Large pattern printing
    11.
    发明申请
    Large pattern printing 审中-公开
    大图案印花

    公开(公告)号:US20060121357A1

    公开(公告)日:2006-06-08

    申请号:US11015122

    申请日:2004-12-02

    Applicant: Francis Clube

    Inventor: Francis Clube

    Abstract: A method for printing a large pattern onto a substrate which includes decomposing the large pattern into a plurality of pattern segments; providing a mask in which is arranged one of each distinctive pattern segment; recording a hologram mask of the mask; providing a TIR holographic lithography machine with an exposure system for discretely reconstructing with a scanning illumination beam the distinct pattern segments recorded in the hologram mask, and with a substrate positioning system for laterally displacing the substrate with respect to the hologram mask; arranging the substrate and the hologram mask in the lithographic machine; displacing the substrate to a first lateral position with respect to the hologram mask and discretely printing the first pattern segment at a first location on the substrate; and repeating this for the different pattern segments recorded in the hologram mask until the large pattern has been printed onto the substrate.

    Abstract translation: 一种用于将大图案印刷到基板上的方法,包括将大图案分解为多个图案片段; 提供掩模,其中布置了每个特征图案段之一; 记录面罩的全息面罩; 提供一种具有曝光系统的TIR全息光刻机,用于利用扫描照明束离散地重建记录在全息掩模中的不同图案段,以及用于相对于全息掩模横向移位衬底的衬底定位系统; 将基板和全息掩模布置在平版印刷机中; 将衬底相对于全息掩模移位到第一横向位置,并在衬底上的第一位置离散地印刷第一图案区段; 并且对于记录在全息掩模中的不同图案片段重复该步骤,直到将大图案印刷到基底上。

    Methods and systems for printing arrays of features

    公开(公告)号:US10365566B2

    公开(公告)日:2019-07-30

    申请号:US16061041

    申请日:2016-12-14

    Abstract: A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.

    Method and system for printing high-resolution periodic patterns
    13.
    发明授权
    Method and system for printing high-resolution periodic patterns 有权
    打印高分辨率周期图案的方法和系统

    公开(公告)号:US09280056B2

    公开(公告)日:2016-03-08

    申请号:US13979489

    申请日:2012-01-10

    CPC classification number: G03F7/70091 G03F7/7035 G03F7/70408

    Abstract: A method for printing a desired periodic pattern includes providing a mask bearing a pattern of features having a period, providing a substrate bearing a photosensitive layer, arranging the substrate with a separation from the mask, generating collimated light with a wavelength and an intensity, at least the former of which may be temporally varied to deliver a spectral distribution of energy density, illuminating the mask pattern with the light while varying at least its wavelength so as to deliver a spectral distribution of energy density, such that the light-field transmitted by the mask is instantaneously composed of a range of transversal intensity distributions between Talbot planes. The layer is exposed to a time-integrated intensity distribution that prints the desired pattern. The separation, spectral distribution and period are arranged so that the time-integrated intensity distribution corresponds to an average of the range of transversal intensity distributions.

    Abstract translation: 一种用于印刷期望的周期性图案的方法包括提供一种带有具有周期的特征图案的掩模,提供带有感光层的基底,将衬底与掩模分离,产生具有波长和强度的准直光, 其中最前者可以在时间上变化以提供能量密度的光谱分布,用光照亮掩模图案,同时至少改变其波长,以便传递能量密度的光谱分布,使得光场通过 面具瞬间由Talbot平面之间的一系列横向强度分布组成。 该层暴露于打印所需图案的时间积分强度分布。 布置分离,光谱分布和周期,使得时间积分强度分布对应于横向强度分布范围的平均值。

    METHOD AND APPARATUS FOR PRINTING PERIODIC PATTERNS USING MULTIPLE LASERS
    14.
    发明申请
    METHOD AND APPARATUS FOR PRINTING PERIODIC PATTERNS USING MULTIPLE LASERS 审中-公开
    使用多个激光打印周期性图案的方法和装置

    公开(公告)号:US20140307242A1

    公开(公告)日:2014-10-16

    申请号:US14123330

    申请日:2012-06-01

    CPC classification number: G03F7/70075 G03F7/70408

    Abstract: A method for printing a periodic pattern of features into a photosensitive layer includes providing a mask bearing a mask pattern, providing a substrate bearing the layer, arranging the substrate parallel to the mask, providing a number of lasers having a plurality of peak wavelengths, forming from the light a beam for illuminating the mask with a spectral distribution of exposure dose and a degree of collimation, illuminating the mask with the beam such that the light of each wavelength transmitted by the mask pattern forms a range of transversal intensity distributions between Talbot planes and exposes the photosensitive layer to an image component. The separation and the spectral distribution are arranged so that the superposition of the components is equivalent to an average of the range of transversal intensity distributions formed by light of one wavelength and the collimation is arranged so that the features are resolved.

    Abstract translation: 将特征的周期性图案印刷到感光层中的方法包括提供带有掩模图案的掩模,提供承载该层的基板,将该基板平行于掩模布置,提供多个具有多个峰值波长的激光器,形成 从光照射具有照射剂量的光谱分布和准直程度的光束,用光束照射掩模,使得由掩模图案传输的每个波长的光形成Talbot平面之间的横向强度分布范围 并将感光层暴露于图像分量。 分离和光谱分布被布置成使得部件的叠加等价于由一个波长的光形成的横向强度分布的平均值,并且准直被设置为使得特征被解决。

    METHOD AND SYSTEM FOR PRINTING HIGH-RESOLUTION PERIODIC PATTERNS
    15.
    发明申请
    METHOD AND SYSTEM FOR PRINTING HIGH-RESOLUTION PERIODIC PATTERNS 有权
    打印高分辨率周期模式的方法和系统

    公开(公告)号:US20130308112A1

    公开(公告)日:2013-11-21

    申请号:US13979489

    申请日:2012-01-10

    CPC classification number: G03F7/70091 G03F7/7035 G03F7/70408

    Abstract: A method for printing a desired periodic pattern includes providing a mask bearing a pattern of features having a period, providing a substrate bearing a photosensitive layer, arranging the substrate with a separation from the mask, generating collimated light with a wavelength and an intensity, at least the former of which may be temporally varied to deliver a spectral distribution of energy density, illuminating the mask pattern with the light while varying at least its wavelength so as to deliver a spectral distribution of energy density, such that the light-field transmitted by the mask is instantaneously composed of a range of transversal intensity distributions between Talbot planes. The layer is exposed to a time-integrated intensity distribution that prints the desired pattern. The separation, spectral distribution and period are arranged so that the time-integrated intensity distribution corresponds to an average of the range of transversal intensity distributions.

    Abstract translation: 一种用于印刷期望的周期性图案的方法包括提供一种带有具有周期的特征图案的掩模,提供带有感光层的基底,将衬底与掩模分离,产生具有波长和强度的准直光, 其中最前者可以在时间上变化以提供能量密度的光谱分布,用光照亮掩模图案,同时至少改变其波长,以便传递能量密度的光谱分布,使得光场通过 面具瞬间由Talbot平面之间的一系列横向强度分布组成。 该层暴露于打印所需图案的时间积分强度分布。 布置分离,光谱分布和周期,使得时间积分强度分布对应于横向强度分布范围的平均值。

    Lithographic fabrication of general periodic structures

    公开(公告)号:US20110310374A1

    公开(公告)日:2011-12-22

    申请号:US13218657

    申请日:2011-08-26

    Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.

    Method and apparatus using hologram masks for printing composite patterns onto large substrates
    17.
    发明申请
    Method and apparatus using hologram masks for printing composite patterns onto large substrates 审中-公开
    使用全息掩模将复合图案印刷到大基板上的方法和装置

    公开(公告)号:US20070024938A1

    公开(公告)日:2007-02-01

    申请号:US11188816

    申请日:2005-07-26

    Applicant: Francis Clube

    Inventor: Francis Clube

    Abstract: A method for printing a composite pattern into a photosensitive layer on a substrate which includes arranging a hologram mask on a first face of a coupling element; arranging the substrate substantially parallel and in proximity to the hologram mask and such that the substrate is laterally positioned with respect to the pattern recorded in the hologram mask; printing the pattern in focus into a part of the photosensitive layer by scanning an exposure beam over the hologram mask and reconstructing the pattern recorded therein while simultaneously measuring the local separation of the substrate and hologram mask where reconstruction is taking place by scanning a focus beam over the hologram mask and continuously correcting the separation by displacing the hologram mask and coupling element; and repeating said arranging and printing steps to print again the pattern into an unexposed part of the photosensitive layer.

    Abstract translation: 一种用于将复合图案印刷到基底上的感光层的方法,包括在耦合元件的第一面上布置全息掩模; 将衬底基本上平行并且靠近全息掩模布置,并且使得衬底相对于记录在全息掩模中的图案横向定位; 通过在全息图掩模上扫描曝光光束并将其中记录的图案重新构成,同时测量基板和全息图掩模的局部分离,通过扫描聚焦光束在其上进行重建,从而将图案焦点印刷成感光层的一部分 全息掩模,并通过置换全息掩模和耦合元件来连续校正分离; 并重复所述布置和打印步骤以再次将图案打印到感光层的未曝光部分中。

    Method and apparatus for forming a surface-relief hologram mask
    18.
    发明申请
    Method and apparatus for forming a surface-relief hologram mask 审中-公开
    用于形成表面浮雕全息掩模的方法和装置

    公开(公告)号:US20060232838A1

    公开(公告)日:2006-10-19

    申请号:US11104204

    申请日:2005-04-13

    Applicant: Francis Clube

    Inventor: Francis Clube

    Abstract: A method for manufacturing a surface-relief hologram mask for use on a lithographic system based on TIR holography that includes providing a master hologram mask of a pattern recorded using TIR holography, arranging said master hologram mask on the first face of a coupling element having a second face through which an exposure beam from an illumination system may pass for reconstructing the pattern recorded in the master hologram mask, arranging a recording plate bearing a layer of a surface-relief holographic recording material in proximity or in contact with the master hologram mask such that light in an exposure beam that is not diffracted by the master hologram mask is transmitted into the recording layer, inhibiting the recording by an exposure beam from the illumination system of the reflection image hologram in the recording layer, and recording the transmission image hologram of the master hologram mask in the recording layer.

    Abstract translation: 一种制造用于基于TIR全息术的光刻系统的表面浮雕全息掩模的方法,包括提供使用TIR全息术记录的图案的主全息图掩模,将所述主全息图掩模布置在具有 第二面,来自照明系统的曝光光束可以通过该照明系统重建记录在主全息掩模中的图案,以便将具有表面浮雕全息记录材料的层的记录板与主全息图掩模接近或接触, 未被主全息掩模衍射的曝光光束中的光被传输到记录层,禁止通过来自记录层中的反射图像全息图的照明系统的曝光光束的记录,并且记录传播图像全息图 记录层中的主全息掩模。

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