Process and Device for the Treatment of a Fluid Containing a Contaminant
    11.
    发明申请
    Process and Device for the Treatment of a Fluid Containing a Contaminant 审中-公开
    用于处理含有污染物的流体和装置

    公开(公告)号:US20160376166A1

    公开(公告)日:2016-12-29

    申请号:US15191001

    申请日:2016-06-23

    Abstract: In one of its aspects, the invention relates to a process to optimize the dose of a treatment agent for the treatment of a fluid comprising a contaminant. In this first aspect the process comprises the steps of: (a) calculating the dose of the treatment agent based on the relationship between concentration of the treatment agent at one or more points and residence time distribution of the treatment system, and (b) contacting the fluid with the treatment agent in the concentration required to meet the dose calculated in step (a). In another one of its aspects, the invention relates to a process to optimize the dose of a treatment agent for reduction of a contaminant in a fluid.

    Abstract translation: 在其一个方面,本发明涉及优化用于处理包含污染物的流体的处理剂的剂量的方法。 在该第一方面,该方法包括以下步骤:(a)基于处理剂的浓度和处理系统的停留时间分布之间的关系计算处理剂的剂量,和(b)接触 具有处理剂的流体以满足在步骤(a)中计算的剂量所需的浓度。 在另一个方面,本发明涉及一种优化用于还原流体中的污染物的处理剂的剂量的方法。

    RADIATION SOURCE CLEANING SYSTEM AND MODULE CONTAINING SAME
    12.
    发明申请
    RADIATION SOURCE CLEANING SYSTEM AND MODULE CONTAINING SAME 审中-公开
    辐射源清洁系统和包含其的模块

    公开(公告)号:US20150028224A1

    公开(公告)日:2015-01-29

    申请号:US14379864

    申请日:2013-02-25

    Abstract: There is described a cleaning system for a radiation source. The cleaning system comprises: (i) a cleaning chamber housing; (ii) a cleaning cartridge removably disposed in the cleaning chamber housing; and (iii) an endcap element removably coupled to the cleaning chamber housing. The cleaning cartridge comprises a first sealing element and a second sealing element, the first sealing element and the second sealing element configured to provide a substantially fluid tight seal with respect to an exterior surface of the radiation source. A radiation source module and a fluid treatment system comprising the radiation source module are also described.

    Abstract translation: 描述了用于辐射源的清洁系统。 清洁系统包括:(i)清洁室壳体; (ii)可拆卸地设置在清洁室壳体中的清洁带; 和(iii)可拆卸地联接到清洁室壳体的端盖元件。 清洁带包括第一密封元件和第二密封元件,第一密封元件和第二密封元件构造成相对于辐射源的外表面提供基本上流体密封的密封。 还描述了包括辐射源模块的辐射源模块和流体处理系统。

    Cleaning apparatus
    13.
    发明申请
    Cleaning apparatus 失效
    清洁装置

    公开(公告)号:US20040140434A1

    公开(公告)日:2004-07-22

    申请号:US10345951

    申请日:2003-01-17

    Inventor: Peter Ueberall

    CPC classification number: B08B9/023

    Abstract: A cleaning apparatus with cleaning rings for cleaning cylindrical bodies, preferably for the quartz cladding tubes in UV disinfection units, especially in UV disinfection sluices for waste water, which in addition to an axially parallel longitudinal movement over the outside surfaces perform an additional angularly limited and alternating rotational movement The object of the invention is a cleaning apparatus with cleaning rings for cleaning cylindrical bodies, preferably for the quartz cladding tubes in UV disinfection units, especially in UV disinfection sluices for waste water, which in addition to an axially parallel longitudinal movement over the outside surfaces perform an additional angularly limited and alternating rotational movement. According to the inventive idea the cleaning rings are moved slowly in an axially parallel way over the quartz cladding tubes, with the same moving additionally in an angularly limited and with suitable speed alternatingly about a rotational axis for reinforcing the cleaning performance and especially for the better penetration of troughs at places that are out of round. This manner of movement of the cleaning rings necessitates a considerably lower amount of mechanical complexity at virtually the same cleaning performance than would be necessary in a full and uninterrupted rotation of the cleaning rings. Compared with the usual rigid wiper rings which are moved back and forth in an axially parallel manner on the quartz cladding tubes without any rotational movement, the cleaning performance with the cleaning rings according to the inventive idea is considerably better.

    Abstract translation: 具有用于清洁圆柱体的清洁环的清洁装置,优选用于UV消毒单元中的石英包层管,特别是用于废水的UV消毒闸门,除了在外表面上的轴向平行的纵向运动之外,还执行额外的角度限制和 交替旋转运动本发明的目的是一种具有用于清洁圆柱体的清洁环的清洁装置,优选用于紫外线消毒单元中的石英包层管,特别是用于废水的紫外线消毒水闸,除了轴向平行的纵向运动 外表面执行额外的角度限制和交替的旋转运动。 根据本发明的想法,清洁环以轴向平行的方式缓慢地移动到石英包层管上方,并且以相对于旋转轴线交替地以角度限制和适当的速度另外移动,以增强清洁性能,特别是对于更好的 在不合适的地方渗透槽。 清洁环的这种移动方式在与清洁环的完全和不间断旋转所需的实质上相同的清洁性能下需要相当低的机械复杂性。 与在石英包层管上轴向平行移动而没有任何旋转运动的通常的刚性擦拭环相比,根据本发明构思的清洁环的清洁性能相当好。

    Fluid treatment system
    14.
    发明申请
    Fluid treatment system 失效
    流体处理系统

    公开(公告)号:US20030080071A1

    公开(公告)日:2003-05-01

    申请号:US10247317

    申请日:2002-09-20

    Abstract: There is described a fluid treatment system comprising an array of independent fluid treatment reactors. The reactors are arranged in a manner whereby a flow of fluid may be passed through the array in a substantially helical direction. The fluid treatment system is capable of treating large volumes of fluid (e.g., water) while requiring a relatively small foot print. In essence, the present fluid treatment system concentrates a relatively large number of radiation sources in a relatively small amount of space resulting in the ability to treat large volumes of fluid (e.g., water).

    Abstract translation: 描述了包括独立流体处理反应器阵列的流体处理系统。 反应器以这样的方式排列,使得流体流可以以基本螺旋方向通过阵列。 流体处理系统能够处理大量的流体(例如水),同时需要相对小的脚印。 本质上,本流体处理系统将相对大量的辐射源集中在相对少量的空间中,从而产生处理大量流体(例如水)的能力。

    CONTROL SYSTEMS FOR UV WATER TREATMENT REACTOR

    公开(公告)号:US20250051190A1

    公开(公告)日:2025-02-13

    申请号:US18798135

    申请日:2024-08-08

    Inventor: John VAREKA

    Abstract: Methods of operating a system for treating a fluid flowing through a reactor with ultraviolet (UV) light emitted from a light source assembly. One method includes detecting, with a flow sensor, a flow rate of fluid through the reactor; and controlling, with a processor, electric power supplied to the light source assembly so that a low average amount of electric power is supplied when the flow rate is below a threshold. In another method, an intensity of the UV light may be controlled by the processor based on a detected temperature in the light source assembly. Yet another method includes determining that the flow sensor is defective based on the detected temperature in the light source assembly and the detected flow rate. A further method includes determining that an intensity sensor is defective based on a detected intensity and the detected temperature in the light source assembly.

    UV RADIATION SOURCE ASSEMBLY
    16.
    发明公开

    公开(公告)号:US20240128074A1

    公开(公告)日:2024-04-18

    申请号:US18392168

    申请日:2023-12-21

    CPC classification number: H01J61/366 A61L2/08 C02F1/325 H01J5/60 H01J61/36

    Abstract: A radiation source assembly comprises a source base, a UV transparent sleeve, and a UV lamp. The source base comprises a sealed electrical connection interface and an opposing sealed sleeve interface. The sealed electrical connection interface comprises a electrical contacts and the sealed sleeve interface comprise a radial sealing element, an outer collar, and a compression ring. The UV transparent sleeve is engaged with the sleeve interface such that the radial sealing element of the sealed sleeve interface is disposed between the UV transparent sleeve and the outer collar of the source base, and the compression ring is positioned over the UV transparent sleeve and engaged with the source base to compress the radial sealing element onto the UV transparent sleeve and the outer collar. The UV lamp is disposed within the UV transparent sleeve and electrically coupled to the electrical contacts of the electrical connection interface.

    UV radiation source assembly
    17.
    发明授权

    公开(公告)号:US11887836B2

    公开(公告)日:2024-01-30

    申请号:US18147956

    申请日:2022-12-29

    CPC classification number: H01J61/366 A61L2/08 C02F1/325 H01J5/60 H01J61/36

    Abstract: A radiation source assembly comprises a source base, a UV transparent sleeve, and a UV lamp. The source base comprises a sealed electrical connection interface and an opposing sealed sleeve interface. The sealed electrical connection interface comprises a electrical contacts and the sealed sleeve interface comprise a radial sealing element, an outer collar, and a compression ring. The UV transparent sleeve is engaged with the sleeve interface such that the radial sealing element of the sealed sleeve interface is disposed between the UV transparent sleeve and the outer collar of the source base, and the compression ring is positioned over the UV transparent sleeve and engaged with the source base to compress the radial sealing element onto the UV transparent sleeve and the outer collar. The UV lamp is disposed within the UV transparent sleeve and electrically coupled to the electrical contacts of the electrical connection interface.

    UV radiation source assembly
    19.
    发明授权

    公开(公告)号:US11610770B1

    公开(公告)日:2023-03-21

    申请号:US17752157

    申请日:2022-05-24

    Abstract: A radiation source assembly comprises a source base, a UV transparent sleeve, and a UV lamp. The source base comprises a sealed electrical connection interface and an opposing sealed sleeve interface. The sealed electrical connection interface comprises a electrical contacts and the sealed sleeve interface comprise a radial sealing element, an outer collar, and a compression ring. The UV transparent sleeve is engaged with the sleeve interface such that the radial sealing element of the sealed sleeve interface is disposed between the UV transparent sleeve and the outer collar of the source base, and the compression ring is positioned over the UV transparent sleeve and engaged with the source base to compress the radial sealing element onto the UV transparent sleeve and the outer collar. The UV lamp is disposed within the UV transparent sleeve and electrically coupled to the electrical contacts of the electrical connection interface.

    Radiation source cleaning system and module containing same

    公开(公告)号:US10322947B2

    公开(公告)日:2019-06-18

    申请号:US14379864

    申请日:2013-02-25

    Abstract: There is described a cleaning system for a radiation source. The cleaning system comprises: (i) a cleaning chamber housing; (ii) a cleaning cartridge removably disposed in the cleaning chamber housing; and (iii) an endcap element removably coupled to the cleaning chamber housing. The cleaning cartridge comprises a first sealing element and a second sealing element, the first sealing element and the second sealing element configured to provide a substantially fluid tight seal with respect to an exterior surface of the radiation source. A radiation source module and a fluid treatment system comprising the radiation source module are also described.

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