中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

16 records (took 0.012 seconds)

    METHODS AND SYSTEMS FOR PRINTING ARRAYS OF FEATURES
    11.
    发明申请
    METHODS AND SYSTEMS FOR PRINTING ARRAYS OF FEATURES 审中-公开

    公开(公告)号：US20180364586A1

    公开(公告)日：2018-12-20

    申请号：US16061041

    申请日：2016-12-14

    Applicant: FRANCIS CLUBE ,  HARUN SOLAK

    Inventor： FRANCIS CLUBE ,  HARUN SOLAK

    IPC: G03F7/20

    CPC classification number: G03F7/70408 ,  G03F7/70091 ,  G03F7/7035

    Abstract: A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.

    System and method for production of nanostructures over large areas
    12.
    发明授权
    System and method for production of nanostructures over large areas 有权
    在大面积生产纳米结构的系统和方法

    公开(公告)号：US09182672B2

    公开(公告)日：2015-11-10

    申请号：US13997335

    申请日：2011-12-20

    Applicant: Harun Solak ,  Francis Clube

    Inventor： Harun Solak ,  Francis Clube

    IPC: G03F7/20

    CPC classification number: G03F7/201 ,  G03F7/70408

    Abstract: A method and an apparatus print a pattern of periodic features into a photosensitive layer. The methods includes the steps of: providing a substrate bearing the layer, providing a mask, arranging the substrate such that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto, and providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance so that the transmitted light-field has an intensity envelope in the first plane. The mask is illuminated with the light while displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate. The tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.

    Abstract translation: 一种方法和装置将周期特征的图案打印到感光层中。 所述方法包括以下步骤：提供承载该层的衬底，提供掩模，布置衬底，使得掩模在与其垂直的第一平面中相对于衬底具有倾斜角，并提供用于照亮掩模图案的准直光 以产生由Talbot距离分开的Talbot平面之间的横向强度分布范围组成的透射光场，使得透射的光场在第一平面中具有强度包络。 在平行于第一平面的方向和衬底上相对于掩模移动衬底的情况下，用光照亮面罩。 倾斜角度和强度包络被布置成使得该层暴露于横向强度分布范围的平均值。

    Optimized mask design for fabricating periodic and quasi-periodic patterns
    14.
    发明授权
    Optimized mask design for fabricating periodic and quasi-periodic patterns 有权
    用于制造周期性和准周期性图案的优化掩模设计

    公开(公告)号：US08617775B2

    公开(公告)日：2013-12-31

    申请号：US13509642

    申请日：2010-09-14

    Applicant: Harun Solak

    Inventor： Harun Solak

    IPC: G03F7/20 ,  G03F1/00 ,  G03F1/26

    CPC classification number: G03F1/70 ,  G03F1/26 ,  G03F1/36 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/70325 ,  G03F7/7035 ,  G03F7/70408

    Abstract: A method for printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer disposed on a substrate including the steps of designing a mask pattern having a periodic or quasi-periodic array of unit cells each having a ring feature, forming a mask with said mask pattern, arranging the mask substantially parallel to the photosensitive layer, arranging the distance of the photosensitive layer from the mask and illuminating the mask according to one of the methods of achromatic Talbot lithography and displacement Talbot lithography, whereby the illumination transmitted by the mask exposes the photosensitive layer to an integrated intensity distribution that prints the desired pattern.

    Abstract translation: 一种用于将点特征的期望的周期性或准周期性图案印刷到设置在基板上的感光层中的方法，包括以下步骤：设计具有每个具有环形特征的单位单元的周期性或准周期性阵列的掩模图案，形成 具有所述掩模图案的掩模，将掩模基本上平行于感光层布置，根据消色差的Talbot光刻和位移Talbot光刻的方法之一，将光敏层从掩模布置并照射掩模，由此照射通过 该掩模将感光层暴露于打印所需图案的积分强度分布。

    OPTIMIZED MASK DESIGN FOR FABRICATING PERIODIC AND QUASI-PERIODIC PATTERNS
    15.
    发明申请
    OPTIMIZED MASK DESIGN FOR FABRICATING PERIODIC AND QUASI-PERIODIC PATTERNS 有权
    用于制作周期性和周期性图案的优化面膜设计

    公开(公告)号：US20130095418A1

    公开(公告)日：2013-04-18

    申请号：US13509642

    申请日：2010-09-14

    Applicant: Harun Solak

    Inventor： Harun Solak

    IPC: G03F1/70 ,  G03F7/20

    CPC classification number: G03F1/70 ,  G03F1/26 ,  G03F1/36 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/70325 ,  G03F7/7035 ,  G03F7/70408

    Abstract: A method for printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer disposed on a substrate including the steps of designing a mask pattern having a periodic or quasi-periodic array of unit cells each having a ring feature, forming a mask with said mask pattern, arranging the mask substantially parallel to the photosensitive layer, arranging the distance of the photosensitive layer from the mask and illuminating the mask according to one of the methods of achromatic Talbot lithography and displacement Talbot lithography, whereby the illumination transmitted by the mask exposes the photosensitive layer to an integrated intensity distribution that prints the desired pattern.

    Abstract translation: 一种用于将点特征的期望的周期性或准周期性图案印刷到设置在基板上的感光层中的方法，包括以下步骤：设计具有每个具有环形特征的单位单元的周期性或准周期性阵列的掩模图案，形成 具有所述掩模图案的掩模，将掩模基本上平行于感光层布置，根据消色差的Talbot光刻和位移Talbot光刻的方法之一，将光敏层从掩模布置并照射掩模，由此照射通过 该掩模将感光层暴露于打印所需图案的积分强度分布。

Patent Agency Ranking