公开(公告)号：US20150212425A1

公开(公告)日：2015-07-30

申请号：US14430021

申请日：2013-08-27

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Michael Andrew Chieda ,  Stephen Roux ,  Teun Peterus Adrianus De Wilt ,  Igor Matheus Petronella Aarts

IPC: G03F7/20 ,  G01B11/25 ,  G01D5/347

CPC classification number: G03F7/70191 ,  G01B11/2513 ,  G01D5/347 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/7085

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes an encoder head designed to scan over a surface of the patterning device to determine a distortion in a first direction along a length of the patterning device and a distortion in a second direction substantially perpendicular to the surface of the patterning device.

Abstract translation: 光刻设备包括配置成调节辐射束的照明系统，构造成保持图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 被构造成保持衬底的工作台以及配置成将图案化的辐射束投影到衬底的目标部分上的投影系统。 光刻设备还包括编码器头，其设计成在图案形成装置的表面上扫描以确定沿着图案形成装置的长度的第一方向的变形和基本上垂直于图案形成装置的表面的第二方向的变形。

公开(公告)号：US12140872B2

公开(公告)日：2024-11-12

申请号：US17796640

申请日：2021-01-21

Applicant: ASML Holding N.V.

Inventor： Mohamed Swillam ,  Tamer Mohamed Tawfik Ahmed Mohamed Elazhary ,  Stephen Roux ,  Yevgeniy Konstantinovich Shmarev

IPC: G03F7/00 ,  G03F9/00

Abstract: A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system. The beam shaping system is configured to shape an illumination beam generated from the illumination system and generate a flat top beam spot of the illumination beam over a wavelength range from 400 nm to 2000 nm. The polarization modulation system is configured to provide tenability of linear polarization state of the illumination beam. The beam projection system is configured to project the flat top beam spot toward a target, such as an alignment mark on a substrate. The signal detection system is configured to collect a signal beam comprising diffraction order sub-beams generated from the target, and measure a characteristic (e.g., overlay) of the target based on the signal beam.

公开(公告)号：US11966169B2

公开(公告)日：2024-04-23

申请号：US17029845

申请日：2020-09-23

Applicant: ASML Holding N.V.

Inventor： Mohamed Swillam ,  Tamer Mohamed Tawfik Ahmed Elazhary ,  Stephen Roux ,  Yuxiang Lin ,  Justin Lloyd Kreuzer

IPC: G03F7/00 ,  G01B11/14 ,  G01B11/27 ,  G02B6/12 ,  G02B6/293 ,  H01L21/67

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/272 ,  G02B6/12007 ,  G03F7/70575 ,  G03F7/70616 ,  G03F7/7085 ,  G01B2210/56 ,  G02B6/29301 ,  G02B6/29395 ,  G03F7/70608 ,  H01L21/67259

Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.