Abstract:
Infrared absorbing compounds are disclosed. The compounds are co-polymers that comprise covalently attached ammonium, sulfonium, phosphonium, and/or iodonium cations, and infrared absorbing cyanine anions that have two to four sulfonate groups and/or sulfate groups, and/or infrared absorbing oxonol anions. The infrared absorbing compounds can be used in aqueous developable lithographic printing plate precursors.
Abstract:
Thermally imageable elements comprising a masking layer and a substrate are disclosed. The masking layer contains a sulfobetaine and/or a carboxybetaine containing co-polymer or a mixture of a sulfobetaine and/or a carboxybetaine containing co-polymers and absorbs both infrared and ultraviolet radiation. When the masking layer is on the substrate, the imageable element may be imaged and developed to form a photomask. When the imageable element additionally comprises a photosensitive layer, the masking layer may be imaged and developed to form an integral photomask. The imageable elements that comprise a photosensitive layer are useful as flexographic printing plate precursors.
Abstract:
Infrared absorbing N-alkylsulfate cyanine compounds and imageable compositions containing the compounds are disclosed. The compounds have the structure I: in which: R is hydrogen, or R is one or more alkyl, substituted or unsubstituted aralkyl, alkoxy, carboxyl, nitro, cyano, trifluoromethyl, acyl, alkyl sulfonyl, aryl sulfonyl, or halogen groups, or R is the atoms necessary to form a substituted or unsubstituted benzo group; A is (CH2)n; where n is 1–5; preferably 2–4; Y is O, S, NR′, or C(R′)2, where R′ is hydrogen or alkyl; preferably methyl; Z is hydrogen, halogen, alkyl, substituted or unsubstituted aralkyl; substituted or unsubstituted aroxyl, substituted or unsubstituted thioaroxyl, or substituted or unsubstituted diphenylamino; m is zero or one; and X is a cation, preferably sodium, potassium, lithium, ammonium, or substituted ammonium.
Abstract:
Thermally imageable elements comprising a masking layer and a substrate are disclosed. The masking layer contains a sulfobetaine and/or a carboxybetaine containing co-polymer or a mixture of a sulfobetaine and/or a carboxybetaine containing co-polymers and absorbs both infrared and ultraviolet radiation. When the masking layer is on the substrate, the imageable element may be imaged and developed to form a photomask. When the imageable element additionally comprises a photosensitive layer, the masking layer may be imaged and developed to form an integral photomask. The imageable elements that comprise a photosensitive layer are useful as flexographic printing plate precursors.
Abstract:
Substrates for lithographic printing plate precursors and lithographic printing plate precursors are disclosed. The substrates comprise an aluminum or aluminum alloy support and the a layer of interlayer material on the support. The interlayer material is a co-polymer that comprise (1) acid groups and/or phosphonic acid groups, and (2) silyl groups substituted with three alkoxy and/or phenoxy groups. The lithographic printing plate precursors additionally comprise an imageable layer over the interlayer.
Abstract:
Infrared absorbing compounds that absorb at 800 nm±50 nm and at 1050 nm±50 nm, the two different regions of the infrared spectrum typically used for imaging, are disclosed. Thermally imageable elements that comprise these infrared absorbing compounds can be imaged with radiation in either of these two regions of the infrared spectrum. The elements are especially useful as lithographic printing plate precursors.
Abstract:
Infrared absorbing compounds in which the anion is selected from the group consisting of 5-isatinsulfonate, 10-camphorsulfonate, and 4,5-dihydroxy-1,3-benzenedisulfonate are disclosed. Negative-working imageable elements containing these compounds have improved dot stability.
Abstract:
Negative-working imageable elements have an imageable layer comprising a free radically polymerizable component, an initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation, a radiation absorbing compound, one or more polymeric binders, and at least 5 weight % of core-shell particles comprising a hydrophobic polymeric core and a hydrophilic polymeric shell that is covalently bound to the polymeric core. The hydrophilic polymeric shell has one or more zwitterionic functional groups. These elements can be imaged such as by IR lasers to provide lithographic printing plates.
Abstract:
A substrate useful for forming lithographic printing plate precursors includes a metal or polymer support and an interlayer comprising a trialkoxysilyl polyethylene glycol acrylate having the following Structure (I): wherein R1 and R2 are independently hydrogen or C1 to C6 alkyl, C1 to C6 alkenyl, C1 to C6 alkoxy, C1 to C6 acyl, C1 to C6 acyloxy, phenyl, halo, or cyano groups, or R1 and R2 together can form a cyclic group, R3 is hydrogen, or a C1 to C6 alkyl, phenyl, halo, or cyano group, R4 and R5 are independently hydrogen or methyl groups, R6 is hydrogen or a C1 to C12 alkyl group, X1 is —O— or —NR— wherein R is hydrogen or an alkyl or aryl group, X2 is —NR′— wherein R′ is hydrogen or an alkyl or aryl group, m is an integer of from 15 to 200, and n is an integer of from 1 to 12. The lithographic printing plates can be negative-working and particularly useful for on-press development and have a sulfuric acid-anodized aluminum support.
Abstract:
An imaged and developed element, such as a lithographic printing plate, is provided by infrared radiation imaging of a negative-working imageable element having a free radically polymerizable component, a free radical initiator composition, an infrared radiation absorbing compound, and adhesion promoter that is an organic compound having an ethylenically unsaturated carbon-carbon double bond that is connected to an alkoxysilyl or hydroxysilyl group. The use of the adhesion promoter provides increased printing durability for the imaged and developed element, especially those having sulfuric acid-anodized aluminum substrates.