公开(公告)号：US07877722B2

公开(公告)日：2011-01-25

申请号：US11960157

申请日：2007-12-19

Applicant: Brian Duffy ,  Ashok Kulkarni

Inventor： Brian Duffy ,  Ashok Kulkarni

IPC: G06F17/50

CPC classification number: G03F7/7065 ,  G03F7/70525

Abstract: Systems and methods for creating inspection recipes are provided. One computer-implemented method for creating an inspection recipe includes acquiring a first design and one or more characteristics of output of an inspection system for a wafer on which the first design is printed using a manufacturing process. The method also includes creating an inspection recipe for a second design using the first design and the one or more characteristics of the output acquired for the wafer on which the first design is printed. The first and second designs are different. The inspection recipe will be used for inspecting wafers after the second design is printed on the wafers using the manufacturing process.

Abstract translation: 提供了用于创建检查配方的系统和方法。 用于创建检查配方的一种计算机实现的方法包括采用制造过程获取第一设计和用于印刷第一设计的晶片的检查系统的输出的一个或多个特性。 该方法还包括使用第一设计和为其上印刷有第一设计的晶片获取的输出的一个或多个特性来创建用于第二设计的检查配方。 第一和第二种设计是不同的。 在使用制造工艺将第二设计印刷在晶片上之后，检查配方将用于检查晶片。

公开(公告)号：US20100134785A1

公开(公告)日：2010-06-03

申请号：US12616710

申请日：2009-11-11

Applicant: Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

Inventor： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC: G01N21/55 ,  G01J3/00

CPC classification number: G01N21/636 ,  G01N21/1717

Abstract: A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

Abstract translation: 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US07619741B2

公开(公告)日：2009-11-17

申请号：US12185297

申请日：2008-08-04

Applicant: Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

Inventor： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

IPC: G01N21/00

CPC classification number: G01N21/39 ,  G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2201/0612 ,  G01N2201/0691

Abstract: A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

Abstract translation: 调制反射测量系统包括三个基于单色二极管的激光器。 每个激光器可以作为探测光束或作为泵浦光源操作。 使用一系列反射镜和分束器将激光输出重定向到达物镜。 物镜将激光输出聚焦在样品上。 反射能量通过目标返回，并被分束器重定向到检测器。 锁定放大器转换检测器的输出以产生正交（Q）和同相（I）信号用于分析。 处理器使用Q和/或I信号来分析样本。 通过改变用作泵浦或探针光束源的激光器的数量，可以优化测量系统以测量不同样品类型的范围。

公开(公告)号：US3090822A

公开(公告)日：1963-05-21

申请号：US86030859

申请日：1959-12-18

Applicant: SUN OIL CO

Inventor： VOLTZ STERLING E

IPC: C08F10/14

CPC classification number: C08F10/14