Abstract:
A method for printing a large pattern onto a substrate which includes decomposing the large pattern into a plurality of pattern segments; providing a mask in which is arranged one of each distinctive pattern segment; recording a hologram mask of the mask; providing a TIR holographic lithography machine with an exposure system for discretely reconstructing with a scanning illumination beam the distinct pattern segments recorded in the hologram mask, and with a substrate positioning system for laterally displacing the substrate with respect to the hologram mask; arranging the substrate and the hologram mask in the lithographic machine; displacing the substrate to a first lateral position with respect to the hologram mask and discretely printing the first pattern segment at a first location on the substrate; and repeating this for the different pattern segments recorded in the hologram mask until the large pattern has been printed onto the substrate.
Abstract:
A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.
Abstract:
A method for printing a desired periodic pattern includes providing a mask bearing a pattern of features having a period, providing a substrate bearing a photosensitive layer, arranging the substrate with a separation from the mask, generating collimated light with a wavelength and an intensity, at least the former of which may be temporally varied to deliver a spectral distribution of energy density, illuminating the mask pattern with the light while varying at least its wavelength so as to deliver a spectral distribution of energy density, such that the light-field transmitted by the mask is instantaneously composed of a range of transversal intensity distributions between Talbot planes. The layer is exposed to a time-integrated intensity distribution that prints the desired pattern. The separation, spectral distribution and period are arranged so that the time-integrated intensity distribution corresponds to an average of the range of transversal intensity distributions.
Abstract:
A method for printing a periodic pattern of features into a photosensitive layer includes providing a mask bearing a mask pattern, providing a substrate bearing the layer, arranging the substrate parallel to the mask, providing a number of lasers having a plurality of peak wavelengths, forming from the light a beam for illuminating the mask with a spectral distribution of exposure dose and a degree of collimation, illuminating the mask with the beam such that the light of each wavelength transmitted by the mask pattern forms a range of transversal intensity distributions between Talbot planes and exposes the photosensitive layer to an image component. The separation and the spectral distribution are arranged so that the superposition of the components is equivalent to an average of the range of transversal intensity distributions formed by light of one wavelength and the collimation is arranged so that the features are resolved.
Abstract:
A method for printing a desired periodic pattern includes providing a mask bearing a pattern of features having a period, providing a substrate bearing a photosensitive layer, arranging the substrate with a separation from the mask, generating collimated light with a wavelength and an intensity, at least the former of which may be temporally varied to deliver a spectral distribution of energy density, illuminating the mask pattern with the light while varying at least its wavelength so as to deliver a spectral distribution of energy density, such that the light-field transmitted by the mask is instantaneously composed of a range of transversal intensity distributions between Talbot planes. The layer is exposed to a time-integrated intensity distribution that prints the desired pattern. The separation, spectral distribution and period are arranged so that the time-integrated intensity distribution corresponds to an average of the range of transversal intensity distributions.
Abstract:
A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.
Abstract:
A method for printing a composite pattern into a photosensitive layer on a substrate which includes arranging a hologram mask on a first face of a coupling element; arranging the substrate substantially parallel and in proximity to the hologram mask and such that the substrate is laterally positioned with respect to the pattern recorded in the hologram mask; printing the pattern in focus into a part of the photosensitive layer by scanning an exposure beam over the hologram mask and reconstructing the pattern recorded therein while simultaneously measuring the local separation of the substrate and hologram mask where reconstruction is taking place by scanning a focus beam over the hologram mask and continuously correcting the separation by displacing the hologram mask and coupling element; and repeating said arranging and printing steps to print again the pattern into an unexposed part of the photosensitive layer.
Abstract:
A method for manufacturing a surface-relief hologram mask for use on a lithographic system based on TIR holography that includes providing a master hologram mask of a pattern recorded using TIR holography, arranging said master hologram mask on the first face of a coupling element having a second face through which an exposure beam from an illumination system may pass for reconstructing the pattern recorded in the master hologram mask, arranging a recording plate bearing a layer of a surface-relief holographic recording material in proximity or in contact with the master hologram mask such that light in an exposure beam that is not diffracted by the master hologram mask is transmitted into the recording layer, inhibiting the recording by an exposure beam from the illumination system of the reflection image hologram in the recording layer, and recording the transmission image hologram of the master hologram mask in the recording layer.