Peeling liquid for a resist
    132.
    发明授权
    Peeling liquid for a resist 有权
    剥离液体用于抗蚀剂

    公开(公告)号:US09229329B2

    公开(公告)日:2016-01-05

    申请号:US14093737

    申请日:2013-12-02

    CPC classification number: G03F7/425 C11D11/0047

    Abstract: The invention discloses a peeling liquid for a resist, which relates to an optical element and is used for removing the color resist and the protective layer on a color filter rapidly and efficiently. The peeling liquid for a color resist on a color filter comprises an alkali metal alkoxide with a mass percentage of 10-45%, an organic amine with a mass percentage of 10-30%, a surfactant with a mass percentage of 5-30%, a solvent with a mass percentage of 20-60%, and an alcohol with a mass percentage of 1-55% in terms of the peeling liquid for a resist with a mass percentage of 100%. The peeling liquid for a resist in invention is used for removing the color resist and the protective layer of the substandard product in a color filter.

    Abstract translation: 本发明公开了一种抗蚀剂用剥离液,涉及一种光学元件,用于快速高效地除去滤色剂和保护层。 用于滤色器上的着色剂的剥离液包含质量百分比为10-45%的碱金属醇盐,质量百分比为10-30%的有机胺,质量百分比为5-30%的表面活性剂, ,质量百分比为20-60%的溶剂,质量百分比为100%的抗蚀剂剥离液的质量百分比为1-55%的醇。 用于本发明抗蚀剂的剥离液用于除去滤色器中的着色抗蚀剂和不合格产品的保护层。

    BOTTOM-EMITTING SUBSTRATE, DISPLAY DEVICE AND MANUFACTURING METHOD OF SUBSTRATE
    133.
    发明申请
    BOTTOM-EMITTING SUBSTRATE, DISPLAY DEVICE AND MANUFACTURING METHOD OF SUBSTRATE 有权
    底板发射基板,显示装置和基板的制造方法

    公开(公告)号:US20150380475A1

    公开(公告)日:2015-12-31

    申请号:US14417355

    申请日:2014-06-05

    CPC classification number: H01L31/02164 H01L27/3262 H01L27/3276 H01L51/5284

    Abstract: A bottom-emitting substrate, a display device and a method for manufacturing the bottom emitting substrate are provided. The bottom-emitting substrate comprises: a base substrate (1); a black matrix layer (2) with a plurality of opening regions and a plurality of non-opening regions disposed on the base substrate (1); and an array substrate unit disposed on the black matrix layer (2), projections of metal layers in the array substrate unit on the black matrix layer (2) locating within the plurality of non-opening regions of the black matrix layer (2). A method for manufacturing the bottom-emitting substrate and a display device comprising the bottom-emitting substrate are also provided.

    Abstract translation: 提供底部发射基板,显示装置和制造底部发射基板的方法。 底部发射衬底包括:基底(1); 具有多个开口区域的黑矩阵层(2)和设置在基底基板(1)上的多个非开口区域; 以及配置在所述黑矩阵层(2)上的阵列基板单元,位于所述黑矩阵层(2)上的所述阵列基板单元中的位于所述黑矩阵层(2)的所述多个非开口区域内的金属层的突起。 还提供了用于制造底部发射基板的方法和包括底部发射基板的显示装置。

    VINYL ETHER GROUP-CONTAINING COPOLYMER, PREPARATION PROCESS AND USE THEREOF
    134.
    发明申请
    VINYL ETHER GROUP-CONTAINING COPOLYMER, PREPARATION PROCESS AND USE THEREOF 有权
    含乙烯基团的共聚物,制备方法及其用途

    公开(公告)号:US20140170561A1

    公开(公告)日:2014-06-19

    申请号:US14103301

    申请日:2013-12-11

    Abstract: The invention provides a vinyl ether group-containing copolymer, preparation process and use thereof. The copolymer comprises of the structural units represented by the following general formulae I, II and III, wherein, R1 is O or HN, R2 is an alkyl group with a carbon atom number of 1-4, cyclohexyl or a group represented by the following general formula IV (m represents a positive integer of 1-3), n is a positive integer of 1-4, the molar numbers of the structural units represented by the general formulae I, H and III are x, y and z, respectively, and x:y:z=3-8:1-4:1-5, the weight average molecular weight of the copolymer is 5000-20000. A color light blocking agent added with the copolymer can increase sensitivity. Furthermore, the copolymer has solubility in an alkaline solution, and thus, the color light blocking agent added with the copolymer has a superior developing property.

    Abstract translation: 本发明提供含乙烯基醚基的共聚物,其制备方法和用途。 共聚物包含由以下通式I,II和III表示的结构单元,其中,R 1为O或HN,R 2为碳原子数为1-4的烷基,环己基或下列基团 通式IV(m表示1-3的正整数),n为1-4的正整数,由通式I,H和III表示的结构单元的摩尔数分别为x,y和z ,x:y:z = 3-8:1-4:1-5,共聚物的重均分子量为5000-20000。 加入共聚物的遮光剂可以提高灵敏度。 此外,共聚物在碱性溶液中具有溶解性,因此加入共聚物的遮光剂具有优异的显影性。

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