公开(公告)号：US20090239035A1

公开(公告)日：2009-09-24

申请号：US12477285

申请日：2009-06-03

Applicant: Kensuke Nagai ,  Tetsuya Nakashima ,  Kei Maeda ,  Tatsuo Nagashima

Inventor： Kensuke Nagai ,  Tetsuya Nakashima ,  Kei Maeda ,  Tatsuo Nagashima

IPC: B32B5/00 ,  C03C3/085 ,  C03C3/087 ,  C03C3/083

CPC classification number: G11B5/7315 ,  C03C3/085 ,  C03C3/087 ,  G11B7/2531 ,  Y10T428/24355

Abstract: To provide a substrate glass for data storage medium which is excellent in weather resistance even when no additional treatment such as chemical reinforcement treatment is applied and less susceptible to a whitening phenomenon and which has a glass transition temperature of at least 680° C. and is excellent in acid resistance.A substrate glass for data storage medium, which comprises, as represented by mass %, from 47 to 60% of SiO2, from 8 to 20% of Al2O3, from 0 to 8% of MgO, from 0 to 6% of CaO, from 1 to 18% of SrO, from 0 to 13% of BaO, from 1 to 6% of TiO2, from 1 to 5% of ZrO2, from 2 to 8% of Na2O and from 1 to 15% of K2O and which has a glass transition temperature of at least 680° C.

Abstract translation: 为了提供一种数据存储介质的基板玻璃，即使在不进行诸如化学强化处理的附加处理并且不易发生白化现象并且玻璃化转变温度至少为680℃并且是 耐酸性好。 用于数据存储介质的基板玻璃，其以质量％表示，SiO 2为47至60％，Al 2 O 3为8至20％，MgO为0至8％，CaO为0至6％， 1〜18％的SrO，0〜13％的BaO，1〜6％的TiO 2，1〜5％的ZrO 2，2〜8％的Na 2 O和1〜15％的K 2 O， 玻璃化转变温度至少为680℃

公开(公告)号：US06949485B2

公开(公告)日：2005-09-27

申请号：US09870496

申请日：2001-06-01

Applicant: Tetsuya Nakashima ,  Yasumasa Nakao

Inventor： Tetsuya Nakashima ,  Yasumasa Nakao

IPC: C03C3/085 ,  C03C3/087 ,  C03C3/091

CPC classification number: C03C3/085

Abstract: A glass for substrate, which consists, as represented by mass percentage, essentially of: SiO240 to 59%, Al2O3 5 to 20%, B2O3 0 to 8%, MgO 0 to 10%, CaO 0 to 12%, SrO 2 to 20%, BaO 0 to 2%, ZnO 0 to 4%, Li2O 0 to 2%, Na2O 0 to 10%, K2O 0 to 12%, TiO2 0 to 10%, and ZrO2 0 to 5%, wherein MgO+CaO+SrO+BaO is at least 15%.

公开(公告)号：US06313052B1

公开(公告)日：2001-11-06

申请号：US09256213

申请日：1999-02-24

Applicant: Tetsuya Nakashima ,  Kei Maeda ,  Yasumasa Nakao

Inventor： Tetsuya Nakashima ,  Kei Maeda ,  Yasumasa Nakao

IPC: C03C3085

CPC classification number: H01L31/03921 ,  C03C3/085 ,  C03C3/087 ,  H01J17/16 ,  H01J2217/49264 ,  H01L31/0392 ,  Y02E10/50

Abstract: A glass for a substrate, having an average thermal expansion coefficient in the range of from 60×10−7 to 75×10−7/° C. at 50 to 350° C., which consists essentially of the following composition expressed by wt %: wt % SiO2 more than 62 to 74, Al2O3  1 to 15, MgO  0 to 9, CaO  0 to 14, Na2O  0 to 12, K2O  0 to 13, SiO2 + Al2O3 72 to 82, MgO + CaO  5 to 24, Na2O + K2O  1 to 15, MgO + CaO + Na2O + K2O 18 to 28.

Abstract translation: 用于基材的玻璃，其在50至350℃下的平均热膨胀系数在60×10-7至75×10-7 /℃的范围内，其基本上由以wt％表示的以下组成组成：

公开(公告)号：US08563149B2

公开(公告)日：2013-10-22

申请号：US12716467

申请日：2010-03-03

Applicant: Tatsuo Nagashima ,  Kensuke Nagai ,  Tetsuya Nakashima ,  Kei Maeda

Inventor： Tatsuo Nagashima ,  Kensuke Nagai ,  Tetsuya Nakashima ,  Kei Maeda

IPC: G11B5/706 ,  C03C3/23

CPC classification number: G11B5/7315 ,  C03C3/095

Abstract: To provide glass for a data storage medium substrate, whereby high heat resistance can be obtained.Glass for a data storage medium substrate, which comprises, as represented by mol percentage based on the following oxides, from 55 to 70% of SiO2, from 2.5 to 9% of Al2O3, from 0 to 10% of MgO, from 0 to 7% of CaO, from 0.5 to 10% of SrO, from 0 to 12.5% of BaO, from 0 to 2.5% of TiO2, from 0.5 to 3.7% of ZrO2, from 0 to 2.5% of Li2O, from 0 to 8% of Na2O, from 2 to 8% of K2O and from 0.5 to 5% of La2O3, provided that the total content of Al2O3 and ZrO2 (Al2O3+ZrO2) is at most 12%, and the total content of Li2O, Na2O and K2O (R2O) is at most 12%.

Abstract translation: 为了提供用于数据存储介质基板的玻璃，由此可以获得高耐热性。 用于数据存储介质衬底的玻璃，其以由以下氧化物的摩尔百分数表示的SiO 2为55至70％，Al 2 O 3为2.5至9％，MgO为0至10％，0至7 CaO的0.5〜10％，BaO 0〜12.5％，TiO 2 0〜2.5％，ZrO 2 0.5〜3.7％，Li 2 O 2〜2.5％，Li 2 O 0〜8％ Na 2 O，2〜8％的K 2 O和0.5〜5％的La 2 O 3，条件是Al 2 O 3和ZrO 2（Al 2 O 3 + ZrO 2）的总含量至多为12％，Li 2 O，Na 2 O和K 2 O（R 2 O）的总含量 ）至多12％。

公开(公告)号：US20130011650A1

公开(公告)日：2013-01-10

申请号：US13619290

申请日：2012-09-14

Applicant: Shusaku Akiba ,  Kazutaka Ono ,  Jun Endo ,  Shigeki Sawamura ,  Tetsuya Nakashima ,  Yuichi Kuroki

Inventor： Shusaku Akiba ,  Kazutaka Ono ,  Jun Endo ,  Shigeki Sawamura ,  Tetsuya Nakashima ,  Yuichi Kuroki

IPC: C03C3/083 ,  C03C3/087 ,  B32B17/06 ,  C03C3/085

CPC classification number: C03C3/087 ,  C03C3/085 ,  C03C21/002 ,  C03C23/007 ,  G02F2001/133302

Abstract: To provide glass to be used for chemically tempered glass which is hardly broken even when flawed.Glass for chemical tempering, which comprises, as represented by mole percentage based on the following oxides, from 65 to 85% of SiO2, from 3 to 15% of Al2O3, from 5 to 15% of Na2O, from 0 and less than 2% of K2O, from 0 to 15% of MgO and from 0 to 1% of ZrO2, and has a total content SiO2+Al2O3 of SiO2 and Al2O3 of at most 88%.

Abstract translation: 提供用于化学钢化玻璃的玻璃，即使有缺陷也难以破损。 用于化学回火的玻璃，其包含以下列氧化物的摩尔百分数表示，65％至85％的SiO 2，3至15％的Al 2 O 3，5至15％的Na 2 O，0和小于2％ 的K 2 O，0〜15％的MgO和0〜1％的ZrO 2，SiO 2和Al 2 O 3的SiO 2 + Al 2 O 3的总含量为88％以下。

公开(公告)号：US08328602B2

公开(公告)日：2012-12-11

申请号：US12833410

申请日：2010-07-09

Applicant: Masahiko Tamura ,  Toru Momose ,  Katsuaki Miyatani ,  Tetsuya Nakashima

Inventor： Masahiko Tamura ,  Toru Momose ,  Katsuaki Miyatani ,  Tetsuya Nakashima

IPC: C03B27/00 ,  B24C3/08 ,  G11B9/04

CPC classification number: G11B5/8404 ,  B24B37/042 ,  B24B37/08 ,  C03C19/00 ,  G11B5/7315

Abstract: The present invention relates to a method for manufacturing a glass substrate for information recording medium, the method including: a lapping step of lapping a circular glass plate made of an alkali aluminosilicate glass; and a subsequent cerium oxide polishing step of polishing the circular glass plate with a slurry containing a cerium oxide abrasive, in which a difference (SiO2−Al2O3) obtained by subtracting an Al2O3 content from an SiO2 content in the alkali aluminosilicate glass is 62% by mole or less; and in which the method further includes: subsequently to the cerium oxide polishing step, a cleaning step of cleaning the circular glass plate with a cleaning liquid having a sulfuric acid concentration of 20% by mass or more and 80% by mass or less and a hydrogen peroxide concentration of 1% by mass or more and 10% by mass or less at a liquid temperature of 50° C. or higher and 100° C. or lower, and after the cleaning step, a finish polishing step of polishing a main surface of the circular glass plate with a slurry containing a colloidal silica abrasive.

Abstract translation: 本发明涉及一种用于信息记录介质的玻璃基板的制造方法，该方法包括：研磨由铝硅酸铝玻璃制成的圆形玻璃板的研磨步骤; 以及后续的氧化铈抛光步骤，用含有氧化铈磨料的浆料研磨圆形玻璃板，其中通过从碱性铝硅酸盐玻璃中的SiO 2含量减去Al 2 O 3含量而得到的差异（SiO 2 -Al 2 O 3）为62％ 摩尔或更少; 该方法还包括：随后的氧化铈抛光步骤，用硫酸浓度为20质量％以上且80质量％以下的清洗液清洗圆形玻璃板的清洗工序， 过氧化氢浓度在50℃以上且100℃以下的液温下为1质量％以上且10质量％以下，在清洗工序后，对主体进行研磨的精抛光工序 具有含有胶体二氧化硅研磨剂的浆料的圆形玻璃板的表面。

公开(公告)号：US20120264585A1

公开(公告)日：2012-10-18

申请号：US13419115

申请日：2012-03-13

Applicant: Seiki OHARA ,  Kazutaka Ono ,  Tetsuya Nakashima

Inventor： Seiki OHARA ,  Kazutaka Ono ,  Tetsuya Nakashima

IPC: C03C3/085 ,  C03C21/00 ,  C03C3/087

CPC classification number: C03C3/087 ,  C03C3/085 ,  C03C4/18 ,  C03C21/002 ,  C03C2204/00

Abstract: To provide a method for producing chemically tempered glass, whereby the chemical tempering can be done at a low temperature and in a short time. A method for producing chemically tempered glass, which comprises chemically tempering glass for chemical tempering, comprising, as represented by mole percentage based on the following oxides, from 60 to 75% of SiO2, from 5 to 15% of Al2O3, from 1 to 12% of MgO, from 0 to 3% of CaO, from 0 to 3% of ZrO2, from 10 to 20% of Li2O, from 0 to 8% of Na2O and from 0 to 5% of K2O, and having a total content R2O of Li2O, Na2O and K2O of at most 25%, and a ratio Li2O/R2O of the Li2O content to R2O of from 0.5 to 1.0.

Abstract translation: 为了提供一种生产化学钢化玻璃的方法，由此化学回火可以在低温和短时间内进行。 一种生产化学钢化玻璃的方法，其包括用于化学回火的化学回火玻璃，其包含以下列氧化物的摩尔百分比表示：60至75％的SiO 2，5至15％的Al 2 O 3，1至12 0％〜3％的CaO，0〜3％的ZrO 2，10〜20％的Li 2 O，0〜8％的Na 2 O和0〜5％的K 2 O，总含量为R2O 的Li 2 O，Na 2 O和K 2 O的含量为25％以下，Li 2 O的含量与R 2 O的比Li2O / R2O为0.5〜1.0。

公开(公告)号：US20120244388A1

公开(公告)日：2012-09-27

申请号：US13490154

申请日：2012-06-06

Applicant: Tetsuya NAKASHIMA ,  Katsuaki Miyatani

Inventor： Tetsuya NAKASHIMA ,  Katsuaki Miyatani

IPC: G11B5/84 ,  C03C3/04 ,  G11B5/73

CPC classification number: G11B5/7315 ,  C03C3/091 ,  C03C19/00 ,  C03C23/0075 ,  G11B5/8404

Abstract: A process for producing a glass substrate for information recording media, comprising lapping a glass disk made of low alkali aluminosilicate glass that contains no alkali metal oxide or contains alkali metal oxides in a total amount of less than 4 mol %, and subsequently polishing the glass disk by using a slurry that contains cerium oxide abrasives, characterized by cleaning the glass disk by using a cleaning liquid that contains sulfuric acid at a concentration of from 20 mass % to 80 mass % and hydrogen peroxide at a concentration of from 0.5 mass % to 10 mass % at a liquid temperature of from 50° C. to 100° C., and thereafter polishing the main surface of the glass disk, by using a slurry that contains colloidal silica abrasives.

Abstract translation: 一种用于信息记录介质的玻璃基板的制造方法，包括：研磨不含碱金属氧化物的低碱性硅铝酸盐玻璃的玻璃盘，或者含有总量小于4摩尔％的碱金属氧化物，然后研磨玻璃 通过使用含有氧化铈研磨剂的浆料，其特征在于，使用含有浓度为20质量％〜80质量％的硫酸的清洗液和浓度为0.5质量％以上的过氧化氢至 在液体温度为50℃至100℃下为10质量％，然后通过使用含有胶体二氧化硅研磨剂的浆料研磨玻璃盘的主表面。

公开(公告)号：US20110312483A1

公开(公告)日：2011-12-22

申请号：US13115626

申请日：2011-05-25

Applicant: Tetsuya NAKASHIMA ,  Seiki OHARA ,  Tatsuo NAGASHIMA

Inventor： Tetsuya NAKASHIMA ,  Seiki OHARA ,  Tatsuo NAGASHIMA

IPC: C03C3/087 ,  C03C3/083 ,  C03C21/00 ,  C03C3/085

CPC classification number: C03C3/085 ,  C03C3/083 ,  C03C3/087 ,  C03C21/002

Abstract: Glass for a display device, which comprises, as represented by mole percentage based on the following oxides, from 61 to 72% of SiO2, from 8 to 17% of Al2O3, from 6 to 18% of Li2O, from 2 to 15% of Na2O, from 0 to 8% of K2O, from 0 to 6% of MgO, from 0 to 6% of CaO, from 0 to 4% of TiO2, and from 0 to 2.5% of ZrO2, and having a total content R2O of Li2O, Na2O and K2 O of from 15 to 25%, a ratio Li2O/R2O of the Li2O content to R2O of from 0.35 to 0.8, and a total content of MgO and CaO of from 0 to 9%.

Abstract translation: 用于显示装置的玻璃，其包含以下列氧化物的摩尔百分数表示，SiO 2为61至72％，Al 2 O 3为8至17％，Li 2 O 6为18至18％，SiO 2为2至15％ Na 2 O，0〜8％的K 2 O，0〜6％的MgO，0〜6％的CaO，0〜4％的TiO 2和0〜2.5％的ZrO 2， Li 2 O，Na 2 O和K 2 O为15〜25％，Li 2 O含量与R 20的Li 2 O / R 20比为0.35〜0.8，MgO和CaO的总含量为0〜9％。

公开(公告)号：US20100330396A1

公开(公告)日：2010-12-30

申请号：US12881236

申请日：2010-09-14

Applicant: Tetsuya NAKASHIMA ,  Kei Maeda ,  Noriaki Shimodaira ,  Atsuyoshi Takenaka

Inventor： Tetsuya NAKASHIMA ,  Kei Maeda ,  Noriaki Shimodaira ,  Atsuyoshi Takenaka

IPC: G11B5/62

CPC classification number: G11B5/7315 ,  C03C3/083 ,  C03C3/085 ,  C03C4/20 ,  Y10T428/31 ,  Y10T428/315

Abstract: To provide a glass for an information recording media substrate, which is excellent in weather resistance.A glass for an information recording media substrate, which comprises, as represented by mol % based on oxide, from 61 to 66% of SiO2, from 11.5 to 17% of Al2O3, from 8 to 16% of Li2O, from 2 to 8% of Na2O, from 2.5 to 8% of K2O, from 0 to 6% of MgO, from 0 to 4% of TiO2 and from 0 to 3% of ZrO2, provided that Al2O3+MgO+TiO2 is at least 12%, and Li2O+Na2O+K2O is from 16 to 23%, wherein in a case of where B2O3 is contained, its content is less than 1%. The above glass for an information recording media substrate, wherein when the glass is left under steam atmosphere at 120° C. at 0.2 MPa for 20 hours, and the amount of Li, the amount of Na and the amount of K, which precipitate on a surface of the glass are represented as CLi, CNa and CK respectively, CNa is at most 0.7 nmol/cm2, and CLi+CNa+CK is at most 3.5 nmol/cm2.

Abstract translation: 提供耐候性优异的信息记录介质基板用玻璃。 用于信息记录介质基板的玻璃，其以氧化物的摩尔％表示，SiO 2的61至66％，Al 2 O 3的11.5至17％，Li 2 O的8至16％，2至8重量％ 的Na 2 O，2.5〜8％的K 2 O，0〜6％的MgO，0〜4％的TiO 2和0〜3％的ZrO 2，条件是Al 2 O 3 + MgO + TiO 2为至少12％，Li 2 O + Na 2 O + K 2 O为16〜23％，其中，在含有B 2 O 3的情况下，其含量小于1％。 上述用于信息记录介质基板的玻璃，其中当玻璃在蒸气气氛中在120℃下在0.2MPa下放置20小时时，并且Li的量，Na的量和沉淀的K的量 玻璃的表面分别表示为CLi，CNa和CK，CNa为0.7nmol / cm 2以下，CLi + CNa + CK为3.5nmol / cm 3以下。