摘要:
To provide a glass for an information recording media substrate, which is excellent in weather resistance.A glass for an information recording media substrate, which comprises, as represented by mol % based on oxide, from 61 to 66% of SiO2, from 11.5 to 17% of Al2O3, from 8 to 16% of Li2O, from 2 to 8% of Na2O, from 2.5 to 8% of K2O, from 0 to 6% of MgO, from 0 to 4% of TiO2 and from 0 to 3% of ZrO2, provided that Al2O3+MgO+TiO2 is at least 12%, and Li2O+Na2O+K2O is from 16 to 23%, wherein in a case of where B2O3 is contained, its content is less than 1%. The above glass for an information recording media substrate, wherein when the glass is left under steam atmosphere at 120° C. at 0.2 MPa for 20 hours, and the amount of Li, the amount of Na and the amount of K, which precipitate on a surface of the glass are represented as CLi, CNa and CK respectively, CNa is at most 0.7 nmol/cm2, and CLi+CNa+CK is at most 3.5 nmol/cm2.
摘要翻译:提供耐候性优异的信息记录介质基板用玻璃。 用于信息记录介质基板的玻璃,其以氧化物的摩尔%表示,SiO 2的61至66%,Al 2 O 3的11.5至17%,Li 2 O的8至16%,2至8重量% 的Na 2 O,2.5〜8%的K 2 O,0〜6%的MgO,0〜4%的TiO 2和0〜3%的ZrO 2,条件是Al 2 O 3 + MgO + TiO 2为至少12%,Li 2 O + Na 2 O + K 2 O为16〜23%,其中,在含有B 2 O 3的情况下,其含量小于1%。 上述用于信息记录介质基板的玻璃,其中当玻璃在蒸气气氛中在120℃下在0.2MPa下放置20小时时,并且Li的量,Na的量和沉淀的K的量 玻璃的表面分别表示为CLi,CNa和CK,CNa为0.7nmol / cm 2以下,CLi + CNa + CK为3.5nmol / cm 3以下。
摘要:
The present invention provides a method for lapping a glass substrate, including lapping a glass substrate having excellent maximum thickness deviation, and a method for manufacturing a glass substrate for a magnetic recording medium, including a step using the above-mentioned lapping method.
摘要:
Spots generated on a glass substrate after a polishing step are reduced. The present invention relates to a method for polishing a glass substrate including injecting a silica abrasive and a high-boiling solvent in a final glass substrate polishing step. The high-boiling solvent is preferably a solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher. As Examples of the high-boiling solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher includes ethylene glycol, propylene glycol and glycerine.
摘要:
Conventional TiO2—SiO2 glass contains hydrogen atoms substantially, and during deposition under ultrahigh vacuum condition, the hydrogen molecules will diffuse in the chamber, and H2 molecules will be taken into a film thereby formed. Hydrogen molecules will readily diffuse, and the optical characteristics of the multilayer film are likely to be thereby changed. In an optical material for EUV lithography, a multilayer film is coated by ion beam sputtering on a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass.
摘要:
To provide a glass for an information recording media substrate, which is excellent in weather resistance.A glass for an information recording media substrate, which comprises, as represented by mol % based on oxide, from 61 to 66% of SiO2, from 11.5 to 17% of Al2O3, from 8 to 16% of Li2O, from 2 to 8% of Na2O, from 2.5 to 8% of K2O, from 0 to 6% of MgO, from 0 to 4% of TiO2 and from 0 to 3% of ZrO2, provided that Al2O3+MgO+TiO2 is at least 12%, and Li2O+Na2O+K2O is from 16 to 23%, wherein in a case of where B2O3 is contained, its content is less than 1%. The above glass for an information recording media substrate, wherein when the glass is left under steam atmosphere at 120° C. at 0.2 MPa for 20 hours, and the amount of Li, the amount of Na and the amount of K, which precipitate on a surface of the glass are represented as CLi, CNa and CK respectively, CNa is at most 0.7 nmol/cm2, and CLi+CNa+CK is at most 3.5 nmol/cm2.
摘要翻译:提供耐候性优异的信息记录介质基板用玻璃。 用于信息记录介质基板的玻璃,其以氧化物的摩尔%表示,SiO 2的61至66%,Al 2 O 3的11.5至17%,Li 2 O的8至16%,2至8重量% 的Na 2 O,2.5〜8%的K 2 O,0〜6%的MgO,0〜4%的TiO 2和0〜3%的ZrO 2,条件是Al 2 O 3 + MgO + TiO 2为至少12%,Li 2 O + Na 2 O + K 2 O为16〜23%,其中,在含有B 2 O 3的情况下,其含量小于1%。 上述用于信息记录介质基板的玻璃,其中当玻璃在蒸气气氛中在120℃下在0.2MPa下放置20小时时,并且Li的量,Na的量和沉淀的K的量 玻璃的表面分别表示为CLi,CNa和CK,CNa为0.7nmol / cm 2以下,CLi + CNa + CK为3.5nmol / cm 3以下。
摘要:
Spots generated on a glass substrate after a polishing step are reduced. The present invention relates to a method for polishing a glass substrate including injecting a silica abrasive and a high-boiling solvent in a final glass substrate polishing step. The high-boiling solvent is preferably a solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher. As Examples of the high-boiling solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher includes ethylene glycol, propylene glycol and glycerine.
摘要:
The claimed invention relates to a process for producing an optical material for EUV lithography, wherein the optical material contains a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass. The process including coating a multilayer film on the silica glass by ion beam sputtering.
摘要翻译:所要求保护的发明涉及一种用于制造用于EUV光刻的光学材料的方法,其中所述光学材料包含玻璃中TiO 2浓度为3至12质量%且氢分子含量小于5×10 17分子/ cm 3的二氧化硅玻璃 。 该方法包括通过离子束溅射在二氧化硅玻璃上涂覆多层膜。
摘要:
To provide a glass for an information recording media substrate, which is excellent in weather resistance.A glass for an information recording media substrate, which comprises, as represented by mol % based on oxide, from 61 to 66% of SiO2, from 11.5 to 17% of Al2O3, from 8 to 16% of Li2O, from 2 to 8% of Na2O, from 2.5 to 8% of K2O, from 0 to 6% of MgO, from 0 to 4% of TiO2 and from 0 to 3% of ZrO2, provided that Al2O3+MgO+TiO2 is at least 12%, and Li2O+Na2O+K2O is from 16 to 23%, wherein in a case of where B2O3 is contained, its content is less than 1%. The above glass for an information recording media substrate, wherein when the glass is left under steam atmosphere at 120° C. at 0.2 MPa for 20 hours, and the amount of Li, the amount of Na and the amount of K, which precipitate on a surface of the glass are represented as CLi, CNa and CK respectively, CNa is at most 0.7 nmol/cm2, and CLi+CNa+CK is at most 3.5 nmol/cm2.
摘要翻译:提供耐候性优异的信息记录介质基板用玻璃。 用于信息记录介质基板的玻璃,其以氧化物的摩尔%表示,SiO 2的61至66%,Al 2 O 3的11.5至17%,Li 2 O的8至16%,2至8重量% 的Na 2 O,2.5〜8%的K 2 O,0〜6%的MgO,0〜4%的TiO 2和0〜3%的ZrO 2,条件是Al 2 O 3 + MgO + TiO 2为至少12%,Li 2 O + Na 2 O + K 2 O为16〜23%,其中,在含有B 2 O 3的情况下,其含量小于1%。 上述用于信息记录介质基板的玻璃,其中当玻璃在蒸气气氛中在120℃下在0.2MPa下放置20小时时,并且Li的量,Na的量和沉淀的K的量 玻璃的表面分别表示为CLi,CNa和CK,CNa为0.7nmol / cm 2以下,CLi + CNa + CK为3.5nmol / cm 3以下。
摘要:
An optical head device having an optical element capable of transmitting without diffracting light having a wavelength emitted from a two-wavelength semiconductor laser and capable of diffracting light having another wavelength, to provide high utilization efficiency of light in a stable manner.For this purpose, a wavelength-selective diffraction element 1A comprising a transparent substrate having a front surface on which a grating having a periodically recessed and projected shape in cross section is formed and a filling member 13A filled in the concavo-convex portion 12A of the grating wherein the concavo-convex portion of the grating is provided with an organic pigment having the absorption edge of light in a region having a shorter wavelength than the wavelength λ1, and the concavo-convex member and the filling member have the same refractive index with respect to either one of light having a wavelength λ1 and light having a wavelength λ2, and they have different refractive indices with respect to the other light having a wavelength, is disposed between the light source and the objective lens of the optical head device.
摘要:
A synthetic quartz glass to be used for light with a wavelength of from 150 to 200 nm, wherein the OH group concentration is at most 100 ppm, the hydrogen molecule concentration is at most 1×1017 molecules/cm3, reduction type defects are at most 1×1015 defects/cm3, and the relation between &Dgr;k163 and &Dgr;k190, as between before and after irradiation of ultraviolet rays, satisfies 0
摘要翻译:用于波长为150〜200nm的光的合成石英玻璃,OH基浓度为100ppm以下,氢分子浓度为1×10 17分子/ cm 3以下,还原型缺陷为1×1015以下的缺陷 / cm3,紫外线照射前后的DELTAk163与DELTAk190之间的关系满足0