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    OPTICAL FILTER FOR DISPLAY DEVICE
    2.
    发明申请
    OPTICAL FILTER FOR DISPLAY DEVICE 审中-公开
    用于显示设备的光学滤波器

    公开(公告)号：US20100328763A1

    公开(公告)日：2010-12-30

    申请号：US12822620

    申请日：2010-06-24

    申请人： Ji Yoon Seo ,  Jin Sung Lim ,  Hong Ik Kim ,  Dae Chul Park

    发明人： Ji Yoon Seo ,  Jin Sung Lim ,  Hong Ik Kim ,  Dae Chul Park

    IPC分类号： F21V9/04

    CPC分类号： G02B5/20 ,  H01J11/10 ,  H01J11/44 ,  H01J2211/444 ,  H01J2211/446

    摘要： An optical filter for a display device can be provided with excellent fracture strength without using heat-treated tempered glass. The optical filter is used in the display device having a display module therein and is disposed in front of the display module. The optical filter includes an annealed glass substrate, an optical film laminated on the surface of one side of the annealed glass substrate, and a protective layer formed on the surface of the other side of the annealed glass substrate. The protective layer serves to prevent a substance from being eluted from inside the annealed glass substrate.

    摘要翻译： 在不使用热处理钢化玻璃的情况下，用于显示装置的滤光器可以提供优异的断裂强度。 在其中具有显示模块的显示装置中使用滤光器并且设置在显示模块的前面。 光学滤波器包括退火玻璃基板，层压在退火玻璃基板的一侧的表面上的光学膜以及形成在退火玻璃基板的另一侧的表面上的保护层。 保护层用于防止物质从退火玻璃基板内部洗脱。

    OPTICAL FILTER AND DISPLAY DEVICE HAVING THE SAME
    3.
    发明申请
    OPTICAL FILTER AND DISPLAY DEVICE HAVING THE SAME 审中-公开
    具有该光学滤波器和显示装置的光学滤波器

    公开(公告)号：US20090201587A1

    公开(公告)日：2009-08-13

    申请号：US12368560

    申请日：2009-02-10

    申请人： Hong Ik Kim ,  Dong Keun Shin ,  Dong Hyun Park ,  Dae Chul Park ,  Shin Wook Kim

    发明人： Hong Ik Kim ,  Dong Keun Shin ,  Dong Hyun Park ,  Dae Chul Park ,  Shin Wook Kim

    IPC分类号： G02B1/11

    CPC分类号： G02B5/22 ,  G02B5/005

    摘要： An optical filter for a display device placed in front of a display panel 1000 of the display device includes a first layer 310 which is formed at a first area A1 and has a first light blocking ratio. The amount of light transmitted through the first area A1 is smaller than the amount of light transmitted through an adjacent area to the first area A1 such that the first area A1 becomes distinguished to form a dark mark or the adjacent area becomes distinguished to form a bright mark. The optical filter further includes a second layer 320 which is formed at a second area A2 and has a second light blocking ratio lower than the first light blocking ratio. The amount of light transmitted through the first area A1 is smaller than the amount of light transmitted through the second area A2 such that the first area A1 becomes distinguished to form the dark mark or the second area becomes distinguished to form a bright mark. The second layer 320 can be a coating layer which is printed with a material with the second light blocking ratio or a film containing a material with the second light blocking ratio. The second light blocking ratio can be 70˜99%. The first layer 310 can be a coating layer of a black ceramic material or a film containing a black ceramic material. A display device includes the display panel 1000 displaying an image; and the optical filter.

    摘要翻译： 放置在显示装置的显示面板1000的前面的显示装置的滤光器包括形成在第一区域A1处并具有第一遮光率的第一层310。 通过第一区域A1透射的光量比通过与第一区域A1相邻的区域透射的光量小，使得第一区域A1被区分为形成暗标记，或者相邻区域变得明亮 标记。 滤光器还包括第二层320，其形成在第二区域A2处，并且具有低于第一遮光率的第二遮光率。 通过第一区域A1透射的光量比通过第二区域A2透射的光量小，使得第一区域A1被区分以形成黑色标记，或者第二区域被区分以形成亮点。 第二层320可以是用第二遮光率的材料印刷的涂层或含有第二遮光率的材料的膜。 第二个遮光率可以是70〜99％。 第一层310可以是黑色陶瓷材料的涂层或含有黑色陶瓷材料的膜。 显示装置包括显示图像的显示面板1000; 和滤光片。

    Method for manufacturing CMOS image sensor
    4.
    发明授权
    Method for manufacturing CMOS image sensor 有权
    CMOS图像传感器的制造方法

    公开(公告)号：US07163832B2

    公开(公告)日：2007-01-16

    申请号：US10983990

    申请日：2004-11-08

    申请人： Hong-Ik Kim

    发明人： Hong-Ik Kim

    IPC分类号： H01L21/00

    CPC分类号： H01L27/14685

    摘要： The present invention discloses a method for manufacturing an image sensor which makes the boundaries between microlenses clear by forming a guide layer in advance and can increase the focal distance of light and the quantity of light by forming the spheres of the microlenses to have a constant height.

    摘要翻译： 本发明公开了一种用于制造图像传感器的方法，其通过预先形成引导层使微透镜之间的边界清晰，并且可以通过将微透镜的球体形成为具有恒定高度来增加光的焦距和光量 。

    Method for manufacturing CMOS image sensor having microlens therein with high photosensitivity
    5.
    发明授权
    Method for manufacturing CMOS image sensor having microlens therein with high photosensitivity 有权
    用于制造具有高光敏性的具有微透镜的CMOS图像传感器的方法

    公开(公告)号：US06979588B2

    公开(公告)日：2005-12-27

    申请号：US10737227

    申请日：2003-12-16

    申请人： Chang-Young Jeong ,  Dae-Ung Shin ,  Hong-Ik Kim

    发明人： Chang-Young Jeong ,  Dae-Ung Shin ,  Hong-Ik Kim

    IPC分类号： G02B3/00 ,  H01L21/00 ,  H01L27/00 ,  H01L27/14 ,  H01L27/146 ,  H01L31/062 ,  H04N5/335 ,  H04N5/369 ,  H04N5/374

    CPC分类号： H01L27/14627 ,  H01L27/14621 ,  H01L27/14643 ,  H01L27/14685

    摘要： The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.

    摘要翻译： 采用CMOS图像传感器的制造方法，通过在微透镜之间采用开口来防止相邻微透镜之间的桥接现象。 该方法包括以下步骤：制备其中通过预定工艺获得的包括隔离区和其中的光电二极管的半导体衬底; 依次形成在半导体衬底上的层间电介质（ILD），金属互连和钝化层; 在所述钝化层上形成具有多个滤色器的滤色器阵列; 通过使用正性光致抗蚀剂或负型光致抗蚀剂在滤色器阵列上形成覆盖层（OCL）; 通过使用预定的掩模图案化OCL来在OCL中形成开口; 并在图案化的OCL上形成圆顶型微透镜。

    Acid tolerant Lactobacillus sakei probio-65 with the ability of growth suppression of pathogenic microorganisms and the anti-allergic effect
    6.
    发明授权
    Acid tolerant Lactobacillus sakei probio-65 with the ability of growth suppression of pathogenic microorganisms and the anti-allergic effect 有权
    耐酸性乳酸杆菌probi-65具有生长抑制病原微生物的能力和抗过敏作用

    公开(公告)号：US08034606B2

    公开(公告)日：2011-10-11

    申请号：US11883398

    申请日：2006-01-27

    申请人： Yong Ha Park ,  In-seon Lee ,  Hong-ik Kim ,  Kook-hee Kang

    发明人： Yong Ha Park ,  In-seon Lee ,  Hong-ik Kim ,  Kook-hee Kang

    IPC分类号： C12N1/20

    CPC分类号： C12R1/225 ,  A23K10/18 ,  A23L33/135 ,  A61K8/99 ,  A61K35/747 ,  A61Q17/005 ,  A61Q19/00

    摘要： Disclosed are a novel tactic acid bacterium, Lactobacillus sakei Probio-65, and the use thereof. The L. sakei Probio-65 strain has acid tolerance, bile acid tolerance and antibiotic resistance, inhibits the growth of harmful pathogenic microorganisms in the body and the intestine of animals, and has immunuenhancing activity. In particular, the novel strain inhibits the growth of Staphylocccus aureus, which is known to be a factor aggravating atopic dermatitis. Thus, the novel strain is useful for preventing or treating atopic dermatitis and allergy-related disorders. Also, the novel strain stabilizes intestinal microflors by inhibiting the abnormal proliferation of harmful microorganisms in the intestine. The L. sakei Probio-65 strain or a culture thereof is useful in pharmaceutical, feed, food, and cosmetic compositions.

    摘要翻译： 公开了一种新型的乳酸菌，益气乳杆菌Probio-65及其用途。 李氏酵母Probio-65菌株具有耐酸性，胆汁酸耐受性和抗生素抗性，抑制动物身体和肠道中有害致病微生物的生长，并具有免疫增强活性。 特别地，新菌株抑制金黄色葡萄球菌的生长，其已知是加重特应性皮炎的因素。 因此，新型菌株可用于预防或治疗特应性皮炎和过敏相关疾病。 此外，新菌株通过抑制肠中有害微生物的异常增殖来稳定肠道微生物群落。 莱氏酵母Probio-65菌株或其培养物可用于药物，饲料，食品和化妆品组合物中。

    Image sensor having microlenses and high photosensitivity
    7.
    发明授权
    Image sensor having microlenses and high photosensitivity 有权
    具有微透镜和高感光度的图像传感器

    公开(公告)号：US07932546B2

    公开(公告)日：2011-04-26

    申请号：US12606595

    申请日：2009-10-27

    申请人： Chang-Young Jeong ,  Dai-Ung Shin ,  Hong-Ik Kim

    发明人： Chang-Young Jeong ,  Dai-Ung Shin ,  Hong-Ik Kim

    IPC分类号： H01L29/66

    CPC分类号： H01L27/14627 ,  H01L27/14621 ,  H01L27/14643 ,  H01L27/14685

    摘要： The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.

    摘要翻译： 采用CMOS图像传感器的制造方法，通过在微透镜之间采用开口来防止相邻微透镜之间的桥接现象。 该方法包括以下步骤：制备其中通过预定工艺获得的包括隔离区和其中的光电二极管的半导体衬底; 依次形成在半导体衬底上的层间电介质（ILD），金属互连和钝化层; 在所述钝化层上形成具有多个滤色器的滤色器阵列; 通过使用正性光致抗蚀剂或负型光致抗蚀剂在滤色器阵列上形成覆盖层（OCL）; 通过使用预定的掩模图案化OCL来在OCL中形成开口; 并在图案化的OCL上形成圆顶型微透镜。

    Method for Manufacturing CMOS Image Sensor Having Microlens Therein with High Photosensitivity
    8.
    发明申请
    Method for Manufacturing CMOS Image Sensor Having Microlens Therein with High Photosensitivity 有权
    制造具有高光敏度的微透镜的CMOS图像传感器的方法

    公开(公告)号：US20100044819A1

    公开(公告)日：2010-02-25

    申请号：US12606595

    申请日：2009-10-27

    申请人： Chang-Young Jeong ,  Dai-Ung Shin ,  Hong-Ik Kim

    发明人： Chang-Young Jeong ,  Dai-Ung Shin ,  Hong-Ik Kim

    IPC分类号： H01L31/0232

    CPC分类号： H01L27/14627 ,  H01L27/14621 ,  H01L27/14643 ,  H01L27/14685

    摘要： The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.

    摘要翻译： 采用CMOS图像传感器的制造方法，通过在微透镜之间采用开口来防止相邻微透镜之间的桥接现象。 该方法包括以下步骤：制备其中通过预定工艺获得的包括隔离区和其中的光电二极管的半导体衬底; 依次形成在半导体衬底上的层间电介质（ILD），金属互连和钝化层; 在所述钝化层上形成具有多个滤色器的滤色器阵列; 通过使用正性光致抗蚀剂或负型光致抗蚀剂在滤色器阵列上形成覆盖层（OCL）; 通过使用预定的掩模图案化OCL来在OCL中形成开口; 并在图案化的OCL上形成圆顶型微透镜。

    Method for manufacturing CMOS image sensor
    9.
    发明申请
    Method for manufacturing CMOS image sensor 有权
    CMOS图像传感器的制造方法

    公开(公告)号：US20050101049A1

    公开(公告)日：2005-05-12

    申请号：US10983990

    申请日：2004-11-08

    申请人： Hong-ik Kim

    发明人： Hong-ik Kim

    IPC分类号： H01L27/146 ,  H01L21/00

    CPC分类号： H01L27/14685

    摘要： The present invention discloses a method for manufacturing an image sensor which makes the boundaries between microlenses clear by forming a guide layer in advance and can increase the focal distance of light and the quantity of light by forming the spheres of the microlenses to have a constant height.

    摘要翻译： 本发明公开了一种用于制造图像传感器的方法，其通过预先形成引导层使微透镜之间的边界清晰，并且可以通过将微透镜的球体形成为具有恒定高度来增加光的焦距和光量 。