Abstract:
An LED polarimeter is described which is suitable for measuring the stress in photoelastic materials. The polarimeter comprises a sequential arrangement of an LED light source, a first polarizer, a ¼ wave plate, and a second polarizer substantially aligned along a central axis. The relatively monochromatic LED light source essentially eliminates errors caused by chromatic abberations and heat damage to the polarizing film. Preferrably, the LED light source emits in the green region of the visible spectrum to take advantage of the sensitivity of the human eye to this part of the spectrum.
Abstract:
Stress-induced photoelastic birefringence compensates for intrinsic birefringence of cubic crystalline structures in deep ultraviolet (less than 200 nm) microlithographic imaging systems. Both the photoelastic birefringence and the intrinsic birefringence are expressed in a tensor format simplified by the symmetries of cubic crystalline structures. The stress-induced photoelastic birefringence can be sized to individually compensate for intrinsic birefringence exhibited in the same optical elements or preferably to collectively compensate for the cumulative effects of intrinsic birefringence in other optical elements in the lithography system.
Abstract:
A method and apparatus for measuring the physical properties of a micro region measures the two-dimensional distribution of stress/strain in real time at high resolution and sensitivity and with a high level of measuring position matching. A sample is scanned and irradiated with a finely focused electron beam (23, 26), and the displacement of position of a diffraction spot (32, 33) is measured by a two-dimensional position-sensitive electron detector (13). The displacement amount is outputted as a voltage value that is then converted into the magnitude of the stress/strain according to the principle of a nano diffraction method, and the magnitude is displayed in synchronism with a sample position signal.
Abstract:
Stress-induced photoelastic birefringence compensates for intrinsic birefringence of cubic crystalline structures in deep ultraviolet (less than 200 nm) microlithographic imaging systems. Both the photoelastic birefringence and the intrinsic birefringence are expressed in a tensor format simplified by the symmetries of cubic crystalline structures. The stress-induced photoelastic birefringence can be sized to individually compensate for intrinsic birefringence exhibited in the same optical elements or preferably to collectively compensate for the cumulative effects of intrinsic birefringence in other optical elements in the lithography system.
Abstract:
This invention discloses a mechanical stress measurement system which utilizes a birefringent coating and spectral demodulation to determine the magnitude and angular orientation of the stresses in a mechanical element from which the loads acting on that mechanical element are calculated. The invention provides for the measurement of Torque, Axial and Bending loads in a shaft, whether they exist singularly or in combination, without the requirement for electrical, mechanical or physical contact with the shaft, and is able to determine the magnitude and sense of the torque and axial loads, and the magnitude and plane of the bending load.
Abstract:
Polarized light from a polarizer 12 is passed through a stressed birefringent object 14 and an analyser 16 to produce a fringe pattern representative of the stress in the object 14. The fringe pattern is observed with a CCD camera 18 and intensity information of the pattern is input to a computer 22. The process is repeated for at least two wavelengths of light and the information for the different wavelengths is combined to form a stress map of the object 14 for display on a VDU 24.
Abstract:
A stress sensor having directional measurement capabilities based on the photoelastic effect in isotropic photoelastic materials. Directional measurement capability is achieved in the sensor by the incorporation of three different optical axes passing through the photoelastic element. This creates three independent stress sensors which utilize a single sensing element. Each of the three independent stress sensors are sensitive to applied stress in different directions. The response of each of the sensors is analyzed and the magnitude and direction of incoming stress is determined. The use of a sum-difference output detection scheme results in immunity to light source intensity variations, optical fiber microbending losses, and fiberoptic connector losses. The stress sensor is immune to electromagnetic interference (EMI) and electromagnetic pulse (EMP), and is compatible with fiberoptic data transmission and control lines.
Abstract:
An optical switch which comprises a photoelastic, optically transparent material whose index of refraction is changed by stress and which propagates an optical beam or beams from an inlet window to an outlet window in the material, with the inlet window adapted to receive an optical beam from an optical source and the outlet window adapted to pass an optical beam from the photoelastic material to an optical output receptor, and a receptor means of applying a stress gradient to said photoelastic material to change the index of refraction and hence, the optical path of the optical beam between a normal, unstressed optical beam path and a bent, stressed optical beam path. Optical systems are described in which the optical switch is employed to form optical lenses wherein an optical beam is focused by stress within an optical material, such as a photoelastic cylindrical rod. Optical integrated systems are also described employing the optical switch with optical devices as an optical integrated module.
Abstract:
An optical fiber sensor, which has a detector section connected in a single optical path made of an optical-fiber cable and having a light-modulating element and an optical element connected in series. The light-modulating element has its birefringence degree changed in accordance with the physical quantity to be sensed, thereby to modulate the polarization state of the physical quantity. The optical element converts the polarization state of the physical quantity into the intensity of light. The sensor further comprises two light sources, which apply two light beams having different wavelengths .lambda..sub.1 and .lambda..sub.2 to one end of the optical path. The intensities P.sub.1 and P.sub.2 of the beams of the wavelengths .lambda..sub.1 and .lambda..sub.2, both emitted from the other end of the optical path, are detected. The intensities .lambda..sub.1 and .lambda..sub.2 vary in accordance with the changes in the intensity of the light emitted from the light sources, in the loss at the optical-fiber cable and the optical connector, and in the physical quantity to be detected. To obtain data free of the changes in the intensity of the light emitted from the light sources, in the loss at the optical-fiber cable and the optical connector, one type of the sensor has means for controlling one of the light sources such that the intensities P.sub.1 and P.sub.2 are at the same level, and means for detecting the intensities P.sub.01 and P.sub.02 of the light beams emitted from the two light sources and performing the calculation of (P.sub.01 -P.sub.02)/(P.sub.01 +P.sub.02).
Abstract:
An optical switch which comprises a photoelastic, optically transparent material whose index of refraction is changed by mechanical stress and which propagates an optical beam or beams from an inlet window to an outlet window in the material, with the inlet window adapted to receive an optical beam from an optical source and the outlet window adapted to pass an optical beam from the photoelastic material to an optical output receptor, and a means of applying a stress gradient to said photoelastic material to change the index of refraction and hence, the optical path of the optical beam between a normal, unstressed optical beam path and a bent, stressed optical beam path. Optical systems are described in which the optical switch is employed to receive an optical beam from a source and to switch a beam after passing it through the photoelastic optical material to and from an optical receptor. The disclosure also includes a method of optically switching an optical beam between normal and stressed optical beam positions by applying a predetermined mechanical force to a photoelastic optically transparent material to form a mechanical stress gradient within the optical transparent photoelastic material which provides an index of refraction gradient therein and causes the switching of the optical beam.