公开(公告)号：US20230395350A1

公开(公告)日：2023-12-07

申请号：US18205711

申请日：2023-06-05

申请人： Oxford Instruments Nanotechnology Tools Limited

发明人： Patrick Trimby ,  Klaus Mehnert ,  Aimo Winkelmann

IPC分类号： H01J37/244 ,  H01J37/28 ,  H01J37/26 ,  H01J37/295

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J37/265 ,  H01J37/2955 ,  H01J2237/24475

摘要： A method of indexing an electron diffraction pattern comprises obtaining a number of experimental electron diffraction patterns at a low resolution from a sample of material using a detector. A master simulation dataset is loaded into the primary memory of a computer system for each phase of the sample material. A simulated template is generated at the low resolution in the primary memory of the computer by using the master simulation dataset from the primary memory wherein the simulated template represents a simulated electron diffraction pattern for a nominal crystallographic orientation. The simulated template is compared with the experimental electron diffraction pattern so as to generate a corresponding similarity measure which is stored. The process is repeated for all crystallographic orientations using crystallographic orientation intervals, and for each phase and each location on the sample. The similarity measures stored in step f are then analysed so as to select at least one resultant indexed phase and orientation for each location. A system configured to perform the method is also provided.

公开(公告)号：US20180269031A1

公开(公告)日：2018-09-20

申请号：US15926623

申请日：2018-03-20

申请人： TESCAN Brno s.r.o. ,  TESCAN TEMPE, LLC.

发明人： Petras Stanislav ,  Lencova Bohumila ,  Benner Gerd Ludwig ,  Jon Karl Weiss

IPC分类号： H01J37/26 ,  H01J37/20 ,  H01J37/244 ,  G01N23/20058

CPC分类号： H01J37/268 ,  G01N23/20058 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J37/2955 ,  H01J2237/1505 ,  H01J2237/1506 ,  H01J2237/1507 ,  H01J2237/1508 ,  H01J2237/2802

摘要： A scanning transmission electron microscope is adapted to acquire high quality precession electron diffraction (PED) patterns by means of separated scanning deflectors and precession deflectors. Magnetic or electrostatic deflectors may be used for scanning and for precession. This enables independent optimization of parameters for each deflection system to achieve a broad operating range simultaneously for both deflection systems.

公开(公告)号：US09274070B2

公开(公告)日：2016-03-01

申请号：US14383713

申请日：2013-03-08

申请人： APPFIVE, LLC

发明人： Jon Karl Weiss ,  Amith D. Darbal ,  Raman D. Narayan ,  Steven T. Kim ,  Stavros Nicolopoulos

IPC分类号： H01J37/26 ,  G01N23/225 ,  G01N23/20 ,  H01J37/295 ,  G01N3/02

CPC分类号： G01N23/2251 ,  G01N3/02 ,  G01N23/20058 ,  H01J37/26 ,  H01J37/261 ,  H01J37/2955 ,  H01J2237/15 ,  H01J2237/2448 ,  H01J2237/24585 ,  H01J2237/2602 ,  H01J2237/2802

摘要： A process for measuring strain is provided that includes placing a sample of a material into a TEM as a sample. The TEM is energized to create a small electron beam with an incident angle to the sample. Electrical signals are generated that control multiple beam deflection coils and image deflection coils of the TEM. The beam deflection control signals cause the angle of the incident beam to change in a cyclic time-dependent manner. A first diffraction pattern from the sample material that shows dynamical diffraction effects is observed and then one or more of the beam deflection coil control signals are adjusted to reduce the dynamical diffraction effects. One or more of the image deflection coil control signals are then adjusted to remove any motion of the diffraction pattern. A diffraction pattern is then collected from a strained area of the material after the adjusting step, and the strain is then determined from a numerical analysis of the strained diffraction pattern compared to a reference diffraction pattern from an unstained area of the material.

摘要翻译： 提供了一种测量应变的方法，包括将材料样品放置在TEM中作为样品。 TEM被激励以产生具有与样品的入射角的小电子束。 产生控制TEM的多个光束偏转线圈和图像偏转线圈的电信号。 光束偏转控制信号使入射光束的角度以循环时间依赖的方式变化。 观察到来自示出动态衍射效应的样品材料的第一衍射图案，然后调整一个或多个光束偏转线圈控制信号以减少动态衍射效应。 然后调整一个或多个图像偏转线圈控制信号以去除衍射图案的任何运动。 然后在调整步骤之后从材料的应变区域收集衍射图案，然后根据与材料的未染色区域的参考衍射图案的应变衍射图案的数值分析来确定应变。

公开(公告)号：US08859965B2

公开(公告)日：2014-10-14

申请号：US14022401

申请日：2013-09-10

申请人： Elpida Memory, Inc.

发明人： Kazuhiro Nojima

IPC分类号： H01J37/295 ,  G01N23/20 ,  G01N23/205

CPC分类号： G01N23/20058 ,  G01N23/2055 ,  H01J37/2955 ,  H01J2237/2802

摘要： A crystal material lattice strain evaluation method includes illuminating a sample having a crystal structure with an electron beam in a zone axis direction, and selectively detecting a certain diffracted wave diffracted in a certain direction among a plurality of diffracted waves diffracted by the sample. The method further includes repeating the illuminating step and the selectively detecting step while scanning the sample, and obtaining a strain distribution image in a direction corresponding to the certain diffracted wave from diffraction intensity at each point of the sample.

摘要翻译： 晶体晶格应变评估方法包括在区域轴线方向上照射具有电子束的晶体结构的样品，并且选择性地检测在被样品衍射的多个衍射波中的某个方向上衍射的某个衍射波。 该方法还包括在扫描样品时重复照明步骤和选择性检测步骤，并且从样品的每个点的衍射强度获得与特定衍射波相对应的方向的应变分布图像。

公开(公告)号：US08552372B2

公开(公告)日：2013-10-08

申请号：US13475408

申请日：2012-05-18

申请人： Kazuhiro Nojima

发明人： Kazuhiro Nojima

IPC分类号： G01N23/20 ,  H01J37/26

CPC分类号： G01N23/20058 ,  G01N23/2055 ,  H01J37/2955 ,  H01J2237/2802

摘要： A crystal material lattice strain evaluation method includes illuminating a sample having a crystal structure with an electron beam in a zone axis direction, and selectively detecting a certain diffracted wave diffracted in a certain direction among a plurality of diffracted waves diffracted by the sample. The method further includes repeating the illuminating step and the selectively detecting step while scanning the sample, and obtaining a strain distribution image in a direction corresponding to the certain diffracted wave from diffraction intensity at each point of the sample.

摘要翻译： 晶体晶格应变评估方法包括在区域轴线方向上照射具有电子束的晶体结构的样品，并且选择性地检测在被样品衍射的多个衍射波中的某个方向上衍射的某个衍射波。 该方法还包括在扫描样品时重复照明步骤和选择性检测步骤，并且从样品的每个点的衍射强度获得与特定衍射波相对应的方向的应变分布图像。

公开(公告)号：US07838833B1

公开(公告)日：2010-11-23

申请号：US11998502

申请日：2007-11-30

申请人： Matthew Lent ,  Stanislaw Marek Borowicz ,  Mehran Nasser-Ghodsi ,  Niles Kenneth MacDonald ,  Ye Yang ,  Kenneth J. Krzeczowski

发明人： Matthew Lent ,  Stanislaw Marek Borowicz ,  Mehran Nasser-Ghodsi ,  Niles Kenneth MacDonald ,  Ye Yang ,  Kenneth J. Krzeczowski

IPC分类号： G01N23/00

CPC分类号： G01N23/2251 ,  H01J37/263 ,  H01J37/28 ,  H01J37/2955 ,  H01J2237/24475 ,  H01J2237/2804

摘要： A method of imaging using an electron beam. An incident electron beam is focused onto the specimen surface, a scattered electron beam is extracted from the specimen surface, and a plurality of dark field signals are detected using a detection system. An interpolated dark field signal is generated using the plurality of dark field signals. In addition, a bright field signal may be detected using the detection system, and a final interpolated signal may be generated using the interpolated dark field signal and the bright field signal. User input may be received which determines a degree of interpolation between two adjacent dark field signals so as to generate the interpolated dark field signal and which determines an amount of interpolation between the interpolated dark field signal and the bright field signal so as to generate a final interpolated signal. Other embodiments, aspects and features are also disclosed.

摘要翻译： 使用电子束成像的方法。 入射电子束被聚焦在样本表面上，从样本表面提取散射的电子束，并且使用检测系统检测多个暗场信号。 使用多个暗场信号产生内插暗场信号。 此外，可以使用检测系统检测亮场信号，并且可以使用内插的暗场信号和亮场信号来产生最终的内插信号。 可以接收确定两个相邻暗场信号之间的内插程度的用户输入，以产生内插的暗场信号，并确定内插暗场信号和亮场信号之间的内插量，以便产生最终的 内插信号。 还公开了其它实施例，方面和特征。

公开(公告)号：US06677581B1

公开(公告)日：2004-01-13

申请号：US09762858

申请日：2001-02-14

申请人： Hideomi Koinuma ,  Masashi Kawasaki

发明人： Hideomi Koinuma ,  Masashi Kawasaki

IPC分类号： H01J4904

CPC分类号： H01J37/2955 ,  H01J2237/06341 ,  H01J2237/188

摘要： A high-energy electron diffraction apparatus in which its electron beam source includes a field emission type electron emitter and a final lens stop or diaphragm is disposed between an objective lens and a specimen. A region of environment of the electron beam that extends from the electron beam source to an objective lens stop or diaphragm is held to a high vacuum, and a region of environment of the electron beam that extends from the objective lens stop or diaphragm to the final lens stop or diaphragm is held to a medium vacuum. A beam axial alignment electrode assembly is disposed between the objective lens stop or diaphragm and the final lens stop or diaphragm. There are also disposed an astigmatic correction electrode assembly and a scan deflection electrode assembly between the final lens stop or diaphragm and the specimen. A screen is spaced away from the specimen at a distance of 50 mm or less.

摘要翻译： 一种高能电子衍射装置，其电子束源包括场致发射型电子发射体，最终的透镜光阑设置在物镜和样本之间。 从电子束源延伸到物镜挡板或隔膜的电子束环境的区域被保持在高真空度，并且从物镜停止或隔膜延伸到最终的电子束的环境区域 透镜挡板或隔膜被保持在中等真空度。 光束轴向对准电极组件设置在物镜挡块或光圈与最终透镜挡块或隔膜之间。 还在最终的透镜挡板或膜片与样品之间设置散光校正电极组件和扫描偏转电极组件。 屏幕距离样品距离为50mm或更小。

公开(公告)号：US5675148A

公开(公告)日：1997-10-07

申请号：US827422

申请日：1992-01-29

申请人： Takao Marui

发明人： Takao Marui

IPC分类号： H01J37/28 ,  G01Q30/02 ,  G01Q30/04 ,  H01J31/48 ,  H01J37/22 ,  H01J37/29 ,  H01J37/295 ,  H01J37/26

CPC分类号： H01J37/28 ,  H01J31/48 ,  H01J37/224 ,  H01J37/2955 ,  H01J2237/2445 ,  H01J2237/2544

摘要： A scanning reflection electron diffraction microscope causes a primary electron beam from its electron gun to be reflectively diffracted from a sample and a diffraction pattern to be formed on a fluorescent screen. An optical lens reduces this diffraction pattern in size and forms its reduced image on a photoelectric surface, thereby producing an image-carrying electron beam. Deflected by a deflecting system including a deflecting coil and a condenser coil, the image-carrying electron beam is detected by an electron-multiplier such that a diffraction pattern is displayed on a cathode ray tube.

摘要翻译： 扫描反射型电子衍射显微镜使来自电子枪的一次电子束从样品反射衍射并形成荧光屏上的衍射图案。 光学透镜减小了这种衍射图案的尺寸，并在光电表面上形成了缩小的图像，从而产生了图像携带电子束。 通过包括偏转线圈和冷凝器线圈的偏转系统偏转，通过电子倍增器检测图像携带电子束，使得衍射图案显示在阴极射线管上。

公开(公告)号：US20160071690A1

公开(公告)日：2016-03-10

申请号：US14888414

申请日：2014-05-14

申请人： OKINAWA INSTITUTE OF SCIENCE AND TECHNOLOGY SCHOOL CORPORATION

发明人： Tsumoru SHINTAKE

IPC分类号： H01J37/244 ,  H01J37/295

CPC分类号： H01J37/244 ,  G01N23/20 ,  H01J37/2955 ,  H01J2237/2449 ,  H01J2237/24578 ,  H01J2237/2544 ,  H01J2237/2803

摘要： A low energy electron diffraction (LEED) detection module (100) includes: a first vacuum chamber for receiving diffracted electrons from a specimen (109); a larger second vacuum chamber connected to the first vacuum chamber to receive the diffracted electrons that have been transported through the first vacuum chamber; a two-dimensional electron detector disposed in the second vacuum chamber to detect the diffracted electrons; a potential shield (106) disposed generally along an inner surface of the first vacuum chamber and an inner surface of the second vacuum chamber; a magnetic lens (105) to expand a beam of the diffracted electrons that have been transported through the first vacuum chamber towards the two-dimensional electron detector; and a generally plane-shaped energy filter (103) to repel electrons having an energy lower than the probe beam (203) of electrons that impinges on the specimen (109).

摘要翻译： 低能电子衍射（LEED）检测模块（100）包括：用于从样品（109）接收衍射电子的第一真空室; 连接到第一真空室的较大的第二真空室，以接收已经传送通过第一真空室的衍射电子; 设置在第二真空室中以检测衍射电子的二维电子检测器; 大致沿第一真空室的内表面设置的电位屏蔽件（106）和第二真空室的内表面; 用于将已经通过第一真空室传送的衍射电子束朝向二维电子检测器扩大的磁性透镜（105）; 和大致平面状的能量过滤器（103），以排斥能量低于碰撞在样本（109）上的电子的探针光束（203）的能量的电子。

公开(公告)号：US20150076346A1

公开(公告)日：2015-03-19

申请号：US14383713

申请日：2013-03-08

申请人： APPFIVE, LLC

发明人： Jon Karl Weiss ,  Amith D. Darbal ,  Raman D. Narayan ,  Steven T. Kim ,  Stavros Nicolopoulos

IPC分类号： G01N23/225 ,  H01J37/26 ,  G01N3/02

CPC分类号： G01N23/2251 ,  G01N3/02 ,  G01N23/20058 ,  H01J37/26 ,  H01J37/261 ,  H01J37/2955 ,  H01J2237/15 ,  H01J2237/2448 ,  H01J2237/24585 ,  H01J2237/2602 ,  H01J2237/2802

摘要： A process for measuring strain is provided that includes placing a sample of a material into a TEM as a sample. The TEM is energized to create a small electron beam with an incident angle to the sample. Electrical signals are generated that control multiple beam deflection coils and image deflection coils of the TEM. The beam deflection control signals cause the angle of the incident beam to change in a cyclic time-dependent manner. A first diffraction pattern from the sample material that shows dynamical diffraction effects is observed and then one or more of the beam deflection coil control signals are adjusted to reduce the dynamical diffraction effects. One or more of the image deflection coil control signals are then adjusted to remove any motion of the diffraction pattern. A diffraction pattern is then collected from a strained area of the material after the adjusting step, and the strain is then determined from a numerical analysis of the strained diffraction pattern compared to a reference diffraction pattern from an unstained area of the material.

摘要翻译： 提供了一种测量应变的方法，包括将材料样品放置在TEM中作为样品。 TEM被激励以产生具有与样品的入射角的小电子束。 产生控制TEM的多个光束偏转线圈和图像偏转线圈的电信号。 光束偏转控制信号使入射光束的角度以循环时间依赖的方式变化。 观察到来自示出动态衍射效应的样品材料的第一衍射图案，然后调整一个或多个光束偏转线圈控制信号以减少动态衍射效应。 然后调整一个或多个图像偏转线圈控制信号以去除衍射图案的任何运动。 然后在调整步骤之后从材料的应变区域收集衍射图案，然后根据与材料的未染色区域的参考衍射图案的应变衍射图案的数值分析来确定应变。