公开(公告)号：US20210035841A1

公开(公告)日：2021-02-04

申请号：US16935288

申请日：2020-07-22

Applicant: ASM IP Holding B.V.

Inventor： Jeroen Fluit

IPC: H01L21/677 ,  B65G1/04 ,  F27B17/00 ,  F27D3/12 ,  F27D3/00 ,  F27D15/02 ,  H01L21/67 ,  H01L21/673

Abstract: A vertical batch furnace assembly for processing wafers comprising a cassette handling space, a wafer handling space, and an internal wall separating the cassette handling space and the wafer handling space. The cassette handling space is provided with a cassette storage configured to store a plurality of wafer cassettes. The cassette handling space is also provided with a cassette handler configured to transfer wafer cassettes between the cassette storage and a wafer transfer position. The wafer handling space is provided with a wafer handler configured to transfer wafers between a wafer cassette in the wafer transfer position and a wafer boat. The internal wall is provided with a wafer transfer opening adjacent the wafer transfer position for a wafer cassette from or to which wafers are to be transferred. The cassette storage comprises a cassette storage carousel with a diameter between 1.1 and 1.6 meter.

公开(公告)号：US20200270752A1

公开(公告)日：2020-08-27

申请号：US16797346

申请日：2020-02-21

Applicant: ASM IP Holding B.V.

Inventor： Dieter Pierreux ,  Werner Knaepen ,  Bert Jongbloed ,  Jeroen Fluit

IPC: C23C16/48 ,  C23C16/458 ,  C23C16/44 ,  C23C16/455

Abstract: The disclosure relates to a substrate processing apparatus, comprising: a first reactor constructed and arranged to process a rack with a plurality of substrates therein; a second reactor constructed and arranged to process a substrate; and, a substrate transfer device constructed and arranged to transfer substrates to and from the first and second reactor. The second reactor may be provided with an illumination system constructed and arranged to irradiate ultraviolet radiation within a range from 100 to 500 nanometers onto a top surface of at least a substrate in the second reactor.

公开(公告)号：US20240339340A1

公开(公告)日：2024-10-10

申请号：US18742107

申请日：2024-06-13

Applicant: ASM IP Holding B.V.

Inventor： Jeroen Fluit

IPC: H01L21/67 ,  H01L21/673 ,  H01L21/677 ,  H01L21/687

CPC classification number: H01L21/67098 ,  H01L21/67303 ,  H01L21/6773 ,  H01L21/67742 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/68707

Abstract: The disclosure relates to substrate processing apparatus, with a first and second reactor, each reactor configured with an elevator to transfer a boat with substrates to the reactor. The apparatus having a boat transfer device to transfer the boat with substrates between a substrate loading station, the first and/or second elevator and a cool down station. The substrate loading station and the cool down station may be arranged on opposite sides of the first and second elevator.

公开(公告)号：US20230047885A1

公开(公告)日：2023-02-16

申请号：US17980016

申请日：2022-11-03

Applicant: ASM IP Holding B.V.

Inventor： Theodorus G.M. Oosterlaken ,  Jeroen Fluit

IPC: H01L21/677

Abstract: A vertical batch furnace assembly for processing wafers having a cassette handling space, a wafer handling space, and a first wall and separating the cassette handling space from the wafer handling space. The first wall has at least one wafer transfer opening in front of which, at a side of the first wall which is directed to the cassette handling space, a wafer transfer position for a wafer cassette is provided. The cassette handling space comprises a cassette storage having a plurality of cassette storage positions and a cassette handler configured to transfer wafer cassettes between the cassette storage positions and the wafer transfer position. The cassette handler has a first cassette handler arm and a second cassette handler arm.

公开(公告)号：US11515187B2

公开(公告)日：2022-11-29

申请号：US17242519

申请日：2021-04-28

Applicant: ASM IP Holding B.V.

Inventor： Theodorus G. M. Oosterlaken ,  Jeroen Fluit

IPC: H01L21/677

Abstract: A vertical batch furnace assembly for processing wafers having a cassette handling space, a wafer handling space, and a first wall and separating the cassette handling space from the wafer handling space. The first wall has at least one wafer transfer opening in front of which, at a side of the first wall which is directed to the cassette handling space, a wafer transfer position for a wafer cassette is provided. The cassette handling space comprises a cassette storage having a plurality of cassette storage positions and a cassette handler configured to transfer wafer cassettes between the cassette storage positions and the wafer transfer position. The cassette handler has a first cassette handler arm and a second cassette handler arm.

公开(公告)号：US20200332416A1

公开(公告)日：2020-10-22

申请号：US16840960

申请日：2020-04-06

Applicant: ASM IP Holding B.V.

Inventor： Jeroen Fluit

IPC: C23C16/455 ,  H01L21/768 ,  H01L21/285 ,  C23C16/08

Abstract: There is provided a method and apparatus to deposit a molybdenum comprising layer on a substrate by supplying a precursor comprising molybdenum(VI) dichloride dioxide and a first reactant comprising boron and hydrogen to the substrate in a reaction chamber to react and form the molybdenum layer. The first reactant comprising boron and hydrogen may be diborane.

公开(公告)号：US20200168485A1

公开(公告)日：2020-05-28

申请号：US16202941

申请日：2018-11-28

Applicant: ASM IP Holding B.V.

Inventor： Jeroen Fluit

IPC: H01L21/67 ,  H01L21/673 ,  H01L21/677 ,  H01L21/687

Abstract: The disclosure relates to substrate processing apparatus, with a first and second reactor, each reactor configured with an elevator to transfer a boat with substrates to the reactor. The apparatus having a boat transfer device to transfer the boat with substrates between a substrate loading station, the first and/or second elevator and a cool down station. The substrate loading station and the cool down station may be arranged on opposite sides of the first and second elevator.