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74 条记录 (耗时 0.022 秒)

    Method for producing resist substrates
    4.
    发明授权
    Method for producing resist substrates 失效
    抗蚀剂基板的制造方法

    公开(公告)号：US07655381B2

    公开(公告)日：2010-02-02

    申请号：US10545261

    申请日：2004-02-24

    申请人： Wittich Kaule

    发明人： Wittich Kaule

    IPC分类号： G03C5/00

    CPC分类号： G06K19/16 ,  G02B5/1857 ,  G03F7/0005 ,  G03F7/09 ,  G03F7/2059 ,  G03F7/2061 ,  G03H1/0244 ,  G03H1/0891 ,  G03H2001/0478 ,  G03H2224/04 ,  G03H2260/14 ,  G03H2260/63 ,  Y10S430/143

    摘要： The invention relates to a method for producing a substrate having a resist layer in the form of a relief structure, which represents a diffraction structure. The resist layer at least in certain areas adjoins a conductive layer, which scatters the primary electrons and/or produces secondary electrons when the resist layer is exposed by means of an electron beam. With this method the material of the resist layer and the conductive layer and the exposure parameters are adjusted to each other such that the resist layer is also exposed outside the area impinged with the electron beam such that the flanks of the relief structure obtain an inclined form.

    摘要翻译： 本发明涉及一种制造具有形式为浮雕结构的抗蚀剂层的基材的方法，其表示衍射结构。 至少在某些区域中的抗蚀剂层邻接导电层，当通过电子束暴露抗蚀剂层时，其传播一次电子和/或产生二次电子。 利用该方法，将抗蚀剂层和导电层的材料和曝光参数彼此调节，使得抗蚀剂层也暴露在与电子束撞击的区域的外部，使得浮雕结构的侧面获得倾斜形式 。

    Holographic Lithography
    5.
    发明申请
    Holographic Lithography 有权
    全息平版印刷

    公开(公告)号：US20080094674A1

    公开(公告)日：2008-04-24

    申请号：US11660895

    申请日：2005-08-23

    申请人： Alan Purvis ,  Richard McWilliam ,  Nicholas Seed ,  Peter Ivey ,  Andrew Maiden ,  Simon Johnson

    发明人： Alan Purvis ,  Richard McWilliam ,  Nicholas Seed ,  Peter Ivey ,  Andrew Maiden ,  Simon Johnson

    IPC分类号： G03H1/08 ,  G03B27/52 ,  G03F7/00

    CPC分类号： G03H1/0005 ,  G03H1/0808 ,  G03H1/0891 ,  G03H1/2294 ,  G03H2001/0094 ,  G03H2001/048 ,  G03H2001/0858 ,  G03H2001/2221 ,  G03H2210/30 ,  G03H2210/45 ,  G03H2225/33 ,  G03H2225/60 ,  G03H2240/13 ,  G03H2240/52 ,  G03H2260/14 ,  H05K1/0284 ,  H05K3/0082

    摘要： A method of generating a holographic diffraction pattern and a holographic lithography system are disclosed. The method involves defining at least one geometrical shape; generating at least one line segment to represent the at least one geometrical shape; calculating a line diffraction pattern on a hologram plane, including calculating the Fresnel diffraction equation for an impulse representing the at least one line segment with a line width control term and a line length control term; and adding vectorially, where there are two or more line segments, the line diffraction patterns to form the holographic diffraction pattern. The method and system enables holographic masks to be generated without creating a physical object to record. The required shapes or patterns are defined in terms of a three-dimensional coordinate space and a holographic pattern is generated at a defined distance from the shapes in the coordinate space.

    摘要翻译： 公开了一种产生全息衍射图案和全息光刻系统的方法。 该方法包括定义至少一个几何形状; 产生至少一个线段以表示所述至少一个几何形状; 计算全息图平面上的线衍射图案，包括用线宽控制项和线长度控制项计算代表所述至少一个线段的脉冲的菲涅尔衍射方程; 并且在其中存在两个或更多个线段的情况下，线衍射图案以形成全息衍射图案。 该方法和系统使得能够生成全息掩模而不产生要记录的物理对象。 根据三维坐标空间来定义所需的形状或图案，并且在与坐标空间中的形状限定的距离处产生全息图案。

    Hologram element
    6.
    发明授权
    Hologram element 有权
    全息元素

    公开(公告)号：US07160652B2

    公开(公告)日：2007-01-09

    申请号：US10716811

    申请日：2003-11-18

    申请人： Munesato Kumagai

    发明人： Munesato Kumagai

    IPC分类号： G01F9/00 ,  G03H1/04

    CPC分类号： G11B7/1353 ,  G02B5/32 ,  G03H1/02 ,  G03H2260/14

    摘要： Provided in a photomask for use in production of a hologram element having desired optical characteristics, a method for producing a hologram element, and a hologram element having desired optical characteristics. The first photomask is used for photolithography-based production of a hologram element having a hologram divided into two regions carrying a diffraction grating. The first photomask includes the first, second mask region having the non-light-transmitting mask portion and the light-transmitting portion, for forming the diffraction gratings of the regions of the hologram. The two mask regions differ in alignment-direction-wise arrangement interval for the light-transmitting portions and in ratio of the alignment-direction-wise width to the alignment-direction-wise arrangement interval for the light-transmitting portions.

    摘要翻译： 提供在用于生产具有期望的光学特性的全息元件的光掩模中，提供具有所需光学特性的全息元件的制造方法和全息元件。 第一光掩模用于基于光刻的全息元件的生产，该全息元件具有分为携带衍射光栅的两个区域的全息图。 第一光掩模包括具有非透光掩模部分和光透射部分的第一，第二掩模区域，用于形成全息图区域的衍射光栅。 两个掩模区域对于透光部分的取向方向布置间隔和对准方向宽度与光透射部分的取向方向布置间隔的比率不同。

    Interferometric lithography using reflected light from applied layers
    7.
    发明授权
    Interferometric lithography using reflected light from applied layers 失效
    使用来自应用层的反射光进行干涉光刻

    公开(公告)号：US06830850B1

    公开(公告)日：2004-12-14

    申请号：US09809901

    申请日：2001-03-16

    申请人： Zoran Krivokapic ,  Bhanwar Singh

    发明人： Zoran Krivokapic ,  Bhanwar Singh

    IPC分类号： G03H104

    CPC分类号： G03F7/70216 ,  G03F7/001 ,  G03F7/70408 ,  G03H1/0005 ,  G03H1/0248 ,  G03H2001/0094 ,  G03H2001/0417 ,  G03H2260/14

    摘要： An interferometric lithography method includes providing a first layer of material over a substrate and providing a second layer of material over the first layer of material. The method further includes providing a layer of photoresist over the first and second layers of material and providing coherent light to the first and second layers. The coherent light has an intensity insufficient to chemically transform the photoresist. The coherent light reflects off the first and layers to interfere with an intensity sufficient to chemically transform the photoresist.

    摘要翻译： 干涉光刻方法包括在衬底上提供第一层材料，并在第一层材料上提供第二层材料。 该方法还包括在第一和第二层材料上提供一层光致抗蚀剂，并向第一层和第二层提供相干光。 相干光具有不足以化学转化光致抗蚀剂的强度。 相干光从第一层和第二层反射，以干涉足以使光刻胶化学转化的强度。

    Method for producing width-modulated surface relief patterns
    9.
    发明授权
    Method for producing width-modulated surface relief patterns 失效
    产生宽度调制表面浮雕图案的方法

    公开(公告)号：US3945825A

    公开(公告)日：1976-03-23

    申请号：US472436

    申请日：1974-05-22

    申请人： Michael Thomas Gale ,  Arthur Herbert Firester

    发明人： Michael Thomas Gale ,  Arthur Herbert Firester

    IPC分类号： G03F7/00 ,  G03F7/26 ,  G03H1/02 ,  G03H1/04 ,  G03H1/18 ,  G03C5/04 ,  G02B3/00

    CPC分类号： G03H1/0406 ,  G03F7/001 ,  G03H1/0276 ,  G03H1/0244 ,  G03H2001/0292 ,  G03H2001/0296 ,  G03H2240/41 ,  G03H2260/14 ,  G03H2260/63 ,  G03H2270/11 ,  Y10S359/90

    摘要： Pulse width modulated surface relief phase holograms are produced on a substrate by developing a holographic interference pattern recorded on a photoresist deposited on the surface of said substrate as an amplitude modulated sinusoidal surface relief pattern so as to expose the surface of said substrate as a function of the intensity of said interference pattern, uniformly etching said substrate and removing said photoresist leaving a pulse width modulated, substantially two-level rectangular wave diffraction grating. Focused image holograms produced by this method on hard durable substrates may be used as masters for replicating said holograms in a suitable recording medium.

    摘要翻译： 脉冲宽度调制的表面起伏相位全息图是通过将记录在所述基片表面上的光刻胶上记录的全息干涉图案作为幅度调制的正弦曲面浮雕图案而形成在基板上，以便将基板的表面作为 所述干涉图案的强度，均匀蚀刻所述衬底并除去所述光致抗蚀剂，留下脉冲宽度调制的基本上两级的矩形波衍射光栅。 通过该方法在耐用耐用的基材上产生的聚焦图像全息图可以用作在合适的记录介质中复制所述全息图的主体。