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    Method for manufacturing CMOS image sensor having microlens therein with high photosensitivity
    11.
    发明授权
    Method for manufacturing CMOS image sensor having microlens therein with high photosensitivity 有权
    用于制造具有高光敏性的具有微透镜的CMOS图像传感器的方法

    公开(公告)号：US07670867B2

    公开(公告)日：2010-03-02

    申请号：US11242817

    申请日：2005-10-03

    申请人： Chang-Young Jeong ,  Dae-Ung Shin ,  Hong-Ik Kim

    发明人： Chang-Young Jeong ,  Dae-Ung Shin ,  Hong-Ik Kim

    IPC分类号： H01L21/00

    CPC分类号： H01L27/14627 ,  H01L27/14621 ,  H01L27/14643 ,  H01L27/14685

    摘要： The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.

    摘要翻译： 采用CMOS图像传感器的制造方法，通过在微透镜之间采用开口来防止相邻微透镜之间的桥接现象。 该方法包括以下步骤：制备其中通过预定工艺获得的包括隔离区和其中的光电二极管的半导体衬底; 依次形成在半导体衬底上的层间电介质（ILD），金属互连和钝化层; 在所述钝化层上形成具有多个滤色器的滤色器阵列; 通过使用正性光致抗蚀剂或负型光致抗蚀剂在滤色器阵列上形成覆盖层（OCL）; 通过使用预定的掩模图案化OCL来在OCL中形成开口; 并在图案化的OCL上形成圆顶型微透镜。

    DISPLAY FILTER HAVING TOUCH INPUT FUNCTION
    13.
    发明申请
    DISPLAY FILTER HAVING TOUCH INPUT FUNCTION 审中-公开
    具有触摸输入功能的显示屏过滤器

    公开(公告)号：US20110102347A1

    公开(公告)日：2011-05-05

    申请号：US12915775

    申请日：2010-10-29

    申请人： Jin Sung LIM ,  Dae Chul Park ,  Hong Ik Kim ,  Shin Wook Kim ,  Ho Woo Kim

    发明人： Jin Sung LIM ,  Dae Chul Park ,  Hong Ik Kim ,  Shin Wook Kim ,  Ho Woo Kim

    IPC分类号： G06F3/041

    CPC分类号： G06F3/045

    摘要： A display filter having a touch input function includes a base substrate, a conductive film coating layer formed on the base substrate, and a touch sheet. The touch sheet and the conductive film coating layer are arranged with an air gap therebetween, and are in contact with each other in response to a touch pressure. A first electrode is formed on a surface of the touch sheet that faces the conductive film coating layer. The first electrode includes a first electrode part to which a first input voltage is applied to generate potential distribution in the x direction, and a second electrode part to which a second input voltage is applied to generate potential distribution in the y direction. A second electrode is formed on the periphery of the conductive film coating layer, and allows electrical current to flow through when the touch sheet is in contact with the conductive film coating layer.

    摘要翻译： 具有触摸输入功能的显示滤光器包括基底，形成在基底基板上的导电膜涂层和触摸片。 触摸片和导电膜涂层在它们之间设置有气隙，并且响应于触摸压力彼此接触。 第一电极形成在面对导电膜涂层的触摸板的表面上。 第一电极包括施加第一输入电压以在x方向上产生电位分布的第一电极部分和施加第二输入电压以在y方向上产生电位分布的第二电极部分。 第二电极形成在导电膜涂层的周围，并且当触摸片与导电膜涂层接触时允许电流流过。

    DISPLAY FILTER AND PROTECTIVE CASE HAVING GRADATION
    14.
    发明申请
    DISPLAY FILTER AND PROTECTIVE CASE HAVING GRADATION 审中-公开
    显示过滤器和防护等级

    公开(公告)号：US20110007398A1

    公开(公告)日：2011-01-13

    申请号：US12833277

    申请日：2010-07-09

    申请人： Jin Sung Lim ,  Dae Chul Park ,  Ji Yoon Seo ,  Kun Yong Jang ,  Hong Ik Kim

    发明人： Jin Sung Lim ,  Dae Chul Park ,  Ji Yoon Seo ,  Kun Yong Jang ,  Hong Ik Kim

    IPC分类号： G02B5/22

    CPC分类号： G02B5/003 ,  H01J11/10 ,  H01J11/44 ,  H01J2211/444 ,  H05K9/0054

    摘要： A display filter having a gradation, in use for a display device has a display module therein. The display filter includes a base substrate; and a light blocking section having a light blocking material formed on a periphery area of the base substrate to define an effective image-displaying area of the base substrate. The light blocking material blocks light, and at least a portion of the light blocking section becomes gradually darker in a predetermined direction.

    摘要翻译： 具有用于显示装置的灰度的显示滤光器在其中具有显示模块。 显示滤光器包括基底; 以及遮光部，其具有形成在所述基底基板的周边区域上的遮光材料，以限定所述基底基板的有效图像显示区域。 遮光材料阻挡光，并且遮光部的至少一部分在预定方向上逐渐变暗。

    Novel Acid Tolerant Lactobacillus Sakei Probio-65 with the Ability of Growth Suppression of Pathogenic Microorganisms and the Anti-Allergic Effect
    15.
    发明申请
    Novel Acid Tolerant Lactobacillus Sakei Probio-65 with the Ability of Growth Suppression of Pathogenic Microorganisms and the Anti-Allergic Effect 有权
    新型耐酸性乳酸菌Sakei Probio-65具有生长抑制病原微生物能力和抗过敏作用

    公开(公告)号：US20090214497A1

    公开(公告)日：2009-08-27

    申请号：US11883398

    申请日：2006-01-27

    申请人： Yong Ha Park ,  In-seon Lee ,  Hong-ik Kim ,  Kook-hee Kang

    发明人： Yong Ha Park ,  In-seon Lee ,  Hong-ik Kim ,  Kook-hee Kang

    IPC分类号： A61K35/74 ,  C12N1/20 ,  A61K8/99

    CPC分类号： C12R1/225 ,  A23K10/18 ,  A23L33/135 ,  A61K8/99 ,  A61K35/747 ,  A61Q17/005 ,  A61Q19/00

    摘要： Disclosed are a novel tactic acid bacterium, Lactobacillus sakei Probio-65, and the use thereof. The L. sakei Probio-65 strain has acid tolerance, bile acid tolerance and antibiotic resistance, inhibits the growth of harmful pathogenic microorganisms in the body and the intestine of animals, and has immunuenhancing activity. In particular, the novel strain inhibits the growth of Staphylocccus aureus, which is known to be a factor aggravating atopic dermatitis. Thus, the novel strain is useful for preventing or treating atopic dermatitis and allergy-related disorders. Also, the novel strain stabilizes intestinal microflors by inhibiting the abnormal proliferation of harmful microorganisms in the intestine. The L. sakei Probio-65 strain or a culture thereof is useful in pharmaceutical, feed, food, and cosmetic compositions.

    摘要翻译： 公开了一种新型的乳酸菌，益气乳杆菌Probio-65及其用途。 李氏酵母Probio-65菌株具有耐酸性，胆汁酸耐受性和抗生素抗性，抑制动物身体和肠道中有害致病微生物的生长，并具有免疫增强活性。 特别地，新菌株抑制金黄色葡萄球菌的生长，其已知是加重特应性皮炎的因素。 因此，新型菌株可用于预防或治疗特应性皮炎和过敏相关疾病。 此外，新菌株通过抑制肠中有害微生物的异常增殖来稳定肠道微生物群落。 莱氏酵母Probio-65菌株或其培养物可用于药物，饲料，食品和化妆品组合物中。

    Method for manufacturing CMOS image sensor having microlens therein with high photosensitivity
    16.
    发明申请
    Method for manufacturing CMOS image sensor having microlens therein with high photosensitivity 有权
    用于制造具有高光敏性的具有微透镜的CMOS图像传感器的方法

    公开(公告)号：US20060019426A1

    公开(公告)日：2006-01-26

    申请号：US11242817

    申请日：2005-10-03

    申请人： Chang-Young Jeong ,  Dae-Ung Shin ,  Hong-Ik Kim

    发明人： Chang-Young Jeong ,  Dae-Ung Shin ,  Hong-Ik Kim

    IPC分类号： H01L21/00

    CPC分类号： H01L27/14627 ,  H01L27/14621 ,  H01L27/14643 ,  H01L27/14685

    摘要： The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.

    摘要翻译： 采用CMOS图像传感器的制造方法，通过在微透镜之间采用开口来防止相邻微透镜之间的桥接现象。 该方法包括以下步骤：制备其中通过预定工艺获得的包括隔离区和其中的光电二极管的半导体衬底; 依次形成在半导体衬底上的层间电介质（ILD），金属互连和钝化层; 在所述钝化层上形成具有多个滤色器的滤色器阵列; 通过使用正性光致抗蚀剂或负型光致抗蚀剂在滤色器阵列上形成覆盖层（OCL）; 通过使用预定的掩模图案化OCL来在OCL中形成开口; 并在图案化的OCL上形成圆顶型微透镜。