公开(公告)号：US20090205432A1

公开(公告)日：2009-08-20

申请号：US12367689

申请日：2009-02-09

申请人： George Keilman ,  Tim Johnson

发明人： George Keilman ,  Tim Johnson

IPC分类号： G01L9/12 ,  G01L9/06

CPC分类号： G01L19/0084 ,  G01L9/0073 ,  G01L19/0645

摘要： A pressure sensing system positions a microelectromechanical (MEMS) diaphragm of a MEMS pressure sensor die in a housing to indirectly sample pressure state of a fluid being measured. A second housing diaphragm is used to make direct contact with the fluid being measured. Pressure state of the fluid being measured is transferred from the housing diaphragm through an electrically insulating intermediary fluid to the MEMS diaphragm thereby allowing the MEMS pressure sensor die to indirectly sample pressure state of the fluid being measured. Electrically conductive support members and electrically conductive solid vias are used to electrically couple circuitry of the MEMS pressure sensor die to external wires outside the housing.

摘要翻译： 压力感测系统将MEMS压力传感器管芯的微机电（MEMS）隔膜定位在壳体中以间接采样被测流体的压力状态。 第二壳体隔膜用于与正在测量的流体直接接触。 被测量的流体的压力状态从壳体隔膜通过电绝缘中间流体传递到MEMS隔膜，从而允许MEMS压力传感器模具间接地对被测流体的压力状态进行采样。 导电支撑构件和导电固体通孔用于将MEMS压力传感器管芯的电路电耦合到壳体外部的外部电线。

公开(公告)号：US06554846B2

公开(公告)日：2003-04-29

申请号：US09967444

申请日：2001-09-28

申请人： Eric B. Hamilton ,  Tim Johnson

发明人： Eric B. Hamilton ,  Tim Johnson

IPC分类号： A61B1722

CPC分类号： A61B17/3207 ,  A61B17/22004 ,  A61B17/22012 ,  A61B17/320758 ,  A61B2017/320004

摘要： An ablative burr (100) that may be used for a medical procedure, such as an atherectomy, that does not require the user of an elongate flexible drive shaft. The burr comprises a main body (110) that is elastically connected to an abrasive shell member (130). One or more oscillatory driver(s) (150), such as a piezoelectric transducer, is disposed between the shell member and the main body to oscillate the shell with respect to the main body. Elastically compressible members (140, 142) are provided between the shell member and the main body member. The oscillatory drivers are preferably set or tuned to operate at a resonant frequency of the shell member whereby shell member amplitudes larger than the oscillatory driver amplitudes may be induced. Embodiments of longitudinally oscillatory burrs (100, 200) and rotationally oscillatory burrs (300, 400) are disclosed.

摘要翻译： 可用于诸如粥样斑块切除术的医疗程序的烧蚀毛刺（100），其不需要使用细长的柔性驱动轴。 毛刺包括弹性地连接到磨料壳构件（130）的主体（110）。 一个或多个振荡驱动器（150），例如压电换能器，被布置在壳体构件和主体之间，以相对于主体摆动壳体。 弹性可压缩构件（140,142）设置在壳构件和主体构件之间。 优选地，振荡驱动器被设置或调谐为以壳体部件的谐振频率工作，从而可以引起大于振荡驱动器振幅的壳体振幅。 公开了纵向振荡毛刺（100,200）和旋转振荡毛刺（300,400）的实施例。

公开(公告)号：US06467991B1

公开(公告)日：2002-10-22

申请号：US09610080

申请日：2000-07-05

申请人： James T. Joyce ,  Tim Johnson

发明人： James T. Joyce ,  Tim Johnson

IPC分类号： A63C1900

CPC分类号： E01C13/06 ,  E01C13/02

摘要： A method for treating golf course sand traps to reduce contamination of the sand and to reduce erosion. The bottom of the trap, which is substantially devoid of playing sand is roughened. An initial amount of hydrophobic liquid polyurethane is applied to the roughened soil on the bottom of the trap. The trap is raked and an additional amount of hydrophobic liquid polyurethane is applied to the bottom of the trap. A thin layer of sand is applied to the bottom of the trap and a further additional amount of hydrophobic liquid polyurethane is applied to the sand and the sand is raked. The thin layer of sand is sprayed with water and the trap is permitted to cure for approximately 24 hours. A sufficient amount of playing sand is then added to the trap so the trap is playable.

摘要翻译： 一种处理高尔夫球场砂阱以减少沙尘污染并减少侵蚀的方法。 陷阱的底部，基本上没有打沙，被粗糙了。 将疏水性液体聚氨酯的初始量施加到陷阱底部的粗糙土上。 将捕集器倾斜，并将额外量的疏水性液体聚氨酯施加到捕集器的底部。 将一薄层的沙子施加到捕集器的底部，并且另外额外量的疏水性液体聚氨酯被施加到沙子上并且沙子被倾斜。 用水喷洒薄层的沙子，使捕集器固化约24小时。 然后将足够数量的打沙子添加到陷阱中，以便陷阱可玩。

公开(公告)号：US5750012A

公开(公告)日：1998-05-12

申请号：US627262

申请日：1996-04-04

申请人： P. J. Ireland ,  Howard Rhodes ,  Sujit Sharan ,  Sukesh Sandhu ,  Tim O'Brien ,  Tim Johnson

发明人： P. J. Ireland ,  Howard Rhodes ,  Sujit Sharan ,  Sukesh Sandhu ,  Tim O'Brien ,  Tim Johnson

IPC分类号： C23C14/04 ,  C23C14/35 ,  H01L21/762 ,  H01L21/768 ,  C23C14/34

CPC分类号： C23C14/35 ,  C23C14/046 ,  H01L21/762 ,  H01L21/76877

摘要： An improved sputtering process increases the perpendicularity of the sputtered flux to the target surface by bombarding the target with both low and high mass ions, with low mass ions predominating, packing the target with both low and high mass implanted ions, and causing target atoms ejected as a result of high mass incident ions to have a higher probability of perpendicular or near perpendicular ejection. An alternative improved sputtering process bombards the target with both low and high mass ions, with high mass ions predominating, resulting in a higher sputter rate than achievable with either the high or low mass species alone. Including in either process as the high or the low mass species a species having a lower ionization energy than a standard species allows a reduced pressure plasma, resulting in less scattering of the sputtered flux. A low ionization energy species may also be employed to assist in striking a plasma before sputtering by a single species during deposition.

公开(公告)号：USD748806S1

公开(公告)日：2016-02-02

申请号：US29424360

申请日：2012-06-11

申请人： Tim Coonahan ,  Thomas Swyst ,  Christopher Newell ,  Ricardo Luis Fernandez ,  Tim Johnson ,  William T. Buresh, II

设计人： Tim Coonahan ,  Thomas Swyst ,  Christopher Newell ,  Ricardo Luis Fernandez ,  Tim Johnson ,  William T. Buresh, II

公开(公告)号：US20110274580A1

公开(公告)日：2011-11-10

申请号：US13130886

申请日：2009-11-24

申请人： David Deegan ,  Tim Johnson

发明人： David Deegan ,  Tim Johnson

IPC分类号： C22B1/00 ,  B22D11/14 ,  B22D45/00 ,  B22D23/00

CPC分类号： C22B11/021 ,  C22B4/005 ,  C22B9/226 ,  C22B11/02 ,  C22B11/026 ,  Y02P10/214 ,  Y02P10/234

摘要： The present invention relates to a method, and apparatus for the recovery of precious metals. Accordingly, it provides a continuous process for obtaining a precious metal composition from a feedstock material, the process comprising the steps of: (i) heating a feedstock material in a plasma furnace to form an upper slag layer and a lower molten metal layer; (ii) removing the slag layer; (iii) removing the molten metal layer; (iv) allowing the removed molten metal layer to solidify; (v) fragmenting the solidified metal layer to form fragments; and (vi) recovering a precious metal composition from the fragments; wherein the feedstock material comprises a precious metal containing material and a collector metal, said collector metal being a metal or an alloy that is capable of forming a solid solution, an alloy or an intermetallic compound with one or more precious metals. This allows for high recovery yields of precious metals. The apparatus comprises a plasma furnace, a casting table enabling continuous casting of the molten metal pool to form a solidified sheet, a fragmentation device and a separation unit for recovering precious-metal-rich alloy from the sheet fragments.

摘要翻译： 本发明涉及一种回收贵金属的方法和装置。 因此，其提供了从原料材料获得贵金属组合物的连续方法，该方法包括以下步骤：（i）在等离子体炉中加热原料以形成上熔渣层和下熔融金属层; （ii）除去渣层; （iii）去除熔融金属层; （iv）允许去除的熔融金属层固化; （v）使固化的金属层破碎以形成碎片; 和（vi）从碎片中回收贵金属组合物; 其中所述原料材料包含含贵金属的材料和集电器金属，所述集电极金属是能够形成固溶体，合金或金属间化合物与一种或多种贵金属的金属或合金。 这允许贵金属的高回收率。 该装置包括等离子体炉，能够连续铸造熔融金属池以形成固化片的铸造台，碎片装置和用于从片材片中回收富含金属的合金的分离单元。

公开(公告)号：USD520214S1

公开(公告)日：2006-05-09

申请号：US29186495

申请日：2003-07-15

申请人： Tim Johnson ,  Shiloh Johnson

设计人： Tim Johnson ,  Shiloh Johnson

公开(公告)号：US06398923B1

公开(公告)日：2002-06-04

申请号：US09609441

申请日：2000-07-03

申请人： P. J. Ireland ,  Howard Rhodes ,  Sujit Sharan ,  Sukesh Sandhu ,  Tim O'Brien ,  Tim Johnson

发明人： P. J. Ireland ,  Howard Rhodes ,  Sujit Sharan ,  Sukesh Sandhu ,  Tim O'Brien ,  Tim Johnson

IPC分类号： C23C1434

CPC分类号： C23C14/35 ,  C23C14/046 ,  H01L21/762 ,  H01L21/76877

摘要： An improved sputtering process increases the perpendicularity of the sputtered flux to the target surface by bombarding the target with both low and high mass ions, with low mass ions predominating, packing the target with both low and high mass implanted ions, and causing target atoms ejected as a result of high mass incident ions to have a higher probability of perpendicular or near perpendicular ejection. An alternative improved sputtering process bombards the target with both low and high mass ions, with high mass ions predominating, resulting in a higher sputter rate than achievable with either the high or low mass species alone. Including in either process as the high or the low mass species a species having a lower ionization energy than a standard species allows a reduced pressure plasma, resulting in less scattering of the sputtered flux. A low ionization energy species may also be employed to assist in striking a plasma before sputtering by a single species during deposition.

摘要翻译： 改进的溅射工艺通过以低质量离子和高质量离子轰击靶，通过以低质量离子为主来增加溅射通量对目标表面的垂直度，用低质量和高质量注入离子填充目标，并引起目标原子喷出 作为高质量入射离子的结果具有更高的垂直或近似垂直喷射的概率。 一种替代的改进的溅射工艺用低和高质量离子轰击靶，以高质量离子为主，导致比单独使用高质量或低质量物质可实现的更高的溅射速率。 在任一过程中，作为高质量或低质量物质，具有比标准物质更低的电离能的物质允许减压等离子体，导致溅射通量的较少散射。 也可以使用低电离能种来在沉积期间通过单一物质在溅射之前帮助击打等离子体。