公开(公告)号：US07858268B2

公开(公告)日：2010-12-28

申请号：US10540754

申请日：2005-06-24

Applicant: Christian David ,  Harun Solak

Inventor： Christian David ,  Harun Solak

IPC: G03F1/00 ,  G03C5/00 ,  G02B5/18

CPC classification number: G03F7/70283 ,  G03F7/70341 ,  G03F7/7035 ,  G03F7/70408 ,  G03F7/70466

Abstract: The present invention is directed to a method for the generation of periodic curved structures in a basic support material such as the basic layer for the magnetic bit cells of a magnetic storage device. The method includes the steps of generating a number of diffraction masks such that each mask comprises at least one transmission diffraction gratings having at least one of a different periodic concentric circular pattern, spiral-like periodic pattern and periodic radial spoke pattern; positioning at least one of the diffraction masks simultaneously or successively in a certain distance of the basic support material to be patterned, the distance being mask dependent; exposing the basic support material by directing light beams through each of the diffraction masks; and interfering the different light beams diffracted by the gratings on each mask in order to generate coincident light intensity patterns on the surface of the basic support material.

Abstract translation: 本发明涉及一种用于在诸如用于磁存储装置的磁头单元的基础层的基本支撑材料中产生周期性弯曲结构的方法。 该方法包括以下步骤：产生多个衍射掩模，使得每个掩模包括至少一个透射衍射光栅，其具有不同的周期性同心圆形图案，螺旋状周期性图案和周期性径向辐条图案中的至少一个; 将至少一个衍射掩模同时或连续地定位在待图案化的基础支撑材料的一定距离内，该距离取决于掩模; 通过将光束引导通过每个衍射掩模来暴露基本支撑材料; 并且在每个掩模上干扰由光栅衍射的不同光束，以便在基本支撑材料的表面上产生一致的光强度图案。

公开(公告)号：US20060098566A1

公开(公告)日：2006-05-11

申请号：US10540754

申请日：2003-09-15

Applicant: Christian David ,  Harun Solak

Inventor： Christian David ,  Harun Solak

IPC: G11B3/70

CPC classification number: G03F7/70283 ,  G03F7/70341 ,  G03F7/7035 ,  G03F7/70408 ,  G03F7/70466

Abstract: The present invention is directed to a method for the generation of periodic curved structures in a basic support material such as the basic layer for the magnetic bit cells of a magnetic storage device. The method includes the steps of generating a number of diffraction masks such that each mask comprises at least one transmission diffraction gratings having at least one of a different periodic concentric circular pattern, spiral-like periodic pattern and periodic radial spoke pattern; positioning at least one of the diffraction masks simultaneously or successively in a certain distance of the basic support material to be patterned, the distance being mask dependent; exposing the basic support material by directing light beams through each of the diffraction masks; and interfering the different light beams diffracted by the gratings on each mask in order to generate coincident light intensity patterns on the surface of the basic support material.

Abstract translation: 本发明涉及一种用于在诸如用于磁存储装置的磁头单元的基础层的基本支撑材料中产生周期性弯曲结构的方法。 该方法包括以下步骤：产生多个衍射掩模，使得每个掩模包括至少一个透射衍射光栅，其具有不同的周期性同心圆形图案，螺旋状周期性图案和周期性径向辐条图案中的至少一个; 将至少一个衍射掩模同时或连续地定位在待图案化的基础支撑材料的一定距离内，该距离取决于掩模; 通过将光束引导通过每个衍射掩模来暴露基本支撑材料; 并且在每个掩模上干扰由光栅衍射的不同光束，以便在基本支撑材料的表面上产生一致的光强度图案。

公开(公告)号：US10365566B2

公开(公告)日：2019-07-30

申请号：US16061041

申请日：2016-12-14

Applicant: Francis Clube ,  Harun Solak

Inventor： Francis Clube ,  Harun Solak

IPC: G03F7/20

Abstract: A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.

公开(公告)号：US09280056B2

公开(公告)日：2016-03-08

申请号：US13979489

申请日：2012-01-10

Applicant: Francis Clube ,  Harun Solak

Inventor： Francis Clube ,  Harun Solak

IPC: G03F7/20

CPC classification number: G03F7/70091 ,  G03F7/7035 ,  G03F7/70408

Abstract: A method for printing a desired periodic pattern includes providing a mask bearing a pattern of features having a period, providing a substrate bearing a photosensitive layer, arranging the substrate with a separation from the mask, generating collimated light with a wavelength and an intensity, at least the former of which may be temporally varied to deliver a spectral distribution of energy density, illuminating the mask pattern with the light while varying at least its wavelength so as to deliver a spectral distribution of energy density, such that the light-field transmitted by the mask is instantaneously composed of a range of transversal intensity distributions between Talbot planes. The layer is exposed to a time-integrated intensity distribution that prints the desired pattern. The separation, spectral distribution and period are arranged so that the time-integrated intensity distribution corresponds to an average of the range of transversal intensity distributions.

Abstract translation: 一种用于印刷期望的周期性图案的方法包括提供一种带有具有周期的特征图案的掩模，提供带有感光层的基底，将衬底与掩模分离，产生具有波长和强度的准直光， 其中最前者可以在时间上变化以提供能量密度的光谱分布，用光照亮掩模图案，同时至少改变其波长，以便传递能量密度的光谱分布，使得光场通过 面具瞬间由Talbot平面之间的一系列横向强度分布组成。 该层暴露于打印所需图案的时间积分强度分布。 布置分离，光谱分布和周期，使得时间积分强度分布对应于横向强度分布范围的平均值。

公开(公告)号：US20140307242A1

公开(公告)日：2014-10-16

申请号：US14123330

申请日：2012-06-01

Applicant: Harun Solak ,  Francis Clube ,  Christian Dais

Inventor： Harun Solak ,  Francis Clube ,  Christian Dais

IPC: G03F7/20

CPC classification number: G03F7/70075 ,  G03F7/70408

Abstract: A method for printing a periodic pattern of features into a photosensitive layer includes providing a mask bearing a mask pattern, providing a substrate bearing the layer, arranging the substrate parallel to the mask, providing a number of lasers having a plurality of peak wavelengths, forming from the light a beam for illuminating the mask with a spectral distribution of exposure dose and a degree of collimation, illuminating the mask with the beam such that the light of each wavelength transmitted by the mask pattern forms a range of transversal intensity distributions between Talbot planes and exposes the photosensitive layer to an image component. The separation and the spectral distribution are arranged so that the superposition of the components is equivalent to an average of the range of transversal intensity distributions formed by light of one wavelength and the collimation is arranged so that the features are resolved.

Abstract translation: 将特征的周期性图案印刷到感光层中的方法包括提供带有掩模图案的掩模，提供承载该层的基板，将该基板平行于掩模布置，提供多个具有多个峰值波长的激光器，形成 从光照射具有照射剂量的光谱分布和准直程度的光束，用光束照射掩模，使得由掩模图案传输的每个波长的光形成Talbot平面之间的横向强度分布范围 并将感光层暴露于图像分量。 分离和光谱分布被布置成使得部件的叠加等价于由一个波长的光形成的横向强度分布的平均值，并且准直被设置为使得特征被解决。

公开(公告)号：US20130308112A1

公开(公告)日：2013-11-21

申请号：US13979489

申请日：2012-01-10

Applicant: Francis Clube ,  Harun Solak

Inventor： Francis Clube ,  Harun Solak

IPC: G03F7/20

CPC classification number: G03F7/70091 ,  G03F7/7035 ,  G03F7/70408

Abstract: A method for printing a desired periodic pattern includes providing a mask bearing a pattern of features having a period, providing a substrate bearing a photosensitive layer, arranging the substrate with a separation from the mask, generating collimated light with a wavelength and an intensity, at least the former of which may be temporally varied to deliver a spectral distribution of energy density, illuminating the mask pattern with the light while varying at least its wavelength so as to deliver a spectral distribution of energy density, such that the light-field transmitted by the mask is instantaneously composed of a range of transversal intensity distributions between Talbot planes. The layer is exposed to a time-integrated intensity distribution that prints the desired pattern. The separation, spectral distribution and period are arranged so that the time-integrated intensity distribution corresponds to an average of the range of transversal intensity distributions.

Abstract translation: 一种用于印刷期望的周期性图案的方法包括提供一种带有具有周期的特征图案的掩模，提供带有感光层的基底，将衬底与掩模分离，产生具有波长和强度的准直光， 其中最前者可以在时间上变化以提供能量密度的光谱分布，用光照亮掩模图案，同时至少改变其波长，以便传递能量密度的光谱分布，使得光场通过 面具瞬间由Talbot平面之间的一系列横向强度分布组成。 该层暴露于打印所需图案的时间积分强度分布。 布置分离，光谱分布和周期，使得时间积分强度分布对应于横向强度分布范围的平均值。

公开(公告)号：US06631648B2

公开(公告)日：2003-10-14

申请号：US09941149

申请日：2001-08-28

Applicant: Amit Lal ,  Harun Solak ,  Shankar Radhakrishnan

Inventor： Amit Lal ,  Harun Solak ,  Shankar Radhakrishnan

IPC: G01F128

CPC classification number: G01F1/28 ,  B33Y80/00

Abstract: Sensing of microfluidic flow is carried out by confining and directing a fluid along a surface in a primary direction of flow past a cantilever beam which is mounted at one end of the beam to the surface. The cantilever beam has opposite beam surfaces that are oriented at an angle off parallel to the primary direction of flow of the fluid. As the fluid is directed past the beam at a rate such that the drag forces imposed by the fluid on the opposite surfaces of the beam are greater than the inertial forces of the fluid on the beam, a differential force is applied to the beam that tends to pivot the beam about its mount to the surface or bend the beam or both. The deflection of the beam in response to the differential drag forces may be detected to determine the rate of flow of the fluid.

Abstract translation: 微流体流动的感测通过将流体沿流动的主要方向沿着表面限制并引导通过安装在梁的一端处的表面的悬臂梁。 悬臂梁具有相反的梁表面，其以与流体的主要流动方向平行的角度定向。 当流体以一定的速率被引导通过光束时，流体在光束的相对表面上施加的阻力大于流体在光束上的惯性力，则微分力被施加到倾斜的光束 将梁绕其安装件枢转到表面或弯曲梁或两者。 可以检测响应于差分牵引力的梁的偏转以确定流体的流速。

公开(公告)号：US20220155691A1

公开(公告)日：2022-05-19

申请号：US17598409

申请日：2020-03-27

Applicant: Francis Clube ,  Andreas Amrein ,  Maxime Lebugle ,  Harun Solak ,  Li Wang

Inventor： Francis Clube ,  Andreas Amrein ,  Maxime Lebugle ,  Harun Solak ,  Li Wang

IPC: G03F7/20 ,  G03F1/70 ,  G02B5/18

Abstract: A method for forming a surface-relief grating with a desired spatial variation of duty cycle in a layer of photoresist includes: providing a first mask bearing a high-resolution grating of linear features, arranging the first mask at a first distance from a substrate, providing a second mask bearing a variable-transmission grating of opaque and transparent linear features that has a designed spatial variation of duty cycle, arranging the second mask at a distance before the first mask such that the linear features of the variable-transmission grating are orthogonal to the linear features of the high-resolution grating, illuminating the second mask while varying the first distance according to displacement Talbot lithography and also displacing the second mask at an angle to its linear features such that there is substantially no component of modulation with the period of the variable-transmission grating in the energy density distribution that exposes the photoresist.

公开(公告)号：US20130323651A1

公开(公告)日：2013-12-05

申请号：US13997335

申请日：2011-12-20

Applicant: Harun Solak ,  Francis Clube

Inventor： Harun Solak ,  Francis Clube

IPC: G03F7/20

CPC classification number: G03F7/201 ,  G03F7/70408

Abstract: A method and an apparatus print a pattern of periodic features into a photosensitive layer. The methods includes the steps of: providing a substrate bearing the layer, providing a mask, arranging the substrate such that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto, and providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance so that the transmitted light-field has an intensity envelope in the first plane. The mask is illuminated with the light while displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate. The tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.

Abstract translation: 一种方法和装置将周期特征的图案打印到感光层中。 所述方法包括以下步骤：提供承载该层的衬底，提供掩模，布置衬底，使得掩模在与其垂直的第一平面中相对于衬底具有倾斜角，并提供用于照亮掩模图案的准直光 以产生由Talbot距离分开的Talbot平面之间的横向强度分布范围组成的透射光场，使得透射的光场在第一平面中具有强度包络。 在平行于第一平面的方向和衬底上相对于掩模移动衬底的情况下，用光照亮面罩。 倾斜角度和强度包络被布置成使得该层暴露于横向强度分布范围的平均值。

公开(公告)号：US20060234062A1

公开(公告)日：2006-10-19

申请号：US10563112

申请日：2004-06-12

Applicant: Hans-Peter Brack ,  Celestino Padeste ,  Michal Slaski ,  Harun Solak

Inventor： Hans-Peter Brack ,  Celestino Padeste ,  Michal Slaski ,  Harun Solak

IPC: B05D3/00 ,  G11B5/64 ,  C23C16/00 ,  B32B27/00 ,  B32B27/30

CPC classification number: C08J7/18 ,  Y10T428/24355 ,  Y10T428/3154 ,  Y10T428/31544 ,  Y10T428/31855 ,  Y10T428/31935 ,  Y10T428/31938

Abstract: According to the present invention a method for grafting a chemical compound to a predetermined region of a support substrate (4) is disclosed, comprising: a) irradiating selectively the support substrate with electromagnetic radiation and/or particle radiation in order to both define said predetermined region and to form at least one reactive functional group or a precursor thereof in said predetermined region of the support substrate; b) exposing the irradiated support substrate to said chemical compound or to a precursor thereof. Therefore, only these very few steps are needed to effectively grafting the desired chemical compound, such as an organic compound, to the predetermined regions of the support substrate. Moreover, the irradiation step can be carried out in a vastly flexible manner and allows to generate numerous distinct shapes of the predetermined regions. Further, micro- or nano-scale regions in the support substrate capable of forming reactive functional groups or precursors thereof upon exposure to particle or electromagnetic irradiation can be easily achieved.

Abstract translation: 根据本发明，公开了一种用于将化学化合物接枝到支撑衬底（4）的预定区域的方法，包括：a）用电磁辐射和/或粒子辐射选择性地照射支撑衬底，以便将所述预定的 并且在所述支撑衬底的所述预定区域中形成至少一个反应性官能团或其前体; b）将照射的支撑基底暴露于所述化合物或其前体。 因此，为了有效地将期望的化合物（例如有机化合物）接枝到支撑基底的预定区域，仅需要这几个步骤。 此外，照射步骤可以以非常灵活的方式进行，并且允许产生许多不同形状的预定区域。 此外，可以容易地实现能够在暴露于粒子或电磁辐射时能够形成反应性官能团或其前体的支持基底中的微尺度或纳米级区域。