Method and related system for semiconductor equipment early warning management
    11.
    发明授权
    Method and related system for semiconductor equipment early warning management 失效
    半导体设备预警管理方法及相关系统

    公开(公告)号:US06999897B2

    公开(公告)日:2006-02-14

    申请号:US10708573

    申请日:2004-03-11

    CPC classification number: G05B19/41875 Y02P90/22

    Abstract: A method and related system for semiconductor equipment early warning management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording the quality of semiconductor products and corresponding testing parameters, and analyzing a relationship between the corresponding process parameters, the corresponding equipment parameters, and the quality of semiconductor products of each piece of equipment.

    Abstract translation: 一种半导体设备预警管理方法及相关系统。 该方法包括记录每件设备的处理参数,每台设备处理时记录设备参数,评估和记录半导体产品的质量和相应的测试参数,分析相应工艺参数,相应设备参数之间的关系 ,以及每件设备的半导体产品的质量。

    Method and related system for semiconductor equipment prevention maintenance management
    12.
    发明授权
    Method and related system for semiconductor equipment prevention maintenance management 有权
    半导体设备预防维护管理方法及相关系统

    公开(公告)号:US06950783B1

    公开(公告)日:2005-09-27

    申请号:US10708572

    申请日:2004-03-11

    CPC classification number: H01L22/20 G05B19/41875 G06Q30/0283 Y02P90/22

    Abstract: A method and related system for semiconductor equipment prevention maintenance management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording time and cost of prevention maintenance after each piece of equipment runs prevention maintenance, evaluating the quality of semiconductor products, and analyzing a relationship between the corresponding process parameter, the corresponding equipment parameters, prevention maintenance cost, and semiconductor products of each piece of equipment.

    Abstract translation: 一种半导体设备预防维护管理方法及相关系统。 该方法包括记录每件设备的工艺参数,每台设备的加工记录设备参数,每台设备运行后的预防维护的评估和记录时间和成本预防维护,半导体产品的质量评估和分析 相应的过程参数,相应的设备参数,预防维护成本以及每件设备的半导体产品之间的关系。

    METHOD AND RELATED SYSTEM FOR SEMICONDUCTOR EQUIPMENT EARLY WARNING MANAGEMENT
    13.
    发明申请
    METHOD AND RELATED SYSTEM FOR SEMICONDUCTOR EQUIPMENT EARLY WARNING MANAGEMENT 失效
    用于半导体设备的方法和相关系统早期警告管理

    公开(公告)号:US20050203715A1

    公开(公告)日:2005-09-15

    申请号:US10708573

    申请日:2004-03-11

    CPC classification number: G05B19/41875 Y02P90/22

    Abstract: A method and related system for semiconductor equipment early warning management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording the quality of semiconductor products and corresponding testing parameters, and analyzing a relationship between the corresponding process parameters, the corresponding equipment parameters, and the quality of semiconductor products of each piece of equipment.

    Abstract translation: 一种半导体设备预警管理方法及相关系统。 该方法包括记录每件设备的处理参数,每台设备处理时记录设备参数,评估和记录半导体产品的质量和相应的测试参数,分析相应工艺参数,相应设备参数之间的关系 ,以及每件设备的半导体产品的质量。

    REAL-TIME MANAGEMENT SYSTEMS AND METHODS FOR MANUFACTURING MANAGEMENT AND YIELD RATE ANALYSIS INTEGRATION
    15.
    发明申请
    REAL-TIME MANAGEMENT SYSTEMS AND METHODS FOR MANUFACTURING MANAGEMENT AND YIELD RATE ANALYSIS INTEGRATION 失效
    实时管理系统及其制造管理和收费率分析整合方法

    公开(公告)号:US20060241802A1

    公开(公告)日:2006-10-26

    申请号:US11228361

    申请日:2005-09-19

    Abstract: A real-time management method for manufacturing management and yield rate analysis integration. A plurality of yield rates relating to wafer products are summed and averaged for a historical yield rate. Multiple representational inline QC parameters are selected. A statistical process is implemented and, if no extreme value and collinear parameter exists and if analysis results satisfy normal distribution, multiple optimum inline QC parameters are selected from the representational inline QC parameters. Weights of each optimum inline QC parameter are calculated. A predicted yield rate is calculated according to the historical yield rate, weights, and a plurality of measurement and target values relating to the wafer products.

    Abstract translation: 制造管理和产出率分析整合的实时管理方法。 将与晶片产品相关的多个屈服率以历史产量率相加和平均。 选择多个代表性的在线QC参数。 实施统计过程,如果没有极值和共线参数存在,并且如果分析结果满足正态分布,则从表示的在线QC参数中选择多个最佳在线QC参数。 计算每个最佳在线QC参数的权值。 根据历史收益率,权重以及与晶片产品相关的多个测量值和目标值来计算预测收益率。

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