003-09-04

    申请号:US10180624

    申请日:2002-06-25

    Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment the polymers of the composition include recurring monomers having the formulas 1 where: (1) each R is individually selected from the group consisting of hydrogen, nullOH, aliphatics, and phenyls; and (2) L is selected from the group consisting of nullSO2null and nullCRnull2null, where each Rnull is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and nullCX3, where each X is individually selected from the group consisting of the halogens. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

    Abstract translation: 提供了抗反射组合物和使用这些组合物形成电路的方法。 组合物包含溶解或分散在溶剂体系中的聚合物。 在一个优选的实施方案中,组合物的聚合物包括具有下式的重复单体:其中:(1)每个R各自选自氢,-OH,脂族基和苯基; 和(2)L选自-SO 2 - 和-CR 2 - ,其中每个R'分别选自氢,脂族基,苯基和-CX 3,其中每个X被单独选择 来自由卤素组成的组。 所得到的组合物是旋转碗相容的(即,它们在微光刻工艺的烘烤阶段之前或在室温下储存期间不交联)是湿显影的并且具有优异的光学性能。

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