公开(公告)号：US08173035B2

公开(公告)日：2012-05-08

申请号：US12371634

申请日：2009-02-16

Applicant: Ching-Hsi Lin ,  Chen-Hsun Du ,  Chung-Wen Lan

Inventor： Ching-Hsi Lin ,  Chen-Hsun Du ,  Chung-Wen Lan

IPC: B44C1/22

CPC classification number: H01L31/02363 ,  Y02E10/50 ,  Y10S323/906

Abstract: A surface texturization method is provided. First, a polymer film is formed on a substrate. Thereafter, a heating treatment is performed on the substrate. The heating treatment results in a textured polymer film having island-shaped and/or microcrack-shaped patterns. Afterwards, an etching process is performed using the textured polymer film as a mask, so as to remove a portion of the substrate to form a textured structure on the surface of the substrate.

Abstract translation: 提供了表面纹理化方法。 首先，在基板上形成聚合物膜。 之后，对基板进行加热处理。 加热处理导致具有岛状和/或微裂纹图案的织构化聚合物膜。 然后，使用纹理化聚合物膜作为掩模进行蚀刻处理，以便去除衬底的一部分以在衬底的表面上形成纹理结构。

公开(公告)号：US08053270B2

公开(公告)日：2011-11-08

申请号：US12214183

申请日：2008-06-16

Applicant: Dimitre Zahariev Dimitrov ,  Chien-Rong Huang ,  Ching-Hsi Lin

Inventor： Dimitre Zahariev Dimitrov ,  Chien-Rong Huang ,  Ching-Hsi Lin

IPC: H01L31/0236

CPC classification number: H01L31/02168 ,  H01L31/02363 ,  Y02E10/50

Abstract: A method for producing a silicon substrate for solar cells is provided. The method includes performing a saw damage removal (SDR) and surface macro-texturing on a silicon substrate with acids solution, so that a surface of the silicon substrate becomes an irregular surface. Thereafter, a metal-activated selective oxidation is performed on the irregular surface with an aqueous solution containing an oxidant and a metal salt, in which the oxidant is one selected from persulfate ion, permanganate ion, bichromate ion, and a mixture thereof. Afterwards, the irregular surface is etched with an aqueous solution containing HF and H2O2 so as to form a nano-texturized silicon substrate.

Abstract translation: 提供一种太阳能电池用硅基板的制造方法。 该方法包括用酸溶液在硅衬底上进行锯损坏去除（SDR）和表面宏纹理，使得硅衬底的表面变成不规则表面。 此后，用含有氧化剂和金属盐的水溶液对不规则表面进行金属活化选择性氧化，其中氧化剂选自过硫酸根离子，高锰酸根离子，重铬酸根离子及其混合物。 然后，用含有HF和H 2 O 2的水溶液蚀刻不规则表面，以形成纳米组织化的硅衬底。

公开(公告)号：US20090308446A1

公开(公告)日：2009-12-17

申请号：US12191317

申请日：2008-08-14

Applicant: Ching-Hsi Lin ,  Shih-Peng Hsu ,  Chien-Rong Huang

Inventor： Ching-Hsi Lin ,  Shih-Peng Hsu ,  Chien-Rong Huang

IPC: H01L31/00 ,  H01L21/00

CPC classification number: H01L31/022425 ,  Y02E10/50

Abstract: A backside electrode layer and a fabricating method thereof are applicable for fabricating a solar cell. The backside electrode layer includes a first electrode layer and a second electrode layer. The first electrode layer is formed on a substrate and has a thickness smaller than 15 μm. The second electrode layer having patterns is formed on the first electrode layer. The first and second electrode layers are fabricated by a cofiring process. As the thickness of the first electrode layer is decreased and the second electrode layer is not a full coverage layer, the material usage of each electrode layer is reduced and the fabrication cost thereof is leveled down. Besides, a thinner electrode layer may avoid warp after the cofiring process.

Abstract translation: 背面电极层及其制造方法可用于制造太阳能电池。 背面电极层包括第一电极层和第二电极层。 第一电极层形成在基板上，其厚度小于15μm。 具有图案的第二电极层形成在第一电极层上。 第一和第二电极层通过共烧工艺制造。 随着第一电极层的厚度减小，第二电极层不是全覆盖层，每个电极层的材料使用减少，并且其制造成本降低。 此外，更薄的电极层可以避免在烧结过程之后的翘曲。

公开(公告)号：US20060057504A1

公开(公告)日：2006-03-16

申请号：US10941237

申请日：2004-09-15

Applicant: Laurence Sadwick ,  Jehn-Huar Chern ,  Ruey-Jen Hwu ,  Jishi Ren ,  Ding Wu ,  Ching-Hsi Lin

Inventor： Laurence Sadwick ,  Jehn-Huar Chern ,  Ruey-Jen Hwu ,  Jishi Ren ,  Ding Wu ,  Ching-Hsi Lin

IPC: H01J25/34 ,  G03F7/00

CPC classification number: H01J25/42 ,  G03F7/2022 ,  G03F7/24 ,  H01J23/165 ,  Y10T29/53439

Abstract: Embodiments of the present invention include helical, ring bar and tunnel ladder slow wave structures (SWSs). Embodiments of methods of micro-fabricating such SWSs are also disclosed. Embodiments of high frequency electromagnetic devices including such SWSs are also disclosed. Exemplary high frequency electromagnetic devices may include a traveling wave tube, a traveling wave tube amplifier, a back wave oscillator, as part of a linear accelerator, a microwave power module, a klystron or a millimeter-wave power module.

Abstract translation: 本发明的实施例包括螺旋形，环形条和隧道梯形慢波结构（SWS）。 还公开了微型制造这种SWS的方法的实施例。 还公开了包括这种SWS的高频电磁装置的实施例。 示例性的高频电磁装置可以包括行波管，行波管放大器，背波振荡器，作为线性加速器的一部分，微波功率模块，速调管或毫米波功率模块。

公开(公告)号：US6080454A

公开(公告)日：2000-06-27

申请号：US934650

申请日：1997-09-22

Applicant: Kuo-Chuan Hsu ,  Ching-Hsi Lin ,  Hsien-Chung Tsai

Inventor： Kuo-Chuan Hsu ,  Ching-Hsi Lin ,  Hsien-Chung Tsai

IPC: C03B19/06 ,  C03B32/02 ,  C03C14/00 ,  C03B19/09

CPC classification number: C03C14/004 ,  C03B19/06 ,  C03B32/02 ,  C03C2214/08 ,  C03C2214/20

Abstract: A process for producing stained crystallized glass and its articles is provided where crystallized glass is obtained with patterns and colors like that of granites, marble, and other natural stones. The process includes the heat-treatment of a prepared batch of crystallizable glass granules, colored powder and water, at a temperature higher than the softening point of the glass granules resulting in fusion bonding of the glass granules. The colored powder is compounded by an inorganic pigment, a suspension stabilizing agent, an agglomerate, a deflocculant agent, and a crystallizable glass powder. The surface pattern is formed by the grain boundary region of the crystallizable glass granules, and part of the inorganic pigment in the colored powder moving with the crystallizable glass powder.

Abstract translation: 提供了一种生产结晶化玻璃及其制品的方法，其中获得了具有花岗岩，大理石和其它天然石材的图案和颜色的结晶玻璃。 该方法包括在高于玻璃颗粒的软化点的温度下对制备的可结晶玻璃颗粒，着色粉末和水的批处理进行热处理，导致玻璃颗粒的熔合。 着色粉末由无机颜料，悬浮稳定剂，附聚物，抗絮凝剂和可结晶玻璃粉末组成。 表面图案由可结晶玻璃颗粒的晶界区域形成，着色粉末中的无机颜料的一部分与可结晶玻璃粉末一起移动。

公开(公告)号：US20100147798A1

公开(公告)日：2010-06-17

申请号：US12371634

申请日：2009-02-16

Applicant: Ching-Hsi Lin ,  Chen-Hsun Du ,  Chung-Wen Lan

Inventor： Ching-Hsi Lin ,  Chen-Hsun Du ,  Chung-Wen Lan

IPC: B44C1/22

CPC classification number: H01L31/02363 ,  Y02E10/50 ,  Y10S323/906

Abstract: A surface texturization method is provided. First, a polymer film is formed on a substrate. Thereafter, a heating treatment is performed on the substrate. The heating treatment results in a textured polymer film having island-shaped and/or microcrack-shaped patterns. Afterwards, an etching process is performed using the textured polymer film as a mask, so as to remove a portion of the substrate to form a textured structure on the surface of the substrate.

Abstract translation: 提供了表面纹理化方法。 首先，在基板上形成聚合物膜。 之后，对基板进行加热处理。 加热处理导致具有岛状和/或微裂纹图案的织构化聚合物膜。 然后，使用纹理化聚合物膜作为掩模进行蚀刻处理，以便去除衬底的一部分以在衬底的表面上形成纹理结构。